The High Thermal Frost and Crystal Growing Water Maker, is a fully automated, fixed or mobile water making appliance designed to grow frost and crystal at an accelerated rate within its high thermal water crystals growing chamber. At the end of the crystals optimal freezer growth stage in the chamber, the fully-grown crystals and frost spicules, are melted within its harvesting apparatus. The then melted frost and crystals which is now converted to a liquid water, is afterward filtered using a variable stage filtration system within the unit. The crystal growing and water harvesting appliance is design to cycle continually; and at the end of any of the growth, harvesting and filtration cycle, the melted and filtered crystal liquid H2O, is siphon from the unit, to be use as potable water for any purpose.

There is disclosed a method and an apparatus for reducing the amount of waste, requiring special handling and possible destruction, in a process involving vaporization, in an evaporator apparatus (1-6, V1-V6), of a water solution containing environmentally hazardous substances. A considerable amount of the water content of said water solution is vaporized in a reusable vaporization chamber (2a). At a certain time, the vaporization process is stopped, so that the remaining water content is 70% to 5% of the initial water content. Thereafter, in a second step, the remaining water solution in the reusable vaporization chamber (2a) is transferred into a separate waste isolating container (6), where the remaining water is subjected to at least one further water-reducing process. The remaining waste, including the environmentally hazardous substances, is left in the waste container for separate handling and possible destruction.

There is disclosed a method and an apparatus for reducing the amount of waste, requiring special handling and possible destruction, in a process involving vaporization, in an evaporator apparatus (1-6, V1-V6), of a water solution containing environmentally hazardous substances. A considerable amount of the water content of said water solution is vaporized in a reusable vaporization chamber (2a). At a certain time, the vaporization process is stopped, so that the remaining water content is 70% to 5% of the initial water content. Thereafter, in a second step, the remaining water solution in the reusable vaporization chamber (2a) is transferred into a separate waste isolating container (6), where the remaining water is subjected to at least one further water-reducing process. The remaining waste, including the environmentally hazardous substances, is left in the waste container for separate handling and possible destruction.

A process for separating a gas and a vapor is disclosed. A cross-flow horizontal spray vessel comprising horizontally-situated sections is provided. Each of the sections comprise a spray nozzle or nozzles, and a collection hopper. A carrier gas, comprising a product vapor, is passed through the sections. A contact liquid is provided through the spray nozzle or nozzles such that the carrier gas passes across the contact liquid and a portion of the product vapor desublimates, condenses, crystallizes, or combinations thereof as a product solid into the contact liquid, leaving a product-depleted carrier gas. The contact liquid and the product solid are passed to a next preceding upstream spray nozzle or nozzles such that a temperature profile is established across the sections by the contact liquids, as the contact liquids are progressively warmer. The contact liquid and the product solid are removed. The product-depleted carrier gas is removed.

A process for separating a gas and a vapor is disclosed. A cross-flow horizontal spray vessel comprising horizontally-situated sections is provided. Each of the sections comprise a spray nozzle or nozzles, and a collection hopper. A carrier gas, comprising a product vapor, is passed through the sections. A contact liquid is provided through the spray nozzle or nozzles such that the carrier gas passes across the contact liquid and a portion of the product vapor desublimates, condenses, crystallizes, or combinations thereof as a product solid into the contact liquid, leaving a product-depleted carrier gas. The contact liquid and the product solid are passed to a next preceding upstream spray nozzle or nozzles such that a temperature profile is established across the sections by the contact liquids, as the contact liquids are progressively warmer. The contact liquid and the product solid are removed. The product-depleted carrier gas is removed.

A process for separating a vapor from a gas is disclosed. A cryogenic liquid is provided to an inlet of a froth flotation device. A carrier gas is provided to a gas distributor of the froth flotation device. The carrier gas comprises a product vapor. Bubbles of the carrier gas are produced and passed through the cryogenic liquid in the froth flotation device. A portion of the product vapor desublimates, condenses, crystallizes, or a combination thereof to produce a solid product and a product-depleted carrier gas. Bubbles of the product-depleted carrier gas collect the solid product as a froth concentrate. The froth concentrate is removed by overflowing out of the froth flotation device.

A process to prevent fouling using a desublimating heat exchanger is disclosed. An outlet stream from the desublimating heat exchanger may be split into a plurality of parallel streams. The parallel streams may be sent through other devices for performing a unit operation, and the devices for performing a unit operation may change the temperature of at least one of the parallel streams. Parallel streams of differing temperature may emerge from the devices for performing a unit operation. The parallel streams of differing temperature may be sent to a mixing chamber. A mixed stream of uniform temperature may emerge from the mixing chamber, and the mixed stream may be recycled back to the desublimating heat exchanger. The mixing chamber may be separate from the desublimating heat exchanger, or the parallel streams of differing temperature may be mixed in the desublimating heat exchanger.

A process to prevent fouling using a desublimating heat exchanger is disclosed. An outlet stream from the desublimating heat exchanger may be split into a plurality of parallel streams. The parallel streams may be sent through other devices for performing a unit operation, and the devices for performing a unit operation may change the temperature of at least one of the parallel streams. Parallel streams of differing temperature may emerge from the devices for performing a unit operation. The parallel streams of differing temperature may be sent to a mixing chamber. A mixed stream of uniform temperature may emerge from the mixing chamber, and the mixed stream may be recycled back to the desublimating heat exchanger. The mixing chamber may be separate from the desublimating heat exchanger, or the parallel streams of differing temperature may be mixed in the desublimating heat exchanger.

Condensable metal halide materials, such as but not limited to tungsten chloride (WCl.sub.6), can be used to deposit metal films or metal containing films in a chemical vapor deposition (CVD) or atomic layer deposition process. Described herein are high purity compositions comprising condensable materials and methods to purify condensable materials. In one aspect, there is provided a composition comprising: tungsten hexachloride which is substantially free of at least one impurity and wherein the tungsten hexachloride comprises at least 90%, preferably 95% and more preferably 99% by weight or greater of a -WCl.sub.6 and 5% by weight or less of the -WCl.sub.6 as measured by X-ray diffraction.

Condensable metal halide materials, such as but not limited to tungsten chloride (WCl.sub.6), can be used to deposit metal films or metal containing films in a chemical vapor deposition (CVD) or atomic layer deposition process. Described herein are high purity compositions comprising condensable materials and methods to purify condensable materials. In one aspect, there is provided a composition comprising: tungsten hexachloride which is substantially free of at least one impurity and wherein the tungsten hexachloride comprises at least 90%, preferably 95% and more preferably 99% by weight or greater of a -WCl.sub.6 and 5% by weight or less of the -WCl.sub.6 as measured by X-ray diffraction.