This invention is directed to a plasma cord coating device comprising a pair of opposite and parallel plate electrodes having a first electrode and a second electrode, a pair of planar and parallel dielectric barriers including a first dielectric barrier, and a second dielectric barrier, wherein the first electrode is covered by the first dielectric barrier on a side facing the second electrode and the second electrode is covered by the second dielectric barrier on a side facing the first electrode to form a gap between the first and the second dielectric barriers. This device includes a first foil which extends through the gap and covers the first dielectric barrier and a second foil which extends through the gap and covers the second dielectric barrier to form a plasma treatment zone between the first foil and the second foil.

A microwave energy source that generates a microwave energy is disclosed. The microwave energy source has an on-state and an off-state. A control circuit is coupled to the microwave energy source and includes an output to generate a control signal that adjusts a pulse frequency of the microwave energy. A voltage generator applies a non-zero voltage to the microwave energy source during the off-state. A frequency and a duty cycle of the non-zero voltage is based on a frequency and a duty cycle of the control signal. A waveguide is coupled to the microwave energy source. The waveguide has a supply gas inlet that receives a supply gas, a reaction zone that generates a plasma, a process inlet that injects a raw material into the reaction zone, and an outlet that outputs a powder based on a mixture of the supply gas and the raw material within the plasma.

An installation for continuously coating wires by means of plasma deposition includes at least one plasma deposition chamber having a pressure-tight inlet and a pressure-tight outlet which are capable of maintaining a reduced pressure inside the chamber when they are passed through by a wire which travels through the chamber. At least one generator of plasma rays is provided in the chamber for the deposition of a target material on the external surface of the wire in a portion thereof which is between the pressure-tight inlet and the pressure-tight outlet. A transport system is provided in the installation in order to progressively draw the wire through the plasma deposition chamber.

A roll to roll fabrication apparatus includes: a vacuum chamber having an installation chamber and a process chamber; a preprocessing unit in the installation chamber to process a surface of a film which is transferred to enhance a film characteristic in a subsequent CVD process; a process drum in the process chamber to wind the film thereon; a process treatment unit in the process chamber to form a layer by performing a CVD process on the film wound on the process drum; and a plurality of heaters in the installation chamber and the process chamber to gradually increase a temperature of the film wound on the process drum to prevent application of a thermal impact to the film due to the high-temperature process drum.

A film manufacturing apparatus includes a lamination unit that laminates a first layer at one side in a thickness direction of a long-length substrate film to produce a one-sided laminated film, and that laminates a second layer at the other side in the thickness direction of the one-sided laminated film to produce a double-sided laminated film; a conveyance unit; a marking unit; a measurement unit; a detection unit, disposed at an upstream side in the conveyance direction of the measurement unit; and an arithmetic unit that obtains physical properties of the first layer and the second layer based on the physical property at a first position in the one-sided laminated film and the physical property at a second position in the double-sided laminated film. The arithmetic unit defines, with a mark as a reference, a position substantially the same as the first position to be the second position.

This sputtering cathode has a sputtering target having a tubular shape in which the cross-sectional shape thereof has a pair of long side sections facing each other, and an erosion surface facing inward. Using the sputtering target, while moving a body to be film-formed, which has a film formation region having a narrower width than the long side sections of the sputtering target, parallel to one end face of the sputtering target and at a constant speed in a direction perpendicular to the long side sections above a space surrounded by the sputtering target, discharge is performed such that a plasma circulating along the inner surface of the sputtering target is generated, and the inner surface of the long side sections of the sputtering target is sputtered by ions in the plasma generated by a sputtering gas to perform film formation in the film formation region of the body to be film-formed.

A discharge electrode E in an electrode chamber C is formed of a pair of electrode members 8 and 9 having lengths equal to or greater than a width of a film F. Also, the pair of electrode members 8 and 9 are disposed facing each other so as to sandwich a support member 4 there-between, which has nearly the same length as to electrode members; a gap is formed in a section in which the pair of electrode members 8 and 9 face each other; and this gap is open at a tip of the discharge electrode so as to serve as a gas pathway 15. Meanwhile, in the aforementioned support member 4, a plurality of gas guiding holes 5 are formed in a longitudinal direction thereof, and the gas guiding holes are in communication with a gas supplying system.

A microwave energy source that generates a microwave energy is disclosed. The microwave energy source has an on-state and an off-state. A control circuit is coupled to the microwave energy source and includes an output to generate a control signal that adjusts a pulse frequency of the microwave energy. A voltage generator applies a non-zero voltage to the microwave energy source during the off-state. A frequency and a duty cycle of the non-zero voltage is based on a frequency and a duty cycle of the control signal. A waveguide is coupled to the microwave energy source. The waveguide has a supply gas inlet that receives a supply gas, a reaction zone that generates a plasma, a process inlet that injects a raw material into the reaction zone, and an outlet that outputs a powder based on a mixture of the supply gas and the raw material within the plasma.

A method for treating a flexible plastic substrate is provided herein. The method includes establishing an atmospheric pressure plasma beam from an inert gas using a power of greater than about 90W, directing the plasma beam toward a surface of the flexible polymer substrate, and scanning the plasma beam across the surface of the polymer substrate to form a treated substrate surface.

A graphene roll-to-roll coating apparatus and a graphene roll-to-roll coating method are provided on the basis of a continuous process.