A device includes a substrate, a dielectric layer over the substrate, and a conductive interconnect in the dielectric layer. The conductive interconnect includes a barrier/adhesion layer and a conductive layer over the barrier/adhesion layer. The barrier/adhesion layer includes a material having a chemical formula MX.sub.n, with M being a transition metal element, X being a chalcogen element, and n being between 0.5 and 2.

A semiconductor package including a redistribution substrate extending in a first direction and a second direction perpendicular to the first direction, a semiconductor chip mounted on a top surface of the redistribution substrate, and an outer terminal on a bottom surface of the redistribution substrate. The redistribution substrate may include an under-bump pattern, a redistribution insulating layer covering a top surface and a side surface of the under-bump pattern, a protection pattern interposed between the top surface of the under-bump pattern and the redistribution insulating layer, and interposed between the side surface of the under-bump pattern and the redistribution insulating layer, and a redistribution pattern on the under-bump pattern. The outer terminal may be disposed on a bottom surface of the under-bump pattern.

Disclosed are semiconductor packages and their fabricating methods. A semiconductor package includes a semiconductor chip on a redistribution substrate. The redistribution substrate includes a base dielectric layer and upper coupling pads in the base dielectric layer. Top surfaces of the upper coupling pads are coplanar with a top surface of the base dielectric layer. The semiconductor chip includes a redistribution dielectric layer and redistribution chip pads in the redistribution dielectric layer. Top surfaces of the redistribution chip pads are coplanar with a top surface of the redistribution dielectric layer. The top surface of the redistribution dielectric layer is bonded to the top surface of the base dielectric layer. The redistribution chip pads are bonded to the upper coupling pads. The redistribution chip pads and the upper coupling pads include a same metallic material. The redistribution dielectric layer and the base dielectric layer include a photosensitive polymer layer.

Disclosed are semiconductor packages and their fabricating methods. The method includes preparing a semiconductor chip with a pillar pattern on a bottom surface thereof, placing the semiconductor chip side by side with a connection substrate with a conductive pad on a bottom surface thereof, forming a molding layer on the bottom surfaces of the connection substrate and the semiconductor chip to cover the pillar pattern and the conductive pad, forming a first redistribution substrate on top surfaces of the connection substrate, the semiconductor chip, and the molding layer and directly in physical contact with the top surface of the semiconductor chip, and performing a grinding process on a bottom surface of the molding layer to expose the pillar pattern and the conductive pad. An outer sidewall of the connection substrate is vertically aligned with that of the first redistribution substrate.

Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a package substrate, and a die, electrically coupled to the package substrate, including a silicon substrate having a first surface and an opposing second surface; a device layer at the first surface of the silicon substrate; and a dielectric layer, having a heater trace, at the second surface of the silicon substrate.

A semiconductor package includes a redistribution substrate having a first redistribution layer, a semiconductor chip on the redistribution substrate and connected to the first redistribution layer, a vertical connection conductor on the redistribution substrate and electrically connected to the semiconductor chip through the first redistribution layer, a core member having a first through-hole accommodating the semiconductor chip and a second through-hole accommodating the vertical connection conductor, and an encapsulant covering at least a portion of each of the semiconductor chip, the vertical connection conductor, and the core member, the encapsulant filling the first and second through-holes, wherein the vertical connection conductor has a cross-sectional shape with a side surface tapered to have a width of a lower surface thereof is narrower than a width of an upper surface thereof, and the first and second through-holes have a cross-sectional shape tapered in a direction opposite to the vertical connection conductor.

Disclosed is a semiconductor device comprising a semiconductor substrate, an under-bump pattern on the semiconductor substrate and including a first metal, a bump pattern on the under-bump pattern, and an organic dielectric layer on the semiconductor substrate and in contact with a sidewall of the bump pattern. The bump pattern includes a support pattern in contact with the under-bump pattern and having a first width, and a solder pillar pattern on the support pattern and having a second width. The first width is greater than the second width. The support pattern includes at least one of a solder material and an intermetallic compound (IMC). The intermetallic compound includes the first metal and the solder material.

A semiconductor package includes: a package substrate; a semiconductor chip mounted above the package substrate; a chip connection terminal interposed between the semiconductor chip and the package substrate; an adhesive layer disposed on the package substrate and that covers a side and a top surface of the semiconductor chip and surrounds the chip connection terminal between the semiconductor chip and the package substrate; a molding layer disposed on the package substrate and that surrounds the adhesive layer; an interposer mounted on the adhesive layer and the molding layer, where the interposer includes an interposer substrate; and a conductive pillar disposed on the package substrate, where the conductive pillar surrounds the side of the semiconductor substrate, penetrates the molding layer in a vertical direction and connects the package substrate to the interposer substrate.

A semiconductor package includes a semiconductor chip including a connecting pad, a mold layer covering the semiconductor chip, a lower redistribution layer on the semiconductor chip and the mold layer, and a connecting terminal on the lower redistribution layer. The lower redistribution layer includes a first lower insulating layer, a first conformal redistribution pattern extending through the first lower insulating layer, a second lower insulating layer on the first lower insulating layer and the first conformal redistribution pattern, and a first filled redistribution pattern disposed on the first conformal redistribution pattern and extending through the second lower insulating layer. A side surface of the first filled redistribution pattern is spaced apart from an inner side surface of the first conformal redistribution pattern. The second lower insulating layer is between the inner side surface of the first conformal redistribution pattern and the side surface of the first filled redistribution pattern.

Exemplary package on package (PoP) assemblies may include a substrate. The PoP assemblies may include a first package positioned on a first side of the substrate with a bottom surface of the first package facing the substrate. The PoP assemblies may include a second package positioned on a second side of the substrate with a top surface of the second package facing the substrate. The second side may be positioned opposite the first side. The PoP assemblies may include a conductive element that contacts one or both of a top surface and the bottom surface of the second package and extends to a position that is aligned with or above a top surface of the first package.