Y10T137/86397

PRESSURE RELATED HYSTERESIS MANIPULATION IN A PRESSURIZED FLOW SYSTEM
20180231988 · 2018-08-16 ·

Exemplary embodiments of the present disclosure are directed to manipulating pressure-related hysteresis in a pressurized flow system by setting the pressure of the system to a predetermined location in the hysteresis band to advantageously minimize an effect of the pressure related hysteresis on the pressure of the system or to advantageously benefit from the effects of the hysteresis on the pressure of the system.

Pressure related hysteresis manipulation in a pressurized flow system

Exemplary embodiments of the present disclosure are directed to manipulating pressure-related hysteresis in a pressurized flow system by setting the pressure of the system to a predetermined location in the hysteresis band to advantageously minimize an effect of the pressure related hysteresis on the pressure of the system or to advantageously benefit from the effects of the hysteresis on the pressure of the system.

Automatic shut-off valve

A valve that closes automatically when infers a leak in a supply network of liquid or gas fluids where it is installed. The closure of the valve is performed by a stem connected to a mechanism of rod-crank-slider that displaces a shutter, the stem is activated at the same time by an actuator that allows to release the potential energy of a flat coil torsion spring.

Hose tap timer device and method

A hose tap timer is disclosed comprising structure for shutting off the hose tap timer valves when a control member is separated from or attached to a dock for a manifold member of the hose tap timer.

GAS MANAGEMENT ASSEMBLY FOR SUBSTRATE PROCESSING APPARATUS

A gas management assembly for a substrate processing apparatus includes: an exhaust module including a basic exhaust line that is formed to exhaust a chamber gas containing a process gas supplied to a chamber of the substrate processing apparatus to a discharge system; a recovery connection module including a recovery exhaust line that is branched from the basic exhaust line and formed to exhaust the chamber gas to a recovery system; and a control module configured to perform automatic switching of an exhaust path of the chamber gas from one of the basic exhaust line and the recovery exhaust line to the other based on at least one of an operation mode of the substrate processing apparatus, a pressure of the chamber, or a pressure of the recovery exhaust line.