Patent classifications
H03H2003/0435
METHOD OF MANUFACTURING BULK ACOUSTIC WAVE DEVICE WITH ATOMIC LAYER DEPOSITION OF PIEZOELECTRIC LAYER
Aspects of this disclosure relate to method of manufacturing a bulk acoustic wave device. The method can include providing a bulk acoustic wave device structure including a first piezoelectric layer and forming a second piezoelectric layer over the first piezoelectric layer by atomic layer deposition. The second piezoelectric layer can have an opposite polarization relative to the first piezoelectric layer.
BULK ACOUSTIC WAVE DEVICE WITH PIEZOELECTRIC LAYER FORMED BY ATOMIC LAYER DEPOSITION
Aspects of this disclosure relate to a bulk acoustic wave device with a plurality of piezoelectric layers having at least one polarization inversion. The bulk acoustic wave device can include a first piezoelectric layer and a second piezoelectric layer over the first piezoelectric layer. The second piezoelectric layer can be formed by atomic layer deposition. The second piezoelectric layer can have an opposite polarization relative to the first piezoelectric layer. Related filters, multiplexers, packaged radio frequency modules, radio frequency front ends, wireless communication devices, and methods are disclosed.
BULK ACOUSTIC WAVE RESONATOR WITH MODIFIED OUTER REGION
The present disclosure provides a bulk acoustic wave resonator comprising a piezoelectric layer and a top electrode disposed on a first surface of the piezoelectric layer. The bulk acoustic wave resonator has a central region, a first outer region, and a first raised frame region between the central region and the first outer region. The top electrode has a first thickness within the central region, a second thickness within the first raised frame region, and a third thickness within the first outer region, the second thickness being greater than both the first thickness and the third thickness. A die, filter, radio-frequency module and wireless mobile device are also provided.
BULK ACOUSTIC WAVE RESONATOR WITH REDUCED PERIMETER LEAKAGE
A bulk acoustic wave resonator having a central region, an outer region, and a raised frame region between the central region and the outer region is disclosed. The bulk acoustic wave resonator can include a piezoelectric layer and a top electrode over the piezoelectric layer. The top electrode is disposed at least in the central region, the outer region, and the raised frame region. The top electrode is configured such that a resonant frequency in the outer region is higher than a resonant frequency in the central region.
Bulk-acoustic resonator and elastic wave filter device
A bulk-acoustic resonator includes: a substrate; a first electrode disposed on the substrate; a piezoelectric layer at least partially covering the first electrode, and including a flat portion disposed in a central region, and an extension portion disposed outside the flat portion and having at least one step portion; an insertion layer disposed on the extension portion; and a second electrode disposed on upper portions of the insertion layer and the piezoelectric layer. The extension portion includes at least one first surface and at least one second surface disposed below an upper surface of the flat portion, and a connection surface connecting an upper surface of the flat portion to the at least one first surface or the at least one second surface, or connecting first surfaces among the at least one first surface to each other or second surfaces among the at least one second surface to each other.
Resonator and resonance device
A resonator includes a vibration portion with a vibration arm extending from a base and having an open end that performs bending vibration. The vibration portion includes upper and lower electrodes with a piezoelectric film disposed therebetween that causes bending vibration of the vibration arm when a voltage is applied between the upper and lower electrodes. A protective film faces the piezoelectric film with the upper electrode interposed therebetween and a conductive film faces the piezoelectric film with the protective film interposed therebetween. Moreover, the conductive film is exposed in a region at the open end and a via electrode is formed in the protective film to electrically connect the conductive film to one of the upper and lower electrodes. The via electrode is positioned closer to a first region than the open end in the second region of the vibration arm in a plan view of the piezoelectric film.
PISTON MODE GENERATION IN THIN PLATE LAMB WAVE DEVICE
An acoustic wave resonator comprises a plurality of interdigital transducer (IDT) electrodes disposed on upper and lower sides of a piezoelectric film, the IDT electrodes on the upper side of the piezoelectric film being offset from the IDT electrodes on the lower side of the piezoelectric film by λ/4, λ being a wavelength of a main acoustic wave generated by the acoustic wave resonator to enable the acoustic wave resonator to generate piston mode acoustic waves responsive to electrical excitation of the plurality of IDT electrodes with an alternating current.
TRANSVERSELY-EXCITED FILM BULK ACOUSTIC RESONATOR WITH MULTIPLE DIAPHRAGM THICKNESSES AND FABRICATION METHOD
Filter devices and methods are disclosed. A filter device includes a substrate and a piezoelectric plate attached to the substrate, the piezoelectric plate forming diaphragms spanning respective cavities in the substrate. A first portion of the piezoelectric plate has a first thickness. A front surface of a second portion of the piezoelectric plate is recessed relative to a front surface of the first portion of the piezoelectric plate such that the second portion of the piezoelectric plate has a second thickness less than the first thickness. A conductor pattern is formed on the front surfaces of the first and second portions of the piezoelectric plate. The conductor pattern includes a first interdigital transducer (IDT) with interleaved fingers on a diaphragm having the first thickness, and a second IDT with interleaved fingers on a diaphragm having the second thickness.
Monolithic Integrated BAW Resonator Production Method
This application provides a monolithic integrated BAW resonator production method, including: preparing an imprint template; forming a mask material layer on a substrate; pressing the mask material layer by using the imprint template in a direction of the substrate, to form a mask groove; performing plasma etching on the substrate by using the mask material layer, as a mask, that is used to form the mask groove, to form, on the substrate, grooves that one-to-one correspond to positions of several mask grooves; and forming, in the several grooves, bottom electrode layers, piezoelectric layers, and top electrode layers that are sequentially stacked, to form resonators of different frequencies.
Vibration element and oscillator
A vibration element includes: a quartz crystal substrate having a first vibration part and a second vibration part; a pair of first excitation electrodes formed at two main surfaces of the quartz crystal substrate, at the first vibration part; and a pair of second excitation electrodes formed in such a way as to sandwich the second vibration part in a direction of thickness of the quartz crystal substrate, at the second vibration part. At least one second excitation electrode of the pair of second excitation electrodes is formed at an inclined surface inclined to at least one of the two main surfaces.