The invention relates generally to a mixing system for mixing a dry material with a liquid. The mixing system includes a supply of dry material and a supply of liquid. An infinitely variable metering device meters the dry material into the liquid. A sensor senses the ratio of dry material to liquid. The sensor is operatively connected to the metering device to control the metering device to obtain a desired ratio of dry material to liquid. The dry material is dispensed volumetrically by volume of liquid to form the desired ratio of dry material to liquid.

The present invention relates to a mixing apparatus. A production unit produces a working fluid that is in a supercritical state or a subcritical state. A storage unit stores a material. A dissolving unit dissolves the material in the working fluid. A mixer mixes the material together in the presence of the working fluid. A material feed valve opens or closes a flow passage through which the material is to pass to be fed from the storage unit into the dissolving unit. A working fluid inflow valve opens or closes a flow passage through which the working fluid is to pass to flow into the dissolving unit from the production unit. A mixer inflow valve opens or closes a flow passage through which the working fluid and the material are to pass to flow into the mixer from the dissolving unit.

An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system and a recirculation loop to the dilution reservoir for enhanced mixing of the dilute concentrate. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.

A device for dispensing a compound that has a side opening for side loading the compound. The side opening is defined by alignment of a first opening and a second opening of respective first and second members of the device.

A passive fluid treatment assembly is provided including a passive treatment body defining a primary flow path and a liquid treatment path. The liquid treatment path bypasses a portion of the primary flow path and enters a treatment enclosure through a high pressure port. The fluid entering the high pressure port is treated by a treatment media in the treatment enclosure and exits through a low pressure port into a mixing chamber where it is remixed with the fluid in the primary flow path. A one-way valve is operably coupled to an outlet of the high pressure port for preventing the flow of treated fluid from exiting the treatment enclosure through the high pressure port.

An exemplary embodiment of the present invention provides a urea water manufacturing device which can reduce the time for producing urea water by forming a vibrating atmosphere using an ultrasonic wave generator when stirring urea and pure water supplied inside a stirring tank, and can produce urea water with high purity by real-time feedback control of specific gravity of urea water, and a method thereof. The urea water manufacturing device according to an exemplary embodiment of the present invention includes a pure water supply unit, a urea supply unit, a stirring unit, a specific gravity detection unit, a control unit, and a urea water discharge unit.

A discharge system includes a mixing vessel and a feedstock input in fluid communication with the mixing vessel. A solvent input is in fluid communication with the mixing vessel. A discharge output is in fluid communication with an outlet of the mixing vessel to discharge effluent. A method for generating turbulence on a liquid surface within a discharge system includes supplying a mixing vessel with feedstock fluid and solvent fluid to generate a liquid mixture and a gas pocket in the mixing vessel. The method includes supplying an impinging solvent fluid through a nozzle extending from a first end of the mixing vessel to generate a roiling surface at an interface between the gas pocket and the liquid mixture and permit uptake of gas from the gas pocket into the liquid mixture.

A passive fluid treatment assembly is provided including a passive treatment body defining a primary flow path and a liquid treatment path. The liquid treatment path bypasses a portion of the primary flow path and enters a treatment enclosure through a high pressure port. The fluid entering the high pressure port is treated by a treatment media in the treatment enclosure and exits through a low pressure port into a mixing chamber where it is remixed with the fluid in the primary flow path. A one-way valve is operably coupled to an outlet of the high pressure port for preventing the flow of treated fluid from exiting the treatment enclosure through the high pressure port.

A water spout sanitary cover is provided. The cover is disposable and is configured to fit over a portion of the water spout to provide a sanitary layer. The cover may prevent microbial transfer between the spout, water, and a vessel being filled with water. The cover is disposable, and replaceable, and may be provided in a stacked dispenser.

A baffle pipe segment (1) as obstacle in a flow of a target liquid through the baffle pipe segment (1), comprising a baffle element (3) arranged in the path of the target liquid, wherein a slit (14) for passage of the target liquid is formed between a segment hull (8) of the baffle pipe segment (1) and the baffle element (3). The baffle element (3) comprises at least one first positive curvature (3a) towards the input side. The slit (14) is delimited by an inner wall (14a) and an outer wall (14b), wherein the inner wall (14a) is formed by a wall section of the baffle element (3) and the outer wall (14b) of the slit (14) is formed by a section of the segment hull (8). The slit (14) extends in a perpendicular direction to the longitudinal axis (z) along a section of the circumference of the segment hull (8). And an injector device (7) with such a baffle pipe segment (1) and a dissolving installation (50) with such an injector device (7).