H01L21/2007

INTEGRATED CIRCUIT EMULATING NEURAL SYSTEM WITH NEURON CIRCUIT AND SYNAPSE DEVICE ARRAY AND FABRICATION METHOD THEREOF
20180336451 · 2018-11-22 ·

An integrated circuit emulating a neural system and a fabricating method thereof are provided. A synapse device array that imitates a brain neural system (i.e., a central nervous system) requiring high integration on the same substrate is formed by stacking one or more layers on a lower portion, and a neuron circuit of a peripheral nervous system having sensory and motor neurons connected to the brain neural system is formed on an upper portion.

Semiconductor device with multiple substrates electrically connected through an insulating film and manufacturing method

A semiconductor device includes a first substrate having an attaching surface on which first electrodes and a first insulating film are exposed, an insulating thin film that covers the attaching surface of the first substrate, and a second substrate which has an attaching surface on which second electrodes and a second insulating film are exposed and is attached to the first substrate in a state in which the attaching surface of the second substrate and the attaching surface of the first substrate are attached together sandwiching the insulating thin film therebetween, and the first electrodes and the second electrodes deform and break a part of the insulating thin film so as to be directly electrically connected to each other.

Polycrystalline ceramic substrate and method of manufacture

A method of fabricating a ceramic substrate structure includes providing a ceramic substrate, encapsulating the ceramic substrate in a barrier layer, and forming a bonding layer coupled to the barrier layer. The method further includes removing a portion of the bonding layer to expose at least a portion of the barrier layer and define fill regions, and depositing a second bonding layer on the at least a portion of the exposed barrier layer and the fill regions.

Semiconductor device having a graphene layer, and method of manufacturing thereof

A method for manufacturing a semiconductor device includes: providing a carrier wafer and a silicon carbide wafer; bonding a first side of the silicon carbide wafer to the carrier wafer; splitting the silicon carbide wafer bonded to the carrier wafer into a silicon carbide layer thinner than the silicon carbide wafer and a residual silicon carbide wafer, the silicon carbide layer remaining bonded to the carrier wafer during the splitting; and forming a graphene material on the silicon carbide layer.

METHOD AND DEVICE FOR ALIGNING A FIRST SUBSTRATE WITH A SECOND SUBSTRATE
20180323069 · 2018-11-08 ·

A method for aligning a first substrate, in particular a mask, with a second substrate, in particular a wafer, comprises inserting the first substrate and the second substrate into a positioning means; capturing at least one joint image of the first substrate and the second substrate; displaying the image; a plurality of image points in the image being marked by a user; and determining a control command for actuating the positioning means on the basis of the marked image points in such a way that the substrates are aligned with one another.

Wafer bonding system and method
10121760 · 2018-11-06 · ·

A wafer bonding system and method using a combination of heat and a pneumatic force to bond two wafers held together in alignment. The wafers are heated via a non-contact, gaseous interface, thermal path between heating elements and the wafers. The pneumatic force is created by a pressure differential between a first pressure surrounding the two wafers and a second pressure, which is less than the first pressure, maintained between the two wafers.

Wafer bonding structure and wafer bonding method

Wafer bonding methods and wafer bonding structures are provided. An exemplary wafer bonding method includes providing a first wafer; forming a first interlayer dielectric layer and a first bonding layer passing through the first interlayer dielectric layer on the surface of the first wafer; providing a second wafer; forming a second interlayer dielectric layer and a second bonding layer passing through the second interlayer dielectric layer on surface of the second wafer; forming a self-assembling layer on at least one of a surface of the first interlayer dielectric layer and a surface of the second interlayer dielectric layer; and bonding the first wafer with the second wafer, the first bonding layer and the second bonding layer being fixed with each other, and the first interlayer dielectric layer and the second interlayer dielectric layer being fixed with each other by the self-assembling molecular layer.

MOUNTING OF SEMICONDUCTOR-ON-DIAMOND WAFERS FOR DEVICE PROCESSING

The present invention discloses a semiconductor-on-diamond-on-carrier substrate wafer (55). The semiconductor-on-diamond-on-carrier wafer (55) comprises: a semiconductor-on-diamond wafer (40) having a diamond side and semiconductor side; a carrier substrate (50) disposed on the diamond side of the semiconductor-on-diamond wafer (40) and including at least one layer having a lower coefficient of thermal expansion (CTE) than diamond; and an adhesive layer (48) disposed between the diamond side of the semiconductor-on-diamond wafer (40) and the carrier substrate (50) to bond the carrier substrate (50) to the semiconductor-on-diamond wafer (40). The semiconductor-on-diamond-on-carrier substrate wafer (55) has the following characteristics: a total thickness variation of no more than 40 m; a wafer bow of no more than 100 m; and a wafer warp of no more than 40 m.

Electronic device and method for manufacturing the same

An electronic device is disclosed, which comprises: a first substrate; an adhesion layer disposed on the first substrate and comprising a condensation product of silane or derivatives thereof; an inorganic layer disposed on the adhesion layer; and an active unit disposed on the inorganic layer. In addition, the present disclosure also provides a method for manufacturing the aforementioned electronic device.

Method for bonding substrates

A method for bonding a first substrate with a second substrate at respective contact faces of the substrates with the following steps: holding the first substrate to a first sample holder surface of a first sample holder with a holding force F.sub.H1 and holding the second substrate to a second sample holder surface of a second sample holder with a holding force F.sub.H2; contacting the contact faces at a bond initiation point and heating at least the second sample holder surface to a heating temperature T.sub.H; bonding of the first substrate with the second substrate along a bonding wave running from the bond initiation point to the side edges of the substrates, wherein the heating temperature T.sub.H is reduced at the second sample holder surface during the bonding.