A hydraulic flushing system includes a hydraulic downhole control line that runs from a hydraulic source to a surface controlled sub-surface safety valve of an underwater hydrocarbon extraction facility, where the hydraulic downhole control line includes a directional control valve. The hydraulic flushing system further includes a purge line coupled to the hydraulic downhole control line downstream of the directional control valve to a service line. The purge line includes a fluid isolation valve therein to enable purging of a hydraulic fluid. The hydraulic flushing system further includes a service line coupled to the purge line via the fluid isolation valve to store the purged hydraulic fluid.

A passive isolation valve equipped with one or more nozzles configured to deliver a flow of gas to an area adjacent the valve seat so as to remove accumulated particulate material from the area of the valve adjacent the valve seat that otherwise may adversely affect closure of the valve in response to an energetic event.

Apparatuses for preparing a sample are disclosed herein. The apparatuses include a chamber, a first valve at least partially disposed in the first chamber, a second valve at least partially disposed in the first chamber, and a pump comprising an actuator and nozzle.

Methods and systems to reduce the consumption of purge gas for semiconductor substrate containers. The recirculation purging system recycles purge gas back to substrate containers by filtering and purifying gas flow from substrate containers, receiving gas flow from load port, or including a recirculation tank.

Apparatuses for preparing a sample are disclosed herein. The apparatuses include a chamber, a first valve at least partially disposed in the first chamber, a second valve at least partially disposed in the first chamber, and a pump comprising an actuator and nozzle.

A method for operating an electronic device manufacturing system is provided that includes introducing an inert gas into a process tool vacuum pump at a first flow rate while the process tool is operating in a process mode, and introducing the inert gas into the process tool vacuum pump at a second flow rate while the process tool is operating in a chamber clean mode. Numerous other embodiments are provided.

A gas purging valve is operative to be connected to piping in a Fire Protection System (FPS) and to bleed gas at a predetermined rate. The valve includes an inlet in gas flow relationship with the FPS piping and a central passage in gas flow relationship with the inlet. The valve also includes a calibrated orifice removeably disposed in the central passage, in gas flow relationship with the passage and operative to allow a maximum predetermined gas flow rate therethrough. The valve further includes an outlet in gas flow relationship with the calibrated orifice. A ball is disposed upstream of the central passage. The ball is operative to allow gas flow through the gas purging valve but operative to impede the flow of water through the gas purging valve.

Apparatuses for preparing a sample are disclosed herein. The apparatuses include a chamber, a first valve at least partially disposed in the first chamber, a second valve at least partially disposed in the first chamber, and a pump comprising an actuator and nozzle.

An electronic device manufacturing system is provided that may reduce the amount of resources used in electronic device manufacturing processes. In some embodiments, unreacted ozone exiting a process tool operating in an ozone mode may be diverted and used as an oxidant in an abatement tool when the process tool is operating in a non-ozone mode. Numerous other embodiments are provided.

A cleaning apparatus for microsurgical instruments has a flush chamber closed off at one end by a first plug adapted to liquid-tightly grip one end of the instrument, allowing a portion of the instrument to extend past the first plug and out of the flush chamber. The other end of the flush chamber is closed off by a second plug having an inlet port. Liquid injected through the inlet port on the second plug passes through an internal passageway formed in the instrument and exits the instrument through the portion that extends past the first plug. In another embodiment the instrument has an internal passageway and an end cap through which flushing ports are formed which communicate with the passageway. A first plug having an inlet port is liquid-tightly attached to the end cap and liquid injected into the first plug passes through the plug, through the flushing ports and through the passageway to clean detritus from the instrument.