A method of capturing soot includes the steps: combusting a first precursor in a burner to produce a soot stream, the soot stream comprising soot and exiting the burner at an outlet; and directing a capture medium to the soot stream, the capture medium contacting the soot in an impact region, the soot having a temperature greater than 50 C. in the impact region.

A method of capturing soot includes the steps: combusting a first precursor in a burner to produce a soot stream, the soot stream comprising soot and exiting the burner at an outlet; and directing a capture medium to the soot stream, the capture medium contacting the soot in an impact region, the soot having a temperature greater than 50 C. in the impact region.

A process, for recovery of unreacted olefin monomer(s) from a particulate product of an olefin polymerization reactor, the particulate polymer product is supplied to a degassing vessel, where the particulate product is countercurrently contacted with at least a first gaseous stripping stream, which includes at least 5% by weight unreacted olefin monomer, and then with an inert gas stream under conditions effective to strip hydrocarbon impurities from the polymer product and produce a stripped polymer product, is provided.

A process, for recovery of unreacted olefin monomer(s) from a particulate product of an olefin polymerization reactor, the particulate polymer product is supplied to a degassing vessel, where the particulate product is countercurrently contacted with at least a first gaseous stripping stream, which includes at least 5% by weight unreacted olefin monomer, and then with an inert gas stream under conditions effective to strip hydrocarbon impurities from the polymer product and produce a stripped polymer product, is provided.

Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m.sup.3/h)/(m.sup.3/h).

Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m.sup.3/h)/(m.sup.3/h).

System and methods for solder flux removal from a gas stream is disclosed. In one aspect, the system includes: a scrubber chamber having a gas inlet and a gas outlet through which the gas stream is introduced into and withdrawn from the scrubber chamber; at least one rinse agent delivery mechanism for introducing a rinse agent into the scrubber chamber for contact with the gas stream, the rinse agent being at a temperature for condensing a first portion of the flux from the gas stream; a condenser portion of the scrubber chamber containing the rinse agent for receiving the gas stream, the rinse agent being at a temperature for condensing a second portion of the flux in the gas stream; and a condensed flux removal apparatus adapted for removal from the scrubber chamber of at least a portion of the rinse agent and the flux which has condensed.

Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m.sup.3/h)/(m.sup.3/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m.sup.3/h)/(m.sup.3/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

A droplet generator includes a chamber including an enclosed space filled with gas having vapor, a tube extending through the chamber, a gas flow channel inside the tube, and a heater in the chamber. The tube includes a sidewall having an outer surface exposed to the enclosed space of the chamber, and an inner surface. The tube contains liquid. The heater is operable to change a phase of the liquid contained in the tube to vapor such that the vapor is provided into the enclosed space. A pressure in the enclosed space is higher than a pressure in the gas flow channel such that the vapor in the enclosed space flows to the gas flow channel by passing through the tube.