Patent classifications
B01D2256/18
Ultramicro to mesopore frameworks for selective separation and storage of noble gases
Methods and materials for the selective capture and storage of preselected materials from gas streams using metal organic framework (MOF) materials are described. In various embodiments preselected target material gases could include noble gasses such as Kr, Xe, Rn, Arultramicro to mesopore frameworks for selective separation and storage of noble gases, other gasses such as I.sub.2 or other particular isotopes either naturally occurring or man-made, or another preselected gas capture material such as a target material for legal, regulatory or treaty compliance, or a preselected material from a particular process such as a cleaning or etching agent from semiconducting or microelectronic manufacture, or a portion of an anesthetic gas such as nitrous oxide, isoflurane, sevoflurane or a fluorinated ethers.
Polyimide blends, methods of making each and methods of use
Embodiments of the present disclosure describe polyimide blend compositions, methods of making polyimide blend compositions, methods of using polyimides, membranes including polyimide blends, methods of making membranes including polyimide blends, methods of separating mixtures using the membranes including polyimide blends, and the like.
Method for purifying a carrier gas
The invention relates to a method for purifying a carrier gas which comprises oxygenated impurities in a first oxidation degree, the purification method comprising the circulation, advantageously uninterrupted, of the carrier gas through and along a direction XX′ of a filter, the filter being made of an oxygen scavenger material which has a redox potential E°, and of which a first portion is in a reduced redox state and within which the oxygenated impurities are scavenged and/or pass from the first oxidation degree to a second oxidation degree, the method further comprising the application to the filter of a greater electric potential ΔV, as an absolute value, than the redox potential E° during a main purification cycle CP.
Gas recovering apparatus, semiconductor manufacturing system, and gas recovering method
According to one embodiment, a gas recovering apparatus includes a casing and a tube. The casing is provided with an inlet through which a gas flows in, a first outlet for discharging a first gas containing a gas to be recovered of the gas, and a second outlet for discharging a second gas other than the first gas of the gas. The casing is evacuated via the first outlet. The tube is provided in the casing from the inlet to the second outlet, and has a high permeability to the first gas and a low permeability to the second gas.
GAS RECOVERY METHOD
The invention provides a process of purifying a fluid useful in a manufacturing process, particularly in the manufacture of silicon wafers, by removing one or more impurities; and apparatus for use in the process.
HELIUM PURIFICATION PROCESS AND UNIT
In a helium purification process, a stream containing at least 10% of helium, at least 10% of nitrogen in addition to hydrogen and methane is separated to form a helium-enriched stream containing hydrogen, a first stream enriched in nitrogen and in methane and a second stream enriched in nitrogen and in methane, the helium-enriched stream is treated to produce a helium-rich product and a residual gas containing water, the residual gas is treated by adsorption (TSA) to remove the water and the regeneration gas from the adsorption is sent to a combustion unit (O).
Methods and systems for managing gas purification
A method for extending useful life of a sorbent for purifying a gas by sorption of an impurity is provided. The method generating a electrical discharge within the gas to obtain a spectral emission representative of a concentration of the impurity. The method also includes monitoring the concentration of the impurity according to the spectral emission. The method also includes lowering the concentration of the impurity by conversion of at least a portion of the impurity into a secondary impurity having a greater affinity to the sorbent than the impurity. The method also includes comparing the concentration of the impurity to a polluting concentration and managing the sorption of the gas onto the sorbent according to the comparison.
A NOBLE GAS RECOVERY SYSTEM
A system comprising a pumping system configured to pump respective exhaust gases from each of a plurality of chemical etching process chambers and to combine the exhaust gases to provide a combined exhaust gas, and a noble gas recovery system configured to process the combined exhaust gas to remove one or more noble gases therefrom.
Bandpass filter for separation of a specifically selected gas from a group of gases or an atmosphere
A method of separation of predetermined gas from the mixture of gases or an atmosphere, wherein said method of separation of predetermined gas from a mixture of gases or an atmosphere comprises passing a mixture of gases or an atmosphere through the reinforced mass selective fluid bandpass filter (8). The reinforced mass selective fluid bandpass filter comprises the mass selective fluid bandpass filter element (9) permanently affixed to the sintered metal load bearing structure (14). The mass selective fluid bandpass filter element consists of quartz glass, of either natural or manmade origin. This method provides removing predetermined gas from the group consisting of: .sup.1H.sub.2, .sup.1H.sup.2H, .sup.2H.sub.2, .sup.1H.sup.3H, .sup.2H.sup.3H, .sup.3H.sub.2, .sup.1H.sub.2O, .sup.1H.sup.2HO, .sup.2H.sub.2O.sub., .sup.1H.sup.3HO, .sup.2H.sup.3HO, .sup.3H.sub.2O, O.sub.2, O.sub.3, .sup.12CO.sub.2, .sup.13CO.sub.2, .sup.14CO.sub.2, .sup.4 CO, N.sub.2, NO, NO.sub.2, NO.sub.x, SiO.sub.2, FeO, Fe.sub.2O.sub.3, SiF.sub.4, HF, NH.sub.3, SO.sub.2, SO.sub.3, H.sub.2SO.sub.4, H.sub.2S, .sup.35Cl.sub.2, .sup.37Cl.sub.2, F.sub.2, Al.sub.2O.sub.3, CaO, MnO, P.sub.2O.sub.5, phenols, volatile organic compounds, and peroxyacyl nitrates.
Gas separation membrane, gas separation membrane element, and gas separation method
Provided is a gas separation membrane that can be used continuously. The gas separation membrane comprises: a porous support membrane that contains an aromatic polyamide in which an aromatic ring has been replaced with a chloro group; and a separation functional layer that is disposed on the surface of the porous support membrane and contains a cross-linked polyamide obtained by polycondensation of a polyfunctional amine and a polyfunctional acid halide.