Provided are an apparatus and method for treating wafers using a supercritical fluid. The wafer treatment apparatus includes a plurality of chambers; a first supply supplying a first fluid in a supercritical state; a second supply supplying a mixture of the first fluid and a second fluid; a plurality of first and second valves; and a controller selecting a first chamber of the plurality of chambers for wafer treatment to control the open/closed state of each of the plurality of first valves so that the first fluid can be supplied only to the first chamber of the plurality of chambers and selecting a second chamber of the plurality of chambers to control the open/closed state of each of the plurality of second valves so that the mixture of the first fluid and a second fluid can be supplied only to the second chamber of the plurality of chambers. The wafer treatment method involves performing a predetermined treatment such as etching, cleaning or drying on wafers within only one of the plurality of chambers, followed by wafer treatment on the succeeding chamber, and thus allowing for sequential wafer treatment within each of the plurality of chambers.

A cargo rack for transferring loads between a marine vessel and an offshore marine platform (for example, oil and gas well drilling or production platform) provides a frame having a front, a rear, and upper and lower end portions. The lower end of the frame has a perimeter beam base, a raised floor and a pair of open-ended parallel fork tine tubes or sockets that communicate with the perimeter beam at the front and rear of the frame, preferably being structurally connected (e.g., welded) thereto. Openings in the perimeter beam base align with the forklift tine tubes or sockets. The frame includes a plurality of fixed side walls extending upwardly from the perimeter beam that include at least left and right side walls. A plurality of gates are movably mounted on the frame including a gate at least at the front and at least at the rear of the frame, each gate being movable between open and closed positions, the gates enabling a forklift to place loads on the floor by accessing either the front of the frame or the rear of the frame. Each gate can be pivotally attached to a fixed side wall. The frame has vertically extending positioning beams or lugs that segment the raised floor into a plurality of load-holding positions. Each load holding position has a plurality of positioning beams or lugs that laterally hold a load module (e.g., palletized load) in position once a load is placed on the raised floor.

A water heating system having a system inlet pipe (1.002), a hot water delivery pipe (1.003) and a hot water return pipe (1.006) connected to a building hot water distribution network (1.024); the water heating system including one or more water heaters (1.001), the or each water heater having a heater inlet (1.022) and a heater outlet (1.023), a hot water return pipe (1.006) connected between the system inlet and delivery outlet via the building hot water distribution network to form a close loop hot water supply-return circuit; a pump (1.005) connected to circulate water through the hot water supply-return circuit whereby the pump can circulate water through one or more of the water heaters; a valve means (1.007) [a first non-return valve] adapted to prevent inlet water (water delivered to the system inlet) from flowing into the hot water return pipe or the building hot water distribution network.

A pressurized gas delivery system includes at least a first gas supply source and a second gas supply source. The first gas supply source is configured to supply a first pressurized gas output, and the second gas supply source is configured to supply a second pressurized gas output. A valve including at least a first position and a second position fluidly connects an outlet of the first gas supply source to a system outlet in the first position and to an inlet of the second gas supply source in the second position.