H03H2003/0442

FILM BULK ACOUSTIC RESONATOR FABRICATION METHOD
20210328575 · 2021-10-21 ·

Methods of fabricating acoustic filters are disclosed. The back of a piezoelectric plate is bonded to a surface of a substrate. The thickness of the piezoelectric plate is measured at a plurality of positions. Excess material is removed from the front surface of the piezoelectric plate in accordance with the thickness measurements to improve the thickness uniformity of the piezoelectric plate. After removing the excess material, a conductor pattern including a plurality of ladder filter circuits is formed on the front surface. Each ladder filter circuit includes at least one shunt resonator and at least one series resonator, each of which has an interdigital transducer (IDT). Cavities are formed in the substrate such that portions of the piezoelectric plate form a plurality of diaphragms spanning respective cavities. After the cavities are formed, interleaved fingers of each IDT are on a respective one of the plurality of diaphragms.

Transversely-excited film bulk acoustic resonator with reduced spurious modes

Acoustic filters, resonators and methods are disclosed. An acoustic resonator device includes a substrate having a surface. A back surface of a single-crystal piezoelectric plate is attached to the surface of the substrate except for a portion of the piezoelectric plate forming a diaphragm that spans a cavity in the substrate. A conductor pattern is formed on the front surface of the piezoelectric plate, the conductor pattern including an interdigital transducer (IDTs), interleaved fingers of the IDT disposed on the diaphragm. A pitch of the interleaved fingers and a mark of the interleaved fingers are set in combination such that a resonance frequency of the acoustic resonator is equal to a predetermined target frequency.

Film bulk acoustic resonator fabrication method

Methods of fabricating acoustic resonators are disclosed. A back surface of a piezoelectric plate is bonded to a surface of a substrate. Thickness measurements are made at a plurality of positions on the piezoelectric plate. Excess material is removed from the front surface of the piezoelectric plate in accordance with the thickness measurements to improve a thickness uniformity of the piezoelectric plate. A conductor pattern is formed on the front surface, the conductor pattern including a plurality of interdigital transducers (IDTs) of a plurality of resonators. Cavities are formed in the substrate such that portions of the single-crystal piezoelectric plate form a plurality of diaphragms spanning respective cavities, wherein interleaved fingers of each IDT of the plurality of IDTs are disposed on a respective one of the plurality of diaphragms.

BULK ACOUSTIC RESONATOR

A bulk acoustic resonator includes: a substrate; a first electrode disposed on the substrate; a piezoelectric layer disposed to cover at least a portion of the first electrode; a second electrode disposed to cover at least a portion of the piezoelectric layer; a metal pad connected to the first electrode and the second electrode; and a protective layer disposed to cover at least the metal pad.

TRANSVERSELY-EXCITED FILM BULK ACOUSTIC RESONATOR WITH REDUCED SPURIOUS MODES

Acoustic filters, resonators and methods of making acoustic filters are disclosed. An acoustic resonator device includes a substrate. A back surface of a piezoelectric plate is attached to the substrate, a portion of the piezoelectric plate forming a diaphragm that spans a cavity in the substrate. A conductor pattern is formed on the front surface of the piezoelectric plate, the conductor pattern including an interdigital transducer (IDTs) with interleaved fingers of the IDT disposed on the diaphragm. A ratio of the mark of the interleaved fingers to the pitch of the interleaved fingers is greater than or equal to 0.2 and less than or equal to 0.3.

TRANSVERSELY-EXCITED FILM BULK ACOUSTIC RESONATOR WITH REDUCED SPURIOUS MODES

Acoustic filters, resonators and methods are disclosed. An acoustic resonator includes a substrate and a piezoelectric plate including a diaphragm that spans a cavity in the substrate. A conductor pattern includes an interdigital transducer (IDT) with interleaved parallel fingers on the diaphragm. A ratio of a width of either of two adjacent parallel fingers and a center-to-center spacing between the two adjacent parallel fingers is greater than or equal to 0.2 and less than or equal to 0.3.

TRANSVERSELY-EXCITED FILM BULK ACOUSTIC RESONATOR WITH REDUCED SPURIOUS MODES

Acoustic filters, resonators and methods are disclosed. An acoustic resonator includes a substrate and a piezoelectric plate includes a diaphragm that spans a cavity in the substrate. A conductor pattern includes an interdigital transducer (IDT) with interleaved parallel fingers on the diaphragm. A center-to-center spacing between two adjacent parallel fingers is greater than or equal to 2.5 times a thickness of the diaphragm and less than or equal to 15 times the diaphragm thickness.

Transversely-excited film bulk acoustic resonator

Acoustic resonator devices and filters are disclosed. An acoustic resonator includes a substrate having a surface and a single-crystal piezoelectric plate having parallel front and back surfaces, the back surface attached to the surface of the substrate except for a portion of the piezoelectric plate forming a diaphragm that spans a cavity in the substrate. An interdigital transducer (IDT) is formed on the front surface of the single-crystal piezoelectric plate such that interleaved fingers of the IDT are disposed on the diaphragm. The IDT is configured to excite a primary acoustic mode in the diaphragm in response to a radio frequency signal applied to the IDT. A direction of acoustic energy flow of the primary acoustic mode is substantially orthogonal to the front and back surfaces of the diaphragm. The diaphragm is contiguous with the piezoelectric plate around at least 50% of a periphery of the diaphragm.

Bulk Acoustic Wave Filter and a Method of Frequency Tuning for Bulk Acoustic Wave Resonator of Bulk Acoustic Wave Filter
20210281233 · 2021-09-09 ·

A bulk acoustic wave filter comprises a substrate, an insulating layer disposed on the substrate and having a first cavity and a second cavity formed therein, a first bulk-acoustic-wave-resonance-structure disposed on the first cavity and a second bulk-acoustic-wave-resonance-structure disposed on the second cavity. The first bulk-acoustic-wave-resonance-structure comprises a first bottom electrode disposed on the first cavity, a first top electrode disposed on the first bottom electrode, a first piezoelectric layer portion sandwiched between the first top electrode and the first bottom electrode, and a first frequency tuning structure disposed between the first cavity and the first bottom electrode. The second bulk-acoustic-wave-resonance-structure comprises a second bottom electrode disposed on the second cavity, a second top electrode disposed on the second bottom electrode, a second piezoelectric layer portion sandwiched between the second top electrode and the second bottom electrode.

Frequency adjustment method for piezoelectric resonator device
11075611 · 2021-07-27 · ·

An object is to provide a frequency adjustment method for a piezoelectric resonator device that is applicable to a microminiaturized device and that can adjust the frequency without deteriorating the accuracy of frequency adjustment. A frequency adjustment method for a tuning-fork quartz resonator is applicable to a tuning-fork quartz resonator that includes a tuning-fork quartz resonator piece having a pair of resonator arms 31, 32 and metallic adjustment films W formed on the resonator arms. The frequency adjustment method adjusts the frequency by reduction of a mass of the metallic adjustment films W. The frequency adjustment method includes: a rough adjustment step for roughly adjusting the frequency by partially thinning or removing the metallic adjustment films W; and a fine adjustment step for finely adjusting the frequency by at least partially thinning or removing products W1, W2 derived from the metallic adjustment film W during the rough adjustment step.