B01D2251/50

SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS

Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m.sup.3/h)/(m.sup.3/h).

Ammonia removal from urea finishing

Disclosed is a method for the removal of ammonia from the off-gas of a finishing section of a urea production plant. Also disclosed is a corresponding urea plant, and a method of accordingly modifying a pre-existing urea plant. In a scrubbing section, the off-gas is brought into contact with an acidic scrubbing liquid so as to provide a scrubbed off-gas and a utilized scrubbing liquid comprising ammonium salt. The method specifies an evaporation section, which is part of the urea plant that produces urea melt, that is divided into first and second stages. The first stage is part of the urea melt production plant. The second stage decoupled, as regards recirculation of liquids other than the urea product stream, from the urea melt production plant. This is accomplished by sending utilized scrubbing liquid that contains ammonium salts to the second stage evaporation section, and by sending condensed vapours from said second stage evaporation section to said scrubbing section.

Ammonia removal from urea finishing

A method for the removal of ammonia from the off-gas of a finishing section of a urea production plant, a corresponding urea plant, and a method of accordingly modifying a pre-existing urea plant. In a scrubbing section, off-gas is brought into contact with acidic scrubbing liquid to provide a scrubbed off-gas and a utilized scrubbing liquid comprising ammonium salt. The method specifies an evaporation section, which is part of the urea plant that produces urea melt, that is divided into first and second stages. The first stage is part of the urea melt production plant. The second stage is decoupled, as regards recirculation of liquids other than the urea product stream, from the urea melt production plant. This is accomplished by sending utilized scrubbing liquid containing ammonium salts to the second stage evaporation section, and condensed vapours from said second stage evaporation section to said scrubbing section.

PROCESS FOR ELIMINATING HYDROGEN SULFIDE IN AN AMMONIUM SULFATE SOLUTION
20240042381 · 2024-02-08 ·

A process for substantially removing hydrogen sulfide from an ammonium sulfate solution. The process involves maintaining the pH of the solution to a range that optimally removes entrained hydrogen sulfide. The hydrogen sulfide is then reacted with sulfites, bisulfites, or sulfur dioxide to form ammonium thiosulfate.

Submicron particle removal from gas streams

Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m.sup.3/h)/(m.sup.3/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

METHOD AND APPARATUS FOR PURIFICATION AND TREATMENT OF AIR
20190366263 · 2019-12-05 · ·

The invention discloses methods and apparatus(es) for the removal and control of pollutants such as gases and suspended particulates in the air of an enclosed space or an outdoor environment by passing the air through absorbent media. The absorbent media includes any liquid, solid or combination of liquid and solid media that is capable of absorbing a material in which it comes in contact. In one aspect of the invention, formaldehyde is removed by air sparging through a liquid such as water, optionally containing additional scavenging agents.

Sulfur adsorbent and a method of separating sulfur compounds from a sulfur-containing mixture

A sulfur adsorbent comprising boric acid deposited on an activated carbon support, and a method of separating at least a portion of sulfur compounds from a sulfur-containing mixture with the sulfur adsorbent. Various combinations of embodiments of the sulfur adsorbent and the method are also provided.

Method and apparatus for purification and treatment of air
10456736 · 2019-10-29 · ·

The invention discloses methods and apparatus(es) for the removal and control of pollutants such as gases and suspended particulates in the air of an enclosed space or an outdoor environment by passing the air through absorbent media. The absorbent media includes any liquid, solid or combination of liquid and solid media that is capable of absorbing a material in which it comes in contact. In one aspect of the invention, formaldehyde is removed by air sparging through a liquid such as water, optionally containing additional scavenging agents.

Substrate processing device
10446388 · 2019-10-15 · ·

A substrate processing apparatus includes a processing unit supplying at least one of a plurality of types of chemical liquids to a substrate and a scrubber cleaning an exhaust by bringing the exhaust in contact with a scrubbing liquid. The scrubber includes an exhaust passage that guides the exhaust, generated at the processing unit and containing the chemical liquid, toward an exhaust equipment disposed outside the substrate processing apparatus and a discharger that is able to discharge each of a plurality of types of scrubbing liquids that clean the exhaust individually inside the exhaust passage. A controller selects any one of the plurality of types of scrubbing liquids based on the type of chemical liquid contained in the exhaust and makes the selected scrubbing liquid be discharged from the discharger.

Method and device for treating nitroso compound

A method for decomposing a nitroso compound, comprising: adding an aqueous solution containing hydrogen halide to a liquid to be treated that contains the nitroso compound in such a manner that the hydrogen halide is present in an amount of 2 mol or more and 20 mol or less per mol of a nitroso group in the nitroso compound; and subsequently heating the resulting liquid to be treated at a temperature of not lower that 75 C. and not higher than a boiling point of water under ordinary pressure, thereby an amines are recovered.