Y10T428/265

Electrodeposited platinum-gold alloy

A coating made of platinum-gold alloy is provided, together with a method of its preparation by electrodeposition. The alloy is composed of more than 50 atomic percent platinum. The microstructure of the alloy consists of generally ellipsoidal grains. More than half of the grains have a major axis of 10 nm or less.

THIN COATINGS FOR HYDRAULIC COMPONENTS

An example hydraulic system component of a machine includes a protective coating deposited by high velocity air fuel (HVAF) thermal spray, exhibiting high adhesion strengths and surface morphologies that promote lubricant adhesion and reduce the leakage of oil and/or hydraulic fluid from the hydraulic system. The coating may have surface roughness with Rz values less than 2 μm and hardness of 1000 Vickers or greater. The HVAF coating may be thinner than conventional coatings with thicknesses less than 100 μm. The HVAF coating may be deposited on a variety of steel components with adhesion strengths greater than those achieved by high velocity oxygen fuel (HVOF). The HVAF coating may be formed without time consuming roughening and/or post-grind operations, resulting in cost savings compared to conventional coatings. The coatings may have operational lifetimes of 1000 hours or more.

Forming method of yttrium oxide fluoride coating film and yttrium oxide fluoride coating film prepared thereby

A forming method of an yttrium oxide fluoride (YOF) coating film and a (YOF) coating film formed thereby are disclosed. The YOF coating film has no or extremely small pores therein and a nanostructure to increase light transmittance thereof, and has high hardness and high bonding strength and thus can protect a transparent window of a display device. The method for forming an YOF coating film involves the steps of: providing pretreated YOF powder having a particle diameter ranging from 0.1 to 12 μm; receiving a transfer gas supplied from a transfer gas supply unit and receiving the pretreated YOF powder supplied from a powder supply unit to transfer the pretreated YOF powder in an aerosol state; and colliding/smashing (spraying) the pretreated YOF powder transferred in the aerosol state with/onto a substrate in a process chamber to form an YOF coating film on the substrate.

ION BEAM SPUTTERING WITH ION ASSISTED DEPOSITION FOR COATINGS ON CHAMBER COMPONENTS

A method includes performing ion beam sputtering with ion assisted deposition to deposit a protective layer on a surface of a body. The protective layer is a plasma resistant rare earth-containing film of a thickness less than 1000 .Math.m. The porosity of the protective layer is below 1%. The plasma resistant rare earth-containing film consists of 40 mol% to less than 100 mol% of Y.sub.2O.sub.3, over 0 mol% to 60 mol% of ZrO.sub.2, and 0 mol% to 9 mol% of Al.sub.2O.sub.3.

Aluminum alloy strip with improved surface appearance

The invention relates to an aluminum alloy strip with improved surface optics, which is fabricated via hot and/or cold rolling, and consists of a type AA 3xxx, AA 5xxx, AA 6xxx or AA 8xxx aluminum alloy. The object of proposing an aluminum alloy strip that is suitable for attractive and precious surface optics despite the elevated percentage of alloy constituents is achieved in that, after degreasing, the finish-rolled aluminum alloy strip exhibits an increase in the luminance value L*(ΔL) in relation to the rolled-greasy state of more than 5 while measuring the color of the surface in the CIE L*a*b* color space using a standard illuminant D65 and a normal observation angle of 10°, excluding direct reflection in 45°/0° geometry.

HOT-DIP GALVANIZED STEEL SHEET

A hot-dip galvanized steel sheet wherein the hot-dip galvanized steel sheet comprises a base steel sheet and a hot-dip galvanized layer, a ferrite phase is, by volume fraction, 50% or less in a range of ⅛ thickness to ⅜ thickness centered at a position of ¼ thickness from the surface of the base steel sheet, a hard structure is 50% or more, wherein the hot-dip galvanized steel sheet has the hot-dip galvanized layer in which Fe is 5.0% or less and Al is 1.0% or less, and columnar grains formed of a ζ phase is 20% or more in an entire interface between the plated layer and the base steel sheet, on the surface of the base steel sheet in which a volume fraction of a residual austenite is 3% or less and a ratio of a volume fraction of the hard structure is 0.10 times or more to 0.90 times or less of that of the hard structure in the range of ⅛ thickness to ⅜ thickness in a range of 20 μm depth in a steel sheet direction originating an interface between the hot-dip galvanized layer and the base steel sheet, and wherein the hot-dip galvanized steel sheet has a refined layer at the side of the interface in the base steel sheet, and wherein an average thickness of the refined layer, an average grain size of ferrite in the refined layer and a maximum size of the oxide included in the refined layer are defined respectively.

Solar selective coating having high thermal stability and a process for the preparation thereof

The present invention describes an improved multilayer solar selective coating useful for solar thermal power generation. Solar selective coating of present invention essentially consists of Ti/Chrome interlayer, two absorber layers (AlTiN and AlTiON) an anti-reflection layer (AlTiO). Coating deposition process uses Ti and Al as the source materials, which are abundantly available and easy to manufacture as sputtering targets for industrial applications. The present invention allows deposition of all the layers in a single sputtering chamber on flat and tubular substrates with high absorptance and low emittance, thus making the process simpler and cost effective. The process of the present invention can be up-scaled easily for deposition on longer tubes with good uniformity and reproducibility. The coating of the present invention also displays improved adhesion, UV stability, corrosion resistance and stability under extreme environments.

Protective coating compositions for photocatalytic layers on substrates

A coated substrate including a substrate including a treated layer, a photocatalytic layer, and a protective layer for impeding photocatalyst derived degradation of the treated layer, the protective layer being provided between the photocatalytic layer and the treated layer, the protective layer comprising colloidal particles distributed in a matrix comprised at least partly of an organosilicon phase which is oxidizable by the reactive oxygen species to form a non-volatile inorganic phase, wherein the organosilicon phase includes a surfactant incorporating an organosilicon component.

Transparent conductive film and production method therefor

A transparent conductive film, includes: an organic polymer film substrate; at least one undercoat layer formed on the organic polymer film substrate by a dry process; and a transparent conductive coating provided on at least one surface of the organic polymer film substrate with the undercoat layer interposed therebetween, wherein the transparent conductive coating is a crystalline coating of an indium-based complex oxide having a content of a tetravalent metal element oxide of 7 to 15% by weight as calculated by the formula {(the amount of the tetravalent metal element oxide)/(the amount of the tetravalent metal element oxide+the amount of indium oxide)}×100(%), the transparent conductive coating has a thickness in the range of 10 to 40 nm, and the transparent conductive coating has a specific resistance of 1.3×10.sup.−4 to 2.8×10.sup.−4 Ω.Math.cm.

Transparent conductive film

A transparent conductive film includes a film base, and a polycrystalline layer of indium tin oxide formed on the film base. The polycrystalline layer has a gradient of a concentration of tin oxide in a thickness direction thereof. A maximum value of the concentration of tin oxide in the thickness direction of the polycrystalline layer is 6 wt % to 12 wt %. The polycrystalline layer has a thickness of 10 nm to 35 nm. An average value of maximum sizes of crystal grains composing the polycrystalline layer is 380 nm to 730 nm.