There is provided an exhaust gas processing apparatus configured to cause a processing gas to be exposed to or come into contact with a liquid and thereby detoxify the processing gas. The exhaust gas processing apparatus comprises a suction casing provided with an inlet which the processing gas is sucked into and with an outlet which the processing gas is flowed out from; a liquid tank configured to receive an outlet-side part of the suction casing and store the liquid therein; and one or multiple spray nozzles placed in the liquid tank. The outlet of the suction casing is arranged to be located above a liquid surface of the liquid stored in the liquid tank. The one or multiple spray nozzles are configured to spray the liquid from around the outlet of the suction casing to a peripheral part of the outlet.

A particles capturing system includes a venturi filter device, a cyclone filter device, a plurality of first nozzles and air to flow through the system. The venturi filter device has an air intake portion, a neck portion and an air outlet portion. The cyclone filter device, disposed in the air outlet portion, has an entrance and an exit. The plurality of first nozzles, disposed inside the venturi filter device, have a height greater than that of the the neck portion. When the air flows, the air enters the venturi filter device via an air inlet of the air intake portion, then orderly passes through the neck portion and the plurality of first nozzles, then enters the cyclone filter device via the entrance, and finally leaves the cyclone filter device via the exit, such that particles in the flowing air can be captured.

A particles capturing system includes a venturi filter device, a cyclone filter device, a plurality of first nozzles and air to flow through the system. The venturi filter device has an air intake portion, a neck portion and an air outlet portion. The cyclone filter device, disposed in the air outlet portion, has an entrance and an exit. The plurality of first nozzles, disposed inside the venturi filter device, have a height greater than that of the the neck portion. When the air flows, the air enters the venturi filter device via an air inlet of the air intake portion, then orderly passes through the neck portion and the plurality of first nozzles, then enters the cyclone filter device via the entrance, and finally leaves the cyclone filter device via the exit, such that particles in the flowing air can be captured.

A separator system and method may provide a four-way separator that may separate a material and remove a hazardous material. The hazardous material may include gas and sand that may be removed by the four-way separator. The separator system and method may further provide a main unit that may include three chambers or recirculation hoppers, an auger sand extractor, and a strap tank. The separator system and method may provide a faster rig-up time and may be exclusively driven by hydraulics.

A separator system and method may provide a four-way separator that may separate a material and remove a hazardous material. The hazardous material may include gas and sand that may be removed by the four-way separator. The separator system and method may further provide a main unit that may include three chambers or recirculation hoppers, an auger sand extractor, and a strap tank. The separator system and method may provide a faster rig-up time and may be exclusively driven by hydraulics.

The present invention relates to a method for conditioning a soot-containing syngas stream in a single integrated apparatus containing a scrubbing vessel wherein particulate matter is decoupled from the waste water stream.

The present invention relates to a method for conditioning a soot-containing syngas stream in a single integrated apparatus containing a scrubbing vessel wherein particulate matter is decoupled from the waste water stream.

A liquid filter apparatus for gas/solid separation includes a housing with a filter chamber, a semiconductor process gas inlet, and a process gas outlet. The filter chamber forms a liquid reservoir, and the semiconductor process gas inlet and the process gas outlet are in communication with the filter chamber. The housing further includes a filter liquid inlet and a filter liquid outlet, which are in communication with the liquid reservoir for delivering and removing filter fluid, respectively, to and from the liquid reservoir.

Disclosed is a method for the removal of urea dust from the off-gas of a finishing section of a urea production plant. the method comprises subjecting the off-gas to quenching with water so as to produce quenched off-gas, and subjecting the quenched off-gas to scrubbing using at least one venturi scrubber. As a result, a lower pressure drop over the scrubber is attained, and a more efficient growth of urea particles, facilitating the removal thereof.

Disclosed is a method for the removal of urea dust from the off-gas of a finishing section of a urea production plant. the method comprises subjecting the off-gas to quenching with water so as to produce quenched off-gas, and subjecting the quenched off-gas to scrubbing using at least one venturi scrubber. As a result, a lower pressure drop over the scrubber is attained, and a more efficient growth of urea particles, facilitating the removal thereof.