A pressure compensation and mixing device includes: a mixing unit configured to mix a fluid guided in the mixing unit; and a pressure compensation unit configured to restrict pressure rising in the fluid. The mixing and pressure compensation units are integrated in a container unit. The mixing unit has a mixing volume. The pressure compensation unit has a pressure compensation volume. The mixing and pressure compensation volumes adjoin each other and are separated from each other at least partially by a common separating wall. The pressure compensation unit is arranged inside the mixing unit. The mixing unit includes: an inlet tangentially arranged on the mixing volume such that a fluid let in through the inlet flows in tangentially into the mixing volume; and an outlet axially arranged on the mixing volume such that a fluid let out through the outlet flows out of the mixing volume axially.

Embodiments of mechanisms for processing a semiconductor wafer are provided. A method for processing a wafer includes providing a wafer process apparatus. The wafer process apparatus includes a chamber and a stage positioned in the chamber for supporting the semiconductor wafer. The method also includes supplying a process gas to the semiconductor wafer via a discharging assembly that is adjacent to the stage. The discharging assembly includes a discharging passage configured without a vertical flow path section.

A circulation pump assembly for a heating and/or cooling system includes an electric drive motor (108) and a connected pump housing (106) in which at least one impeller (118) is situated and which comprises a first inlet (112) and a first outlet (114). The pump housing (106) includes a second inlet (122) which is connected in an inside of the pump housing (106) at a mixing point (130) to the first inlet (112). A regulating valve (134), which is designed for regulating the mixing ratio of two flows mixing at the mixing point (130), as well as a control device, which controls the regulating valve (134) for regulating the mixing ration, are arranged in the pump housing (106). A hydraulic manifold is provided with such a circulation pump assembly.

A medical treatment system, such as peritoneal dialysis system, may include control and other features to enhance patient comfort and ease of use. For example, a peritoneal dialysis system may include a control system that can adjust the volume of fluid infused into the peritoneal cavity to prevent the intraperitoneal fluid volume from exceeding a pre-determined amount. The control system can adjust by adding one or more therapy cycles, allowing for fill volumes during each cycle to be reduced. The control system may continue to allow the fluid to drain from the peritoneal cavity as completely as possible before starting the next therapy cycle. The control system may also adjust the dwell time of fluid within the peritoneal cavity during therapy cycles in order to complete a therapy within a scheduled time period. The cycler may also be configured to have a heater control system that monitors both the temperature of a heating tray and the temperature of a bag of dialysis fluid in order to bring the temperature of the dialysis fluid rapidly to a specified temperature, with minimal temperature overshoot.

A pressure compensation and mixing device for a fluid heater has a mixing unit and a pressure compensation unit. The mixing unit is configured to mix a fluid guided in the mixing unit. The pressure compensation unit is configured to restrict pressure rising in the fluid. The mixing unit and the pressure compensation unit are integrated in a container unit. A bottom side of the container unit is closed by a bottom portion on which at least one connection is located via which the fluid may be discharged.

A medical treatment system, such as peritoneal dialysis system, may include control and other features to enhance patient comfort and ease of use. For example, a peritoneal dialysis system may include a control system that can adjust the volume of fluid infused into the peritoneal cavity to prevent the intraperitoneal fluid volume from exceeding a pre-determined amount. The control system can adjust by adding one or more therapy cycles, allowing for fill volumes during each cycle to be reduced. The control system may continue to allow the fluid to drain from the peritoneal cavity as completely as possible before starting the next therapy cycle. The control system may also adjust the dwell time of fluid within the peritoneal cavity during therapy cycles in order to complete a therapy within a scheduled time period. The cycler may also be configured to have a heater control system that monitors both the temperature of a heating tray and the temperature of a bag of dialysis fluid in order to bring the temperature of the dialysis fluid rapidly to a specified temperature, with minimal temperature overshoot.

A mechanical seal support system for a sealing device for sealing a piece of industrial equipment, includes a mechanical seal for sealing the piece of industrial equipment and a system vessel for containing barrier fluid for the mechanical seal and being circumferentially split into a plurality of sections detachably attached for retaining pressure. The system vessel includes a clean-in-place (CIP) assembly, a cooling element and device for sterilizing the system vessel. The device for sterilizing the a heating element is formed as a coiled tubular element for the barrier fluid to pass therethrough, with closed-loop pipe work included for connecting the system vessel to the mechanical seal and a drain and filling device for removing and adding the barrier fluid to the system vessel.

Apparatuses for increasing the effective size of gas-entrained particles in a particle detector are disclosed. In one embodiment, an apparatus comprises an evaporation chamber, a condenser in fluid communication with the evaporation chamber, and an inlet in fluid communication with the condenser for receiving a stream of sample gas containing gas-entrained particles. The evaporation chamber includes a heating element and a porous support surrounding the heating element. The porous support carries thereon a working fluid, and the heating element vaporizes the working fluid to form vapor within the evaporation chamber. The porous support may include a portion which extends into a working fluid reservoir.

A gas supply device according to an embodiment comprises a first gas supplier connected to a process chamber processing a substrate, and incorporating therein first and second electrodes each generating a process gas to be supplied to the process chamber. A first pipe is interposed between the first electrode and the process chamber. A second pipe is interposed between the first electrode and a discharging part. A third pipe is interposed between the second electrode and the process chamber. A fourth pipe is interposed between the second electrode and the discharging part. A second gas supplier is connectable to the second and fourth pipes.

Automated fluid handling system comprising a housing and two or more fluid handling units arranged as interchangeable modular components with an external fluidics section and an internal non fluidics section, and wherein the housing comprises a liquid handling panel with two or more of component positions for receiving said interchangeable modular components such that the external fluidics section is separated from the non fluidics section by the liquid handling panel.