A semiconductor device including: a semiconductor substrate including an active region; a plurality of conductive structures formed over the semiconductor substrate; an isolation layer filling a space between the conductive structures and having an opening that exposes the active region between the conductive structures; a pad formed in a bottom portion of the opening and in contact with the active region; a plug liner formed conformally over a sidewall of the opening and exposing the pad; and a contact plug formed over the pad inside the opening,

The present invention discloses a high-threshold power semiconductor device and a manufacturing method thereof. The high-threshold power semiconductor device includes, in sequence from bottom to top: a metal drain electrode, a substrate, a buffer layer, and a drift region; further including: a composite column body which is jointly formed by a drift region protrusion, a columnar p-region and a columnar n-region on the drift region, a channel layer, a passivation layer, a dielectric layer, a heavily doped semiconductor layer, a metal gate electrode and a source metal electrode. The composite column body is formed by sequentially depositing a p-type semiconductor layer and an n-type semiconductor layer on the drift region and then etching same. The channel layer and the passivation layer are formed in sequence by deposition. Thus, the above devices are divided into a cell region and a terminal region. The dielectric layer, the heavily doped semiconductor layer, the metal gate electrode and the source metal electrode only exist in the cell region, and the passivation layer of the terminal region extends upwards and is wrapped outside the channel layer. This structure can increase a threshold voltage of the device, improve the blocking characteristics of the device and reduce the size of a gate capacitance.

Gallium nitride (GaN) integrated circuit technology with resonators is described. In an example, an integrated circuit structure includes a layer or substrate including gallium and nitrogen. A first plurality of electrodes is over the layer or substrate. A resonator layer is on the first plurality of electrodes, the resonator layer including aluminum and nitrogen. A second plurality of electrodes is on the resonator layer. Individual ones of the second plurality of electrodes are vertically over and aligned with corresponding individual ones of the first plurality of electrodes.

A semiconductor device with different configurations of gate structures and a method of fabricating the semiconductor device are disclosed. The semiconductor device includes a stack of nanostructured channel regions disposed on a fin structure, a first gate structure disposed within the stack of nanostructured channel regions, a second gate structure surrounds the first gate structure about a first axis and surrounds the nanostructured channel regions about a second axis different from the first axis, and first and second contact structures disposed on the first and second gate structures, respectively.

Sub-fin isolation schemes for gate-all-around (GAA) transistor devices are provided herein. In some cases, the sub-fin isolation schemes include forming one or more dielectric layers between each of the source/drain regions and the substrate. In some such cases, the one or more dielectric layers include material native to the gate sidewall spacers, for example, or other dielectric material. In other cases, the sub-fin isolation schemes include substrate modification that results in oppositely-type doped semiconductor material under each of the source/drain regions and in the sub-fin. The oppositely-type doped semiconductor material results in the interface between that material and each of the source/drain regions being a p-n or n-p junction to block the flow of carriers through the sub-fin. The various sub-fin isolation schemes described herein enable better short channel characteristics for GAA transistors (e.g., employing one or more nanowires, nanoribbons, or nanosheets), thereby improving device performance.

Disclosed herein are IC structures, packages, and devices that include planar III-N transistors with wrap-around gates and/or one or more wrap-around source/drain (S/D) contacts. An example IC structure includes a support structure (e.g., a substrate) and a planar III-N transistor. The transistor includes a channel stack of a III-N semiconductor material and a polarization material, provided over the support structure, a pair of S/D regions provided in the channel stack, and a gate stack of a gate dielectric material and a gate electrode material provided over a portion of the channel stack between the S/D regions, where the gate stack at least partially wraps around an upper portion of the channel stack.

Techniques in accordance with embodiments described herein are directed to semiconductor devices including a layer of aluminum nitride AlN or aluminum gallium nitride AlGaN as a ferroelectric layer and a method of making a thin film of AlN/AlGaN that possesses ferroelectric properties. In a ferroelectric transistor, a thin film of AlN/AlGaN that exhibits ferroelectric properties is formed between a gate electrode and a second semiconductor layer, e.g., of GaN.

There is a problem that an area of a principal current cell is reduced by an area of a bonding pad wiring layer for a sub-cell. A source electrode 9b of a current detection cell 22 is electrically connected to a bonding pad wiring layer 12 formed on an interlayer insulating film 10 via a wiring layer contact 11. The bonding pad wiring layer 12 is formed with respect to a source electrode 9a of a principal current cell 21 so as to cover a part of the source electrode 9a via the interlayer insulating film 10. As a result, the source electrode 9b is miniaturized, and a size of the source electrode 9b is made substantially equal to a size of the current detection cell 22. Therefore, the current detection cell 22 and the principal current cell 21 are disposed close to each other.

A field effect transistor includes a gate dielectric and a gate electrode overlying an active region and contacting a sidewall of a trench isolation structure. The transistor may be a fringeless transistor in which the gate electrode does not overlie a portion of the trench isolation region. A planar dielectric spacer plate and a conductive gate cap structure may overlie the gate electrode. The conductive gate cap structure may have a z-shaped vertical cross-sectional profile to contact the gate electrode and to provide a segment overlying the planar dielectric spacer plate. Alternatively or additionally, a conductive gate connection structure may be provided to provide electrical connection between two electrodes of adjacent field effect transistors.

It is an object to provide a liquid crystal display device which has excellent viewing angle characteristics and higher quality. The present invention has a pixel including a first switch, a second switch, a third switch, a first resistor, a second resistor, a first liquid crystal element, and a second liquid crystal element. A pixel electrode of the first liquid crystal element is electrically connected to a signal line through the first switch. The pixel electrode of the first liquid crystal element is electrically connected to a pixel electrode of the second liquid crystal element through the second switch and the first resistor. The pixel electrode of the second liquid crystal element is electrically connected to a Cs line through the third switch and the second resistor. A common electrode of the first liquid crystal element is electrically connected to a common electrode of the second liquid crystal element.