Patent classifications
Y10T137/2931
Fluid handling structure, a lithographic apparatus and a device manufacturing method
A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening at least partly surrounding and radially outward of the meniscus pinning feature; and optionally a gas recovery opening radially outward of the gas supply opening, wherein the gas supply opening, or the gas recovery opening, or both the gas supply opening and the gas recovery opening, has an open area per meter length which has a variation peripherally around the space.
Two-part, syringe-based electrochemical dispenser
A Two-part, Syringe-based Electrochemical Dispenser. The dispenser consists of a disposable syringe-like fluid storage reservoir and a reusable fluid driver. The driver is located at the proximal end of a conventional syringe; the fluid exit port at the distal end. The driver generates a gas that inflates an elongated bladder situated within the filled syringe. Expansion of the bladder releases liquid at a rate nearly identical to the gas generation rate. The dispenser is held in a vertical position with the distal end pointed downward. Liquid is released drop-wise onto a porous material from which it can evaporate. A battery-driven electrochemical oxygen generator is the gas source. Means to attach the dispenser in its vertical position are provided. Such dispensing devices can be used to release pheromones, repellants, insecticides, fragrances, etc.
Chamber pressure control apparatus for chemical vapor deposition systems
In one embodiment, a pressure control assembly includes a cylindrical hollow body having an opening to receive a ballast gas, a first and second flange, and a first and second cone. The first flange is coupled to a first end of the body, and a second flange is coupled to an opposing end of the body. The first cone is coupled to the first flange, and the second cone is coupled to the second flange. A method for controlling pressure in a chamber includes measuring a pressure of the chamber and a pressure of an exhaust system coupled to the chamber. The method includes dynamically adjusting the pressure in the exhaust system in order to adjust the pressure in the chamber, by creating a first pressure drop that is greater than a second pressure drop in the exhaust system.