Y02E10/547

LASER DOPING OF SEMICONDUCTORS
20170365734 · 2017-12-21 · ·

The present invention relates to a process for the production of structured, highly efficient solar cells and of photovoltaic elements which have regions of different doping. The invention likewise relates to the solar cells having increased efficiency produced in this way.

MAIN-GATE-FREE AND HIGH-EFFICIENCY BACK-CONTACT SOLAR CELL MODULE, MAIN-GATE-FREE AND HIGH-EFFICIENCY BACK-CONTACT ASSEMBLY, AND PREPARATION PROCESS THEREOF

The present application relates to the field of solar cells, and in particular to a main-gate-free and high-efficiency back-contact solar cell module, assembly, and a preparation process thereof. The main-gate-free and high-efficiency back-contact solar cell module comprises solar cells and an electrical connection layer, a backlight side of the solar cells having P-electrodes connected to a P-type doping layer and N-electrodes connected to an N-type doping layer, wherein the electrical connection layer comprises a number of small conductive gate lines, part of which are connected to the P-electrodes on the backlight side of the solar cells while the other part of which are connected to the N-electrodes on the backlight side of the solar cells; and, the small conductive gate lines are of a multi-section structure. The present application has the following beneficial effects: the usage of silver paste is decreased, and the cost is reduced; moreover. The arrangement of small conductive gate lines in a multi-section structure reduces the series resistance and the transmission distance of a filling factor, so that the efficiency is improved and the stress on the cells from the small conductive gate lines can be effectively reduced.

METHOD FOR PRODUCING DOPED POLYCRYSTALLINE SEMICONDUCTOR LAYERS

The present invention relates to a method for producing highly doped polycrystalline semiconductor layers on a semiconductor substrate, wherein a first Si precursor composition comprising at least one first dopant is applied to one or more regions of the surface of the semiconductor substrate; optionally a second Si precursor composition comprising at least one second dopant is applied to one or more other regions of the surface of the semiconductor substrate, where the first dopant is an n-type dopant and the second dopant is a p-type dopant or vice versa; and the coated regions of the surface of the semiconductor substrate are each converted, so as to form polycrystalline silicon from the Si precursor. The invention further relates to the semiconductor obtainable by the method and to the use thereof, especially in the production of solar cells.

CREATION OF HYPERDOPED SEMICONDUCTORS WITH CONCURRENT HIGH CRYSTALLINITY AND HIGH SUB-BANDGAP ABSORPTANCE USING NANOSECOND LASER ANNEALING
20170365476 · 2017-12-21 ·

In one aspect, a method of processing a semiconductor substrate is disclosed, which comprises incorporating at least one dopant in a semiconductor substrate so as to generate a doped polyphase surface layer on a light-trapping surface, and optically annealing the surface layer via exposure to a plurality of laser pulses having a pulsewidth in a range of about 1 nanosecond to about 50 nanoseconds so as to enhance crystallinity of said doped surface layer while maintaining high above-bandgap, and in many embodiments sub-bandgap optical absorptance.

Photovoltaic module mounting structure

Various embodiments of mounting structures for solar photovoltaic (PV) modules and methods for constructing such mounting structures are described. A mounting structure is usable to secure PV modules in portrait orientation or landscape orientation. PV modules are secured to PV module support rails, which may be secured to purlins of a mounting structure using clamps. In some embodiments, self-adhesive grounding patches are used to establish electrical grounding paths in various embodiments of mounting structure.

DILUTE NITRIDE BISMIDE SEMICONDUCTOR ALLOYS
20170365732 · 2017-12-21 ·

High efficiency dilute nitride bismide alloys and multijunction photovoltaic cells incorporating the high efficiency dilute nitride bismide alloys are disclosed. Bismuth-containing dilute nitride subcells exhibit a high efficiency across a broad range of irradiance energies, a high short circuit current density, and a high open circuit voltage.

SOLAR CELL HAVING AN EMITTER REGION WITH WIDE BANDGAP SEMICONDUCTOR MATERIAL

Solar cells having emitter regions composed of wide bandgap semiconductor material are described. In an example, a method includes forming, in a process tool having a controlled atmosphere, a thin dielectric layer on a surface of a semiconductor substrate of the solar cell. The semiconductor substrate has a bandgap. Without removing the semiconductor substrate from the controlled atmosphere of the process tool, a semiconductor layer is formed on the thin dielectric layer. The semiconductor layer has a bandgap at least approximately 0.2 electron Volts (eV) above the bandgap of the semiconductor substrate.

OPTOELECTRONIC DEVICE

The invention provides an optoelectronic device comprising a photoactive region, which photoactive region comprises: an n-type region comprising at least one n-type layer; a p- type region comprising at least one p-type layer; and, disposed between the n-type region and the p-type region: a layer of a perovskite semiconductor without open porosity. The perovskite semiconductor is generally light-absorbing. In some embodiments, disposed between the n-type region and the p-type region is: (i) a first layer which comprises a scaffold material, which is typically porous, and a perovskite semiconductor, which is typically disposed in pores of the scaffold material; and (ii) a capping layer dis -posed on said first layer, which capping layer is said layer of a perovskite semiconductor without open porosity, wherein the perovskite semiconductor in the capping layer is in contact with the perovskite semiconductor in the first layer. The layer of the perovskite semiconductor without open porosity (which may be said capping layer) typically forms a planar heterojunction with the n-type region or the p-type region. The invention also provides processes for producing such optoelectronic devices which typically involve solution deposition or vapour deposition of the perovskite. In one embodiment, the process is a low temperature process; for instance, the entire process may be performed at a temperature or temperatures not exceeding 150° C.

Stress-induced bandgap-shifted semiconductor photoelectrolytic/photocatalytic/photovoltaic surface and method for making same
09847439 · 2017-12-19 ·

Titania is a semiconductor and photocatalyst that is also chemically inert. With its bandgap of 3.0, to activate the photocatalytic property of titania requires light of about 390 nm wavelength, which is in the ultra-violet, where sunlight is very low in intensity. A method and devices are disclosed wherein stress is induced and managed in a thin film of titania in order to shift and lower the bandgap energy into the longer wavelengths that are more abundant in sunlight. Applications of this stress-induced bandgap-shifted titania photocatalytic surface include photoelectrolysis for production of hydrogen gas from water, photovoltaics for production of electricity, and photocatalysis for detoxification and disinfection.

LAYER ELEMENT SUITABLE AS INTEGRATED BACKSHEET FOR A BIFACIAL PHOTOVOLTAIC MODULE

The invention relates to a layer element comprising at least two layers (A) and (B), wherein layer (B) has a has a total luminous transmittance of at least 80.0%, an article, preferably abifacial photovoltaic module, comprising said layer element, a process for preparing said layer element, a process for preparing a photovoltaic module comprising said layer element and the use of said layer element as integrated backsheet element of a bifacial photovoltaic module.