Patent classifications
B01D2257/55
METHOD FOR REMOVING SILICON POWDER IN COOLANT FOR MONOCRYSTALLINE SILICON SLICING WITH DIAMOND WIRE
The present disclosure provides a method for removing silicon powder in a coolant for monocrystalline silicon slicing with a diamond wire, including following steps: preparing an inorganic coagulation-inducing saline solution; mixing the inorganic coagulation-inducing saline solution with a waste coolant of the coolant after monocrystalline silicon slicing to obtain a mixture, and leaving the mixture to stand to carry out agglomeration and precipitation of the silicon powder. The inorganic coagulation-inducing saline solution has advantages of being inexpensive, non-toxic, easy to obtain, and achieving good agglomeration and precipitation. It is inexpensive to remove the silicon powder in the waste coolant for the monocrystalline silicon slicing with the diamond wire, and does not cause environmental pollution. The recovered silicon powder can be recycled and sold again, and the coolant can be reused for cutting after simple treatment.
PLASMA ABATEMENT OF COMPOUNDS CONTAINING HEAVY ATOMS
A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.
METHOD AND APPARATUS FOR CLEANING A CONTAMINATED AIR STREAM
A method and apparatus for cleaning a contaminated air stream, the method comprising the step of passing the contaminated air stream through a multistage cleaning reactor, wherein at least two stages of the multistage cleaning reactor comprise marine shell material.
Diesel Oxidation Catalyst Having a Capture Region for Exhaust Gas Impurities
An oxidation catalyst is described for treating an exhaust gas produced by a diesel engine, wherein the oxidation catalyst comprises: a substrate; a capture material for capturing at least one phosphorus containing impurity and/or at least one sulfur containing impurity in the exhaust gas produced by the diesel engine; and a catalytic region disposed on the substrate; wherein the catalytic region comprises a catalytic material comprising a platinum group metal (PGM) selected from the group consisting of platinum (Pt), palladium (Pd) and a combination of platinum (Pt) and palladium (Pd).
Plasma abatement of compounds containing heavy atoms
A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.
HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEMENT SYSTEM, AND VACUUM PROCESSING SYSTEM
Embodiments disclosed herein include a method for abating compounds produced in semiconductor processes. The method includes energizing an abating agent, forming a composition by reacting the energized abating agent with gases exiting a vacuum processing chamber, and flowing the composition through a plurality of holes formed in a cooling plate. By cooling the composition with the cooling plate, damages on the downstream pump are avoided.
System and Method for Scrubbing Contaminated Gas with a Glycerol Solution
Both a system and a method for scrubbing a contaminated gas stream with a glycerol solution are disclosed. The system includes a contaminated gas stream in need of purification, along with a column which receives the contaminated gas stream. A glycerol solution is also received by the column and is used to scrub the contaminated gas stream in the column. The glycerol solution is used to reduce at least three contaminants from the gas stream, and includes greater than 50% glycerol and less than 98% glycerol. In one embodiment, the glycerol solution includes between 0.5% to 10% salts, wherein the salts are sodium based, potassium based or a combination thereof. The salts act catalytically to convert glycerol and carbon dioxide to glycerol carbonate.
Siloxane filtration system and method
A particulate and siloxane filtration system may include a housing and a filter media assembly. The filter media assembly may be disposed within the housing and positioned to filter intake gases to an internal combustion engine. The filter media assembly may include a particulate media configured to remove particulates from the intake gases and a siloxane media configured to remove siloxanes from the intake gases.
Gas scrubber system and method
A system for treating a biogas stream is described. The system includes a venturi device in communication with a biogas stream source and an influent water source to combine the biogas stream and the influent water to produce a gas-water effluent. The system also includes a degas separator in communication with the venturi device for receipt of the gas-water effluent to produce a relatively low solubility gas effluent and a relatively high solubility gas-water mixture effluent. In addition, the system includes a gas-water pressure release valve in communication with the degas separator to control release of the relatively low solubility gas effluent and a discharge pressure control valve in communication with the degas separator to control release of the relatively high solubility gas-water mixture effluent.
Separation and recycling system of perfluorinated compounds
The present invention relates to a system for separating and recycling a perfluorinated or perfluor compound, and more particularly, to a system for separating and recycling a perfluorinated compound, which is developed to prevent damage of separation membranes and degradation of the separation efficiency of through the application of a constant pressure to respective separation membranes when the perfluoro compound passes through a plurality of separation membranes in a process of effectively separating, removing and recycling the perfluoro compound including sulfur hexafluoride primarily generated in a semiconductor manufacturing process.