A film formation apparatus is configured so as to be equipped with: a film-forming chamber for forming a thin film using plasma on a substrate at a film formation position; an abnormal discharge-detecting section for detecting an abnormal discharge of the plasma; an imaging device for imaging abnormal plasma, which is the plasma when an abnormal discharge is detected, or an abnormal substrate surface, which is the substrate surface on which a thin film is formed when an abnormal discharge is detected; and a storage unit for storing the images taken by the imaging device.

A reactor furnace for coating fiber tow includes an elongate reactor having a fiber tow inlet and a fiber tow outlet; a thermo-chemical reactor section positioned along the elongate reactor; a first microwave source for directing microwave energy along the reactor from a first end of the reactor toward a second end of the reactor; a second microwave source for directing microwave energy along the reactor from the second end of the reactor toward the first end of the reactor; a gas inlet upstream of the thermo-chemical reactor; and a gas outlet downstream of the thermo-chemical reactor.

The invention relates to an apparatus for processing a surface of a substrate by atomic layer deposition and to a method for operating the apparatus. The apparatus includes a deposition chamber and one or more lead-through connections provided between one or more side chambers and the deposition chamber. The one or more lead through connections includes one or more lead-through chambers and a secondary pressure device operatively connected to the one or more lead-through chambers.

A graphene roll-to-roll coating apparatus and a graphene roll-to-roll coating method are provided on the basis of a continuous process.

The invention provides a gas barrier film with low deterioration in the gas barrier property before and after high-temperature hot water treatment. The gas barrier film has a gas barrier coating film, formed as a composite film comprising a network structure having a mesh structure with SiOSi bonds as the basic lattice and a water-soluble polymer crystallized as microcrystals, incorporated into the mesh of the network structure, wherein a barrier coating agent, obtained by mixing a condensate solution of an alkoxysilane hydrolysate prepared as a mixed solution in which the proportion of bonded states of the silicon atoms of the condensate with Q1 and Q2 structures is at least 60% of the total silicon atoms, with a crystalline water-soluble polymer, is coated on a base material film, either after forming or without forming an aluminum oxide vapor deposition film, to form a coating layer.

This facility comprises a support (1) for the substrate, a pressing roll (2), capable of pressing the substrate against said support, a treatment unit positioned downstream of the pressing roll, with reference to the direction of travel of the substrate, said unit comprising injection means (37) for injecting a treatment gas towards said support and means (8) for transforming the surface of the moving substrate. According to the invention, this facility further comprises a containment cover (4) open in the direction of the support, this cover and this support defining an inner volume in which said treatment unit is received, this cover comprising a front wall called the upstream wall (42), facing towards said pressing roll, wherein the smallest distance (d2) between the end edge (42) of said upstream front wall and the pressing roll, the smallest distance (d3) between said upstream front wall (42) and the treatment unit and the smallest distance (d1) between the upstream end (39) of the treatment unit and the support (1), are such that they define a recirculation volume (VR) for the treatment gas, defined by the end edge of said upstream front wall, the pressing roll, the support and the upstream end of the treatment unit.

A device for treating a web substrate in a plasma enhanced process. The device includes a treatment station with a vacuum process chamber. A plasma treatment unit is allocated to the treatment station which is designed to form a plasma zone within the process chamber for treating a surface of the web substrate. The device further includes a transporting system for continuously transporting the web substrate through the treatment station with an unwind roller and a rewind roller, wherein the transporting system defines a transporting path of the web substrate through the process chamber. The plasma treatment unit includes an extensive antenna and a radiofrequency generator for exciting the extensive antenna to a resonant frequencies.

Barrier films comprising a PECVD barrier coating with diamond-like carbon are disclosed, along with methods of manufacturing such films, and laminated packaging materials comprising such films, in particular intended for liquid food packaging are disclosed. Packaging containers comprising the laminated packaging material or being made from the laminated packaging material, in particular to a packaging container intended for liquid food packaging are also disclosed.

A roller-type continuous vapor deposition film-forming apparatus for a substrate that is to be conveyed at high speed, comprising a plasma pretreatment device and a film-forming apparatus provided in series, wherein a substrate conveying compartment 12A, a pretreatment compartment 12B and film formation compartment 12C are formed inside a chamber 3; and a substrate S is wound from an unwinding roller 13 onto a plasma pretreatment roller 20 and film formation roller 25, which are provided in series, via guide rollers 14a-14d, and is taken up by a take-up roller 15. In the pretreatment device, plasma P is supplied toward the substrate S inside a gap, wherein a plasma-forming gas to be supplied from plasma supply nozzles 22a, 22b is surrounded by the pretreatment roller, the plasma supply nozzles and a magnet 21, as magnetic forming means, and the plasma is electrically set to a positive electrical potential, power is supplied between the electrodes positioned on the substrate surface side, the plasma P is generated and an active pretreatment surface is formed on the surface of the substrate S. An inorganic oxide can be formed at high speed by the film formation device by physical vapor deposition or the like on a pretreatment surface of a substrate that has been subjected to the pretreatment.

This sputtering cathode has a sputtering target having a tubular shape in which the cross-sectional shape thereof has a pair of long side sections facing each other, and an erosion surface facing inward. Using the sputtering target, while moving a body to be film-formed, which has a film formation region having a narrower width than the long side sections of the sputtering target, parallel to one end face of the sputtering target and at a constant speed in a direction perpendicular to the long side sections above a space surrounded by the sputtering target, discharge is performed such that a plasma circulating along the inner surface of the sputtering target is generated, and the inner surface of the long side sections of the sputtering target is sputtered by ions in the plasma generated by a sputtering gas to perform film formation in the film formation region of the body to be film-formed.