The present disclosure relates to a three-dimensional (3D) memory and a fabrication method thereof. The method includes forming a memory chip on a first substrate, disposing a first semiconductor layer on the memory chip, forming a plurality of first contacts through the first semiconductor layer, forming a first peripheral circuit chip based on the first semiconductor layer, disposing a second semiconductor layer on the first peripheral circuit chip, forming a plurality of second contacts through the second semiconductor layer, and forming a second peripheral circuit chip based on the second semiconductor layer. The first peripheral circuit chip is electrically connected with the memory chip through the plurality of first contacts, and the second peripheral circuit chip is electrically connected with the memory chip through the plurality of first and second contacts.

A three-dimensional memory device includes a first three-dimensional memory plane including first alternating stacks of first insulating layers and first word lines, and first bit lines electrically connected first vertical semiconductor channels, and a second three-dimensional memory plane including second alternating stacks of second insulating layers and second word lines and second bit lines electrically connected to second vertical channels. An inter-array backside trench laterally extend between the first three-dimensional memory plane and the second three-dimensional memory plane, and filled with an inter-array backside insulating material portion that provides electrical isolation between the three-dimensional memory planes.

Apparatuses and techniques are presented for detecting bit line open circuits and short circuits in a memory device in which a memory die is inverted and bonded to a control die. In one approach, the control die comprises a set of bit lines which are connected to a set of bit lines of the memory die, and the set of bit lines of the control die comprise ground transistors, e.g., transistors connected to a ground node. Ground transistors of even-numbered bit lines may be commonly controlled, while ground transistors of odd-numbered bit lines are commonly controlled. The ground transistors may be controlled to detect open circuits and short circuits in the bit lines of the control die and the memory die. A laser scanning technique can also be used to determine a physical location of a defect of a bit line.

A three-dimensional semiconductor memory device, including a peripheral circuit structure including a first metal pad and a cell array structure disposed on the peripheral circuit structure and including a second metal pad. The peripheral circuit structure may include a first substrate including a first peripheral circuit region and a second peripheral circuit region, first contact plugs, second contact plugs, and a first passive device on and electrically connected to the second contact plugs. The cell array structure may include a second substrate disposed on the peripheral circuit structure, the second substrate including a cell array region and a contact region. The cell array structure may further include gate electrodes and cell contact plugs. The first passive device is vertically between the gate electrodes and the second contact plugs and includes a first contact line. The first metal pad and the second metal pad may be connected by bonding manner.

A memory device is provided. The memory device includes a first structure and a second structure stacked on the first structure in a vertical direction. The first structure includes a first substrate, peripheral circuitry, an auxiliary memory cell array, a first insulating layer, and a plurality of first bonding pads. The second structure includes a second substrate, a main memory cell array, a second insulating layer, and a plurality of second bonding pads. The plurality of first bonding pads are in contact with the plurality of second bonding pads, respectively.

A three-dimensional (3D) storage device using wafer-to-wafer bonding is disclosed. In the storage device, a first chip including a peripheral circuit region including a first control logic circuit configured to control operation modes of a nonvolatile memory (NVM) device is wafer-bonded with a second chip including 3D arrays of NVM cells, and a memory controller includes a third chip including a control circuit region. The control circuit region of the third chip includes a second control logic circuit associated with operation conditions of the NVM device, and the second control logic circuit includes a serializer/deserializer (SERDES) interface configured to share random access memory (RAM) in the memory controller and transmit and receive data to and from the NVM device.

According to one embodiment, a semiconductor device includes a first substrate, a second substrate joined to the first substrate. A first region of the semiconductor device that includes a peripheral circuit is between the first substrate and the second substrate. A second region that includes a memory cell array is between the first region and the second substrate. A layer that is embedded in the second substrate has a Young's modulus that is higher than that of silicon and/or an internal stress that is higher than that of silicon oxide.

A memory device and a method for programming the same may include, applying program loops to a plurality of memory cells of the memory device to adjust threshold voltages of the plurality of memory cells to desired target states, each of the program loops including a program section and a verification section, programming the memory cells of a first page, storing a number of first program loops used to complete the programming of the memory cells of the first page to a first target state, programming the memory cells of a second page to the first target state, the second page adjacent to the first page, and performing a verification operation on the second page.

Aspects of the disclosure relate to forming stacked NAND with multiple memory sections. Forming the stacked NAND with multiple memory sections may include forming a first memory section on a sacrificial substrate. A logic section may be formed on a substrate. The logic section may be bonded to the first memory section. The sacrificial substrate may be removed from the first memory section and a second memory section having a second sacrificial substrate may be formed and bonded to the first memory section.

According to an exemplary embodiment of the inventive concept, there is provided a nonvolatile memory device comprising: a memory cell region including a first metal pad, a peripheral circuit region including a second metal pad and vertically connected to the memory cell region by the first metal pad and the second metal pad, a memory cell array, in the memory cell region, comprising a plurality of memory cells, a plurality of word lines and a bit line connected to the memory cells, wherein each memory cell is connected to one of the word lines, a voltage generator, in the peripheral circuit region, supplying a plurality of supply voltages to the memory cell array, a control logic circuit, in the peripheral circuit region, programming a selected one of the memory cells connected to a selected one of the word lines into a first program state by controlling the voltage generator, and a verify circuit, in the peripheral circuit region, controlling a verify operation on the memory cell array by controlling the voltage generator, wherein the verify circuit controls a word line voltage applied to at least one unselected word line not to be programmed among the plurality of word lines in the verify operation and a bit line voltage applied to the bit line connected differently from a voltage level of a voltage applied in a read operation of the nonvolatile memory device.