Adjustable venturi assemblies and methods of using adjustable venturi assemblies are disclosed. In one aspect, a venturi assembly for injecting a secondary fluid into a primary fluid flow path is provided. The venturi assembly comprises a nozzle, a constricted section in fluid communication with the nozzle, a secondary fluid conduit in fluid communication with the nozzle, and a flow adjusting device. The nozzle and constricted section together define the primary fluid flow path along a first axis. The secondary fluid conduit is for transporting secondary fluid from the secondary fluid reservoir to the constricted section along a second axis. The flow adjusting device is positioned opposite the secondary fluid conduit and is configured to alter a velocity of fluid flowing along the primary fluid flow path by extending into a portion of the constricted section along the second axis.

A dispenser system including a source of chemical concentrate, a source of diluent, and a mix chamber in fluid communication with the source of chemical concentrate via a first line and with the source of diluent via a second line to mix chemical concentrate and diluent to form a dilution. The dispenser system also includes one or more metering devices disposed in one or both of the first line and the second line, a discharge fluidly coupled to the mix chamber to deliver the dilution to a downstream receptacle, and a control system in communication with the one or more metering devices. The control system is programmed to adjust a concentration of chemical concentrate in the dilution via control of the one or more metering devices based on an environmental factor affecting a physical environment to be cleaned using the dilution.

A plural component dispensing system 10 receives separate fluid components, mixes the components in a predetermined ratio, and dispenses the components as mixture. Each fluid component is supplied by a separate pump 12A, 12B to an individual variably controllable fluid regulator 14A, 14B. Each fluid component is supplied from its individual fluid regulator 14A, 14B through a flow meter 18A, 18B to a mixing device 20. The ratio of the components delivered to the mixing device 20 is controlled by the individual fluid regulators 14A, 14B based upon the flow rates measured by the flow meters 18A, 18B.

Provided is a flow rate ratio control device that even in change periods during which the actual flow rates of component gases change along with a change in the target total flow rate or target mixing ratio of mixed gas, can keep the actual total flow rate or actual mixing ratio of the mixed gas constant. Target flow rates set in flow rate control devices have continuous change periods during which target flow rate values continuously change from pre-change to post-change target flow rate values, respectively and correspondingly; and the time lengths of the continuous change periods are set to at least a followable time during which a flow rate control device of which a response speed to an actual component fluid flow rate is lowest allows the actual component fluid flow rate to substantially follow the target flow rate in the continuous change periods.

A gas control system includes: a first valve that is provided in a carrier gas line or in a gas supply line; a flow rate control mechanism that is provided in a diluent gas line and includes a flow rate sensor and a second valve; a contactless type first concentration sensor; a first valve control part; a diluent gas setting flow rate calculation part adapted to, on the basis of a preset setting total flow rate of a post-dilution mixed gas and a post-dilution measured concentration, calculate a diluent gas setting flow rate that is a flow rate of a diluent gas to be flowed through the diluent gas line; and a second valve control part adapted to control the opening level of the second valve so as to decrease the deviation between the diluent gas setting flow rate and a measured flow rate measured by the flow rate sensor.

A system for providing deionized (DI) water with a dynamic electrical resistivity is provided. The system includes plural DI water sources, source pipes, flow control devices, a merging pipe and a flow controller. The DI water sources respectively have different electrical resistivities. The source pipes are respectively connected to the DI water sources in a one-to-one manner. The flow control devices are respectively disposed in the source pipes in a one-to-one manner. The merging pipe joins the source pipes. The flow controller includes a resistivity sensor disposed in the merging pipe, and the flow controller is configured to control a flowrate of the DI water through the source pipes.

A system is configured to generate a pressurized flow of gas comprised of a first gas having a partial pressure that varies in a predetermined manner. This may be used, for example, to simulate a previous and/or theoretical respiratory gas flow that was produced (or could have been produced) by a subject. The system is configured to deliver the pressurized flow of gas to a testing system configured to measure the partial pressure the first gas in flows of gas. This may provide an opportunity to determine the response of individual testing systems to various clinical circumstances.

A mixing apparatus includes: a driving device configured to drive first liquid to flow into first transfer chamber and to drive second liquid to flow into second transfer chamber, a first transfer chamber configured to store inflowed first liquid, and a second transfer chamber configured to store inflowed second liquid; a premixing chamber communicating with liquid outlet of first transfer chamber and liquid outlet of second transfer chamber; and a monitor configured to monitor volume of liquid in first transfer chamber and volume of liquid in second transfer chamber, close liquid inlet of first transfer chamber and control first liquid to flow into premixing chamber when volume of first liquid is equal to first value, and close liquid inlet of second transfer chamber and control second liquid to flow into premixing chamber when volume of second liquid is equal to second value.

The present invention makes it easy to control the amount of material gas led out of a tank. Accordingly, carrier gas is introduced into a tank containing a material and together with the carrier gas, from the tank, material gas produced by vaporization of the material is led out. A control part controls the flow rate of the carrier gas so that a concentration index value obtained by measuring mixed gas led out of the tank and indicating the concentration of the material gas in the mixed gas comes close to a predetermined target concentration index value. In addition, the control part controls the flow rate of the carrier gas to change at a predetermined change rate, and then controls the flow rate of the carrier gas on the basis of the deviation between the concentration index value and the target concentration index value.

The application relates to an apparatus for providing a gas for the introduction thereof into an incubation chamber, comprising an inlet port (1) for introducing a gas, an outlet port (2) for discharging a gas, a first gas path (3) connecting the inlet port (1) to the outlet port (2), a second gas path (4) branching off from the first gas path (3) and running back into the first gas path (3); a distributing element (5), configured to allow a portion of the gas introduced through the inlet port (1) to be conducted via the second gas path (4), and an enriching element (6) arranged in the second gas path for enriching the gas flow with a liquid.