A semiconductor device structure, along with methods of forming such, are described. In one embodiment, a semiconductor device structure is provided. The semiconductor device structure includes a substrate having a front side and a back side opposing the front side, a gate stack disposed on the front side of the substrate, and a first source/drain feature and a second source/drain feature disposed in opposing sides of the gate stack. Each first source/drain feature and second source/drain feature comprises a first side and a second side, and a portion of the back side of the substrate is exposed to an air gap.

A semiconductor package includes a lower redistribution layer, a lower semiconductor chip and a plurality of conductive connection structures attached to the lower redistribution layer. An upper redistribution layer is disposed on the lower semiconductor chip and the plurality of conductive connection structures. An upper semiconductor chip has an active plane corresponding to an active plane of the lower semiconductor chip and is disposed on the upper redistribution layer. The lower semiconductor chip includes a semiconductor substrate having a first surface and a second surface opposite to the first substrate. An upper wiring structure is disposed on the first surface of the semiconductor substrate. A buried power rail fills a portion of a buried rail hole extending from the first surface toward the second surface. A through electrode fills a through hole extending from the second surface toward the first surface.

In some examples, a device comprises at least two semiconductor die, wherein each respective semiconductor die of the at least two semiconductor die comprises at least two power transistors, an input node on a first side of the respective semiconductor die, a reference node on the first side of the respective semiconductor die, and a switch node on a second side of the respective semiconductor die. The device further comprises a first conductive element electrically connected to the respective input nodes of the at least two semiconductor die. The device further comprises a second conductive element electrically connected to the respective reference nodes of the at least two semiconductor die.

A vertical transistor device and its fabrication method are provided. The vertical transistor device includes a semiconductor substrate, first sources/drains and second sources/drains. The semiconductor substrate includes a bottom portion and a fin portion. The fin portion is located on the bottom portion. The fin portion includes an upper portion and a lower portion located between the bottom portion of the semiconductor substrate and the upper portion. The lower portion includes a narrow portion having a width smaller than a width of the upper portion, and the narrow portion contacts an interface portion of the upper portion. The sources/drains are disposed on the on the narrow portion of the lower portion of the fin portion. In the method for fabricating the vertical transistor device, the lower portions of the fin portions are patterned to form the narrow portions where the sources are disposed.

A semiconductor device includes a gate pattern on a substrate, a multi-channel active pattern under the gate pattern to cross the gate pattern and having a first region not overlapping the gate pattern and a second region overlapping the gate pattern, a diffusion layer in the multi-channel active pattern along the outer periphery of the first region and including an impurity having a concentration, and a liner on the multi-channel active pattern, the liner extending on lateral surfaces of the first region and not extending on a top surface of the first region. Related fabrication methods are also described.

The present disclosure generally relates to semiconductor structures and, more particularly, to finFETs with strained channels and reduced on state resistances and methods of manufacture. The structure includes: a plurality of fin structures comprising doped source and drain regions with a diffusion blocking layer between the doped source and drain regions and an underlying fin region formed within dielectric material.

The present disclosure generally relates to semiconductor structures and, more particularly, to finFETs with strained channels and reduced on state resistances and methods of manufacture. The structure includes: a plurality of fin structures comprising doped source and drain regions with a diffusion blocking layer between the doped source and drain regions and an underlying fin region formed within dielectric material.

Embodiments of the present disclosure describe techniques for backside isolation for devices of an integrated circuit (IC) and associated configurations. The IC may include a plurality of devices (e.g., transistors) formed on a semiconductor substrate. The semiconductor substrate may include substrate regions on which one or more devices are formed. Trenches may be disposed between the devices on the semiconductor substrate. Portions of the semiconductor substrate between the substrate regions may be removed to expose the corresponding trenches and form isolation regions. An insulating material may be formed in the isolation regions. Other embodiments may be described and/or claimed.

A semiconductor device includes active fins on a substrate. Gate lines each extend in the second direction on the active fins. A contact plug is positioned on the active fins. A first via is in one of the first contact plugs. A first conductive line overlaps a first via. A first distance from a first active fin on which a first gate line of the gate lines is formed to an end of the first gate line is more than a predetermined distance. A second distance from a second active fin on which the first gate line is formed to the first active fin of the active fins is equal to or less than the predetermined distance. The second active fin is spaced apart from the first contact plugs to not overlap the first contact plugs.

A method of fabricating a vertical field effect transistor comprising that includes forming openings through a spacer material to provide fin structure openings to a first semiconductor material, and forming an inner spacer liner on sidewalls of the fin structure openings. A channel semiconductor material is epitaxially formed on a surface of the first semiconductor material filling at least a portion of the fin structure openings. The spacer material is recessed with an etch that is selective to the inner spacer liner to form a first spacer. The inner spacer liner is removed selectively to the channel semiconductor material. A gate structure on the channel semiconductor material, and a second semiconductor material is formed in contact with the channel semiconductor material.