A copper foil for a current collector of a lithium secondary battery has a crystalline structure, in which a ratio of the sum of texture coefficients of a (111) surface and a (200) surface to the total sum of texture coefficients of the (111), (200) and (220) surfaces is 60 to 85%, a ratio of the texture coefficient of the (111) surface to the total sum of texture coefficients of the (111), (200) and (220) is 18 to 38%, a ratio of the texture coefficient of the (200) surface thereto is 28 to 62%, and a ratio of the texture coefficient of the (220) surface thereto is 15 to 40%. The copper foil has surface roughness (Rz-JIS) of 2 mum or less, weight deviation of 3% or less, tensile strength of 30 to 40 kgf/mm2, elongation of 3 to 20%, and thickness of 1 to 35 mum.

A process for manufacturing corrosion resistant metal components is disclosed. The process comprises abrasive blasting of a silicon-containing steel substrate followed by hot dip galvanizing, a second abrasive blasting process, treating with a mineral acid, and coating with a polymeric coating. The resulting corrosion resistance is enhanced.

Surface energy of a substrate is changed without the need for any template, mask, or additional coating medium applied to the substrate. At least one beam of energy directly ablates a substrate surface to form a predefined topographical pattern at the surface. Each beam of energy has a width of approximately 25 micrometers and an energy of approximately 1-500 microJoules. Features in the topographical pattern have a width of approximately 1-500 micrometers and a height of approximately 1.4-100 micrometers.

The invention relates to compositions and methods that are useful in etching a metal surface. In particular, the invention relates to novel acid compositions and methods of using such compositions in etching a metal surface, preferably an aluminum surface prior to anodizing to dissolve impurities, imperfections, scale, and oxide. The compositions are effective in maintaining their etching capacity and in removing smut produced by the etching of a surface as well as in general cleaning.

A flat product made of a metal material has been provided with deterministic surface texture which has a plurality of depressions which have a depth in the range of from 2 to 14 m, wherein the depressions are designed to be I-shaped, H-shaped, cross-shaped, C-shaped or X-shaped, and wherein the surface texture has a peak count RPc in the range of from 45 to 180 1/cm, an arithmetic mean roughness Ra in the range of from 0.3 to 3.6 m, and an arithmetic mean waviness Wsa in the range of from 0.05 to 0.65 m. A roll which is particularly suitable for producing such a flat product has a deterministic surface texture which has a plurality of overlapping dimples, which are arranged such that they delimit a double-I-shaped, H-shaped, cross-shaped, C-shaped or X-shaped material texture in the roll surface, and wherein the surface texture of the roll, measured in the direction of the roll axis, is characterized by a peak count RPc in the range of from 80 to 180 1/cm, an arithmetic mean roughness Ra in the range of from 2.5 to 3.5 m and an arithmetic mean waviness Wsa in the range of from 0.08 to 1.0 m.

The present invention relates to a silicide alloy film that is formed on a substrate containing Si, the silicide alloy film including a metal M1 having a work function of 4.6 eV or more and 5.7 eV or less, a metal M2 having a work function of 2.5 eV or less and 4.0 eV or more, and Si, the silicide alloy film having a work function of 4.3 eV or more and 4.9 eV or less. Here, the metal M1 is preferably Pt, Pd, Mo, Ir, W or Ru, and the metal M2 is preferably Hf, La, Er, Ho, Er, Eu, Pr or Sm. The silicide alloy film according to the present invention is a thin-film which has excellent heat-resistance and favorable electrical property.

A corrosion-resistant optical device is disclosed. The device includes a substrate, a silver layer upon the substrate, and an insulating layer that provides abrasion resistance. The device is immersed in a thiol-rich solution. The thiols form a corrosion-inhibiting monolayer upon any exposed silver surface. This increases the environmental resistance of the optical device, keeping water from interacting with the silver layer.

A method for thermally treating a flat steel product, a thermally treated flat steel product and use thereof. The method includes providing a flat steel product with a structure with a first hardness. The flat product is heated at least in sections to an austenitizing temperature. The heated flat product is cooled at least in sections so that a structure with a second hardness is formed within the flat product at least in sections, the second hardness having a higher level of hardness in comparison to the structure with the first hardness. The heating and the cooling down of the flat product are coordinated with each other such that the structure with the second hardness is formed across the thickness of the flat product and at least in one of said sections, the structure with the first hardness remains constant across the thickness of the flat product.

A titanium member includes a first region where a plurality of first convex structural bodies extending in a first direction are arranged on the surface of the titanium member in a second direction orthogonal to the first direction, the first convex structural body has first convex portions arranged on an upper surface of the first convex structural body at an interval of several hundred nanometers along the first direction, and a height of the first convex portion is several ten nanometers. It is preferable that the first convex structural bodies adjacent in the second direction are arranged at an interval wider than the interval at which the first convex portions are arranged, and in the first convex structural bodies, a height including the first convex portion is higher than the height of the first convex portion.

A laminate including a metallic base material, a nickel-containing plating film layer formed on the metallic base material, and a gold plating film layer formed on the nickel-containing plating film layer, in which pinholes in the gold plating film layer are sealed with a passive film having a thickness of 15 nm or greater. Also disclosed is a constituent member of a semiconductor production device including the laminate and a method for producing the laminate.