Packages including substrate-less integrated components and methods of fabrication are described are described. In an embodiment, a packaging method includes attaching a ground structure to a carrier and a plurality of components face down to the carrier and laterally adjacent to the ground structure. The plurality of components are encapsulated within a molding compound, and the carrier is removed exposing a plurality of component terminals and a plurality of ground structure terminals. A plurality of packages are singulated.

A method of delidding an integrated circuit (IC) package includes directing a laser beam along a cut line of an integrated circuit package. The cut line defines a removable portion, the cutting occurs along the cut line, and the removable portion is removed after the directing. A method of troubleshooting an integrated circuit package is also disclosed.

A method of fabricating a semiconductor package may include forming a plating layer on a surface of a substrate body. A circuit resist pattern and a monitoring resist pattern may be formed on the plating layer, and the plating layer may be etched using the circuit resist pattern and the monitoring resist pattern as etch masks, thereby forming circuit patterns and sub-patterns of a monitoring pattern. A residual rate of the circuit patterns may be monitored by inspecting the number of the sub-patterns of the monitoring pattern remaining on the substrate body after an etch process for forming the circuit patterns and the sub-patterns of the monitoring pattern. A semiconductor chip may be bonded to the circuit patterns using inner connectors.

One aspect of this disclosure is a power amplifier system that includes a control interface, a power amplifier, a passive component on a same die as the power amplifier, and a bias circuit on a different die than the power amplifier. The control interface can operate as a serial interface or as a general purpose input/output interface. The power amplifier can be controllable based at least partly on an output signal from the control interface. The bias circuit can generate a bias signal based at least partly on an indication of the electrical property of the passive component. Other embodiments of the system are provided along with related methods and components thereof.

The invention provides a semiconductor package and a method for fabricating a base for a semiconductor package. The semiconductor package includes a base. The base has a device-attach surface. A radio-frequency (RF) device is embedded in the base. The RF device is close to the device-attach surface.

A semiconductor structure that includes a resistor that is located within an interconnect dielectric material layer of an interconnect level is provided. The resistor includes a diffusion barrier material that is present at a bottom of a feature that is located in the interconnect dielectric material layer. In some embodiments, the resistor has a topmost surface that is located entirely beneath a topmost surface of the interconnect dielectric material layer. In such an embodiment, the resistor is provided by removing sidewall portions of a diffusion barrier liner that surrounds a metal-containing structure. The removal of the sidewall portions of the diffusion barrier liner reduces the parasitic noise that is contributed to the sidewall portions of a resistor that includes such a diffusion barrier liner. Improved precision can also be obtained since sidewall portions may have a high thickness variation which may adversely affect the resistor's precision.

A method for modifying an LGA package after production is described herein. Generally, a modification of an LGA package by shorting two contacts together via a trace made of a robust conductive metal such as tungsten or platinum. Specifically, the present disclosure relates to a method for modifying a LGA package shorting two contacts together using FIB deposition via a gallium ion beam.

A system and method of using electrochemical additive manufacturing to add interconnection features, such as wafer bumps or pillars, or similar structures like heatsinks, to a plate such as a silicon wafer. The plate may be coupled to a cathode, and material for the features may be deposited onto the plate by transmitting current from an anode array through an electrolyte to the cathode. Position actuators and sensors may control the position and orientation of the plate and the anode array to place features in precise positions. Use of electrochemical additive manufacturing may enable construction of features that cannot be created using current photoresist-based methods. For example, pillars may be taller and more closely spaced, with heights of 200 m or more, diameters of 10 m or below, and inter-pillar spacing below 20 m. Features may also extend horizontally instead of only vertically, enabling routing of interconnections to desired locations.

Embodiments disclosed herein include electronic packages and methods of making such packages. In an embodiment, a package substrate comprises a substrate comprising a first dielectric material, a first trace embedded in the substrate, and a patch in direct contact with the first trace. In an embodiment, the patch comprises a second dielectric material that is different than the first dielectric material.

The disclosure is and includes at least an apparatus, system and method for a ramped electrical interconnection for use in semiconductor fabrications. The apparatus, system and method includes at least a first semiconductor substrate having thereon a first electrical circuit comprising first electrical components; a second semiconductor substrate at least partially covering the first electrical circuit, and having thereon a second electrical circuit comprising second electrical components; a ramp formed through the second semiconductor substrate between at least one of the first electrical components and at least one of the second electrical components; and an additively manufactured conductive trace formed on the ramp to electrically connect the at least one first electrical component and the at least one second electrical component.