An underlayment layer is configured to support an artificial turf assembly. The underlayment layer comprises a core with a top side and a bottom side. The top side has a plurality of spaced apart, upwardly oriented projections that define channels suitable for fluid flow along the top side of the core when the underlayment layer is positioned beneath an overlying artificial turf assembly.

A workpiece composed of acrylic material can be modified to produce a highly visual and aesthetic prismatic effect in which white light entering the workpiece can exit the workpiece in separate colors and sets. By applying dichroic paint and primer to precision cuts made into one of the planar surfaces of the workpiece, preferably filling in the spaces with a resin epoxy and then preferably sanding the surface, many more colors can be generated by the white light exiting the workpiece.

A mechanoreception stimulation garment has a plurality of protuberances disposed as pyramidal nodes upon an interior surface of the fabric. The plurality of protuberances are sized, spaced apart, and arranged to target receptive fields in the glabrous innervate skin when the garment is worn. The plurality of protuberances is forced in contact with the wearer's skin when the garment is worn. The mechanoreception stimulation garment therefore increases mechanoreception, perfusion pressure, blood flow, and perception and awareness of the limb or extremity upon which the garment is worn to aid in relief of symptomology of neuropathy and, in some embodiments, assist in maintaining balance when walking or manual prehensility and dexterity in wielding objects by hand.

The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.

The present disclosure relates to an integrated chip structure having a first substrate including a plurality of transistor devices disposed within a semiconductor material. An interposer substrate includes vias extending through a silicon layer. A copper bump is disposed between the first substrate and the interposer substrate. The copper bump has a sidewall defining a recess. Solder is disposed over the copper bump and continuously extending from over the copper bump to within the recess. A conductive layer is disposed between the first substrate and the interposer substrate and is separated from the copper bump by the solder.

A method of manufacturing a garment is provided that includes applying an adhesive layer to a first ply and/or a second ply in a first amount in a first zone where structural support is desired and in a second amount in a second zone where breathability is desired; arranging the first and second plies with respect to one another so that the adhesive layer is therebetween; and activating the adhesive layer to secure the first and second plies to one another.

A support for installing facing materials such as ceramic tiles on a substrate such as floors, walls and ceilings wherein the support plate has a plurality of spaced apart recesses in the plate material, with the recesses being open at the top surface and have solid sidewalls and a base, and a plurality of slots in the non-recessed portions of the plate material extending through the top surface and bottom surface, the slots joining one or more adjacent recesses. The support plate of the invention is used for tile installations between the substrate and such tile. Thin-set mortar that is used to secure the tile to the support plate flows into the recesses and into the slots forming a continuous bond between the mortar and the adjacent slots providing for a strong bond between the support plate, mortar and the tiles.

Provided is a sheet glass production process for properly producing sheet glass having a convex shape in section in a width direction orthogonal to the advancing direction of a glass ribbon. A glass ribbon G2 advancing on molten metal 22 is heated so as to have both edge portions G2B heated more intensely than a central portion G2A in a width direction thereof in an upstream zone of the molten metal bath, and a plurality of rolls 23 are rotated in contact with both edge portions G2B of the glass ribbon G2 such that upstream rolls 23A in an advancing direction F1 have a lower peripheral speed than downstream rolls 23B in the advancing direction.

A material with nanopillar structures extending from a substrate. The nanopillars are engageable by organisms to cause an interaction, such as cellular destruction.

Provided is an interlayer film for laminated glass with which double images in laminated glass can be significantly suppressed. The interlayer film for laminated glass according to the present invention is an interlayer film for use in a laminated glass that is a head-up display, the interlayer film has one end, and the other end being at the opposite side of the one end, the other end has a thickness larger than a thickness of the one end, the interlayer film has a region for display corresponding to a display region of the head-up display, and when three regions obtained by equally dividing the region for display into three in a direction connecting the one end and the other end are named a first partial region for display, a second partial region for display, and a third partial region for display in sequence from the one end side, as to partial wedge angle A.sub.x, B.sub.x, and C.sub.x in the first, second, and third partial regions for display, and partial wedge angle φ.sub.x in the region for display satisfy, |A.sub.x−φ.sub.x| is 0.05 mrad or less, |B.sub.x−φ.sub.x| is 0.05 mrad or less, and |C.sub.x−φ.sub.x| is 0.05 mrad or less.