Systems, methods, apparatuses, and computer program products for proportional gas mixing. A method for mixing gas may include receiving, at a modified ball valve, a first gas via a first gas input port of the modified ball valve, and a second gas via a second gas input port of the modified ball valve. The method may also include coupling a motor control device with the modified ball valve. The method may further include operating the modified ball valve via the motor control device by adjusting a position of the modified ball valve. In addition, the method may include releasing a gas mixture of the first gas and the second gas through a gas output port of the modified ball valve.

A vacuum line and method for controlling a vacuum line in which an auxiliary pumping device and a diluent gas injection device are controlled according to a first operating mode in which the pressure prevailing in the discharge pipe is maintained at less than or equal to 20,000 Pa or according to a second operating mode in which the pressure prevailing in the discharge pipe is greater than 20,000 Pa, and the injection of a diluent gas into the stream of the pumped gases is controlled, downstream of an intake of the rough pumping device, such as into the discharge pipe and/or into the rough pumping device and/or into the auxiliary pumping device by the diluent gas injection device in the second operating mode.

Plant for delivering a gas mixture to a silicon wafer doping unit comprising a source of a dopant gas (1), a source of a carrier gas (2), a mixer device (3) connected to the container of dopant gas (1) and to the source of carrier gas (2), a first flow regulator member (41) and a second flow regulator member (42) for regulating the flows of the dopant gas (1) and of the carrier gas (2) towards the mixer device (3), a control unit (5) for controlling the first and second flow regulator members (41, 42) so as to adjust the first flow rate setpoint (D1) and the second flow rate setpoint (D2) in proportions determined as a function of at least one target content (C1, C2) of dopant gas (1) and/or carrier gas (2) in the mixture, a buffer tank (7), a delivery line (6) for delivering the mixture to a doping unit (10) with a consumption flow rate (DC), at least one measurement sensor (8) for measuring a physical quantity, the variation of which is representative of a variation in the consumption flow rate (DC) and for providing a first measurement signal, the control unit (5) being connected to the sensor (8) and configured to produce a first control signal from the first measurement signal, the flow regulator members (41, 42) being configured to adjust the first and second flow rate setpoints (D1, D2) in response to said first control signal.

A gas mixing system for semiconductor fabrication includes a mixing block. The mixing block defines a gas mixing chamber, a first gas channel fluidly coupled to the gas mixing chamber at a first exit location, and a second gas channel fluidly coupled to the gas mixing chamber at a second exit location, wherein the first exit location is diametrically opposite the second exit location relative to the gas mixing chamber and the second gas channel has a bend of 90 degrees or less between an entrance of the second gas channel and the second exit location.

A gas mixing system for semiconductor fabrication includes a mixing block. The mixing block defines a gas mixing chamber, a first gas channel fluidly coupled to the gas mixing chamber at a first exit location, and a second gas channel fluidly coupled to the gas mixing chamber at a second exit location, wherein the first exit location is diametrically opposite the second exit location relative to the gas mixing chamber and the second gas channel has a bend of 90 degrees or less between an entrance of the second gas channel and the second exit location.

A plant for delivering a gas mixture including a source of a first gas, a source of a second gas, a mixer device fluidically connected to the source of first gas and to the source of second gas. A first flow regulator member and a second flow regulator member, a control unit, a buffer tank, at least one measurement sensor configured to measure a physical quantity, the variation of which is representative of a variation in the consumption flow rate delivered by the delivery line and to provide a first measurement signal of said physical quantity.

A control valve features a first housing and a second housing. The first housing includes a first inlet port having a first inlet port orifice member with a first inlet port orifice size configured to provide a first inlet fluid with a first inlet volumetric flow rate, the first inlet port orifice member being detachably coupled inside the first inlet port; includes a second inlet port having a second inlet port orifice member with a second inlet port orifice size configured to provide a second inlet fluid with a second inlet volumetric flow rate, the second inlet port orifice member being detachably coupled inside the second inlet port; and includes a first housing rim configured to extend from the first fixed inlet and the second fixed inlet. The second housing includes a second housing rim coupled to the first housing rim and configured to form a mixture chamber to mix the first inlet fluid received from the first fixed inlet orifice and the second inlet fluid received from the second fixed inlet orifice and provide a mixture chamber fluid; and an outlet port having an outlet port orifice with an outlet port orifice size configured to provide the mixture chamber fluid as an outlet port fluid having an outlet volumetric flow rate. The outlet port fluid has a mixture ratio of the first inlet fluid and the second inlet fluid for a particular application that depends on dimensions of the first inlet port orifice size, the second inlet port orifice size and the outlet port orifice size.

A flammable gas diluter includes: a dilution vessel comprising an outer envelope defining a longitudinal flow passage from an inlet to an outlet; at least one air inlet for directing a flow of air into the inlet of the diluter; and a flammable gas inlet arrangement. The dilution vessel has a plurality of gas flow directing formations arranged between the flammable gas inlet arrangement and the outlet, each being at a different position along a length of the dilution vessel. At least one of the plurality of gas flow formations is an inwardly directing gas flow formation for directing gas flow away from the outer envelope and at least one of the gas flow formations is an outwardly directing gas flow formation for directing gas flow towards the outer envelope.

A flammable gas diluter includes: a dilution vessel comprising an outer envelope defining a longitudinal flow passage from an inlet to an outlet; at least one air inlet for directing a flow of air into the inlet of the diluter; and a flammable gas inlet arrangement. The dilution vessel has a plurality of gas flow directing formations arranged between the flammable gas inlet arrangement and the outlet, each being at a different position along a length of the dilution vessel. At least one of the plurality of gas flow formations is an inwardly directing gas flow formation for directing gas flow away from the outer envelope and at least one of the gas flow formations is an outwardly directing gas flow formation for directing gas flow towards the outer envelope.

Exemplary modular gas delivery assemblies may include a plurality of modular gas blocks coupled together. Each gas block may include an upper portion and a lower portion. A first end of the upper portion may extend beyond a first end of the lower portion and a second end of the lower portion may extend beyond a second end of the upper portion. A first fluid channel may include a first fluid port, a second fluid port, and a third fluid port. The block body may define a second fluid channel that extends transversely to the first fluid channel. A first modular gas block may be coupled with a second modular gas block and a third modular gas block such that the first fluid channels of each of the first, second, and third modular gas blocks are fluidly coupled with one another.