The present disclosure relates to integrated circuits which include various structural elements designed to reduce the impact of strain on the electronic components of the circuit. In particular, a combination of trenches and cavities are used to mechanically isolate the integrated circuit from the surrounding substrate. The trenches may be formed such that they surround the integrated circuit, and the cavities may be formed under the integrated circuit. As such, the integrated circuit may be formed on a portion of the substrate that forms a platform. In order that the platform does not move, it may be tethered to the surrounding substrate. By including such mechanical elements, variation in the electrical characteristics of the integrated circuit are reduced.

Embodiments provide a semiconductor structure and a fabricating method. The semiconductor structure includes: a substrate, where a trench is formed in the substrate; a conductive layer positioned in the trench, where the conductive layer includes a first conductive layer and a second conductive layer, the second conductive layer is positioned on the first conductive layer, and a projection area of a bottom of the second conductive layer within the trench is greater than a projection area of a top of the first conductive layer within the trench; a dielectric layer positioned between the conductive layer and an inner wall of the trench, where a top of the dielectric layer is lower than the top of the first conductive layer; an isolation layer positioned on the conductive layer; and a void defined by the isolation layer, the conductive layer, the dielectric layer, and a side wall of the trench.

An electronic assembly, having a carrier wafer with a top wafer surface and a bottom wafer surface; an electronic integrated circuit being formed in the carrier wafer and comprising first and second integrated circuit contact pads; said carrier wafer comprising a through-wafer cavity having walls that join said top wafer surface to said bottom wafer surface; first and second component chips held in said through-wafer cavity each by direct contact of at least a side surface of said first and second component chips with a heat conducting attachment material that fills said through-wafer cavity; said first and second component chips comprising respectively at least a first and a second component contact pads; a barrier having a heat conductivity lower than a heat conductivity of said carrier wafer held by said heat conducting attachment material in said through-wafer cavity between said first and said second component chips.