A gas mixing system for semiconductor fabrication includes a mixing block. The mixing block defines a gas mixing chamber, a first gas channel fluidly coupled to the gas mixing chamber at a first exit location, and a second gas channel fluidly coupled to the gas mixing chamber at a second exit location, wherein the first exit location is diametrically opposite the second exit location relative to the gas mixing chamber and the second gas channel has a bend of 90 degrees or less between an entrance of the second gas channel and the second exit location.

The present invention relates to a method for producing and delivering a gas mixture having a selected composition of a first gas and at least one second gas, comprising the following steps: (a) providing a main gas flow comprising the first gas in a main conduit, (b) separating the main gas flow into a first plurality of secondary gas flows, (c) guiding each secondary gas flow through a secondary conduit, (d) adding at least one second gas to at least one of the first plurality of secondary gas flows in the respective secondary conduit through a delivering conduit, said delivering conduit protruding into the secondary conduit, and (e) combining the first plurality of secondary gas flows to the gas mixture. With the technical teaching of the present invention a dynamic gas bottle filling is possible wherein the second gas components may have a concentration form some ppb to percent.

The present disclosure generally provides methods of providing at least metastable radical molecular species and/or radical atomic species to a processing volume of a process chamber during an electronic device fabrication process, and apparatus related thereto. In one embodiment, the apparatus is a gas injection assembly disposed between a remote plasma source and a process chamber. The gas injection assembly includes a body, a dielectric liner disposed in the body that defines a gas mixing volume, a first flange to couple the gas injection assembly to a process chamber, and a second flange to couple the gas injection assembly to the remote plasma source. The gas injection assembly further includes one or more gas injection ports formed through the body and the liner.

The present disclosure generally provides methods of providing at least metastable radical molecular species and/or radical atomic species to a processing volume of a process chamber during an electronic device fabrication process, and apparatus related thereto. In one embodiment, the apparatus is a gas injection assembly disposed between a remote plasma source and a process chamber. The gas injection assembly includes a body, a dielectric liner disposed in the body that defines a gas mixing volume, a first flange to couple the gas injection assembly to a process chamber, and a second flange to couple the gas injection assembly to the remote plasma source. The gas injection assembly further includes one or more gas injection ports formed through the body and the liner.

A disturbance device has two jet mixers, which are oppositely disposed in the horizontal direction; a mixing chamber, which is connected between the two jet mixers; and mixing pipes, which are connected below the mixing chamber. The mixing pipes comprise: a central pipe, which is a vertical straight pipe; multiple helical pipes, which are wound in multiple layers and provided outside the central pipe, the diameters of the multiple helical pipes gradually increasing from the inner to outer layers, and multiple flow deflector assemblies being provided at intervals in each helical pipe; and an outer sleeve, which is a straight pipe, the outer sleeve being sleeved outside the outermost helical pipe. A continuous gas separation system combines a hydrate-based process and a reverse osmosis process, using the disturbance device, enables continuous gas separation.

There is provided a hydrogen gas mixing device, including: a water electrolysis part configured to generate a hydrogen gas and an oxygen gas by electrolysis of water; a mixing gas supply part configured to supply a mixing gas; and a gas mixing part configured to mix the hydrogen gas and the mixing gas, wherein a non-combustible dilution gas is introduced into an oxygen flow part of the water electrolysis part through which the oxygen gas flows.

A method for filling a batch of gas bottles with a gas mixture, wherein the gas mixture may have of a single constituent in a matrix or a plurality of constituents in a matrix, which matrix has of one or more base gases, in which a real-time analysis of all the constituents of the gas mixture is carried out at the exit of a mixing chamber and before it enters a compression stage.

A method for filling a batch of gas bottles with a gas mixture, wherein the gas mixture may have of a single constituent in a matrix or a plurality of constituents in a matrix, which matrix has of one or more base gases, in which a real-time analysis of all the constituents of the gas mixture is carried out at the exit of a mixing chamber and before it enters a compression stage.

Systems and methods are described for dissolving ammonia gas in deionized water. The system includes a deionized water source and a gas mixing device including a first inlet for receiving ammonia gas, a second inlet for receiving a transfer gas, and a mixed gas outlet for outputting a gas mixture comprising the ammonia gas and the transfer gas. The system includes a contactor that receives the deionized water and the gas mixture and generates deionized water having ammonia gas dissolved therein. The system includes a sensor in fluid communication with at least one inlet of the contactor for measuring a flow rate of the deionized water, and a controller in communication with the sensor. The controller sets a flow rate of the ammonia gas based on the flow rate of the deionized water measured by the sensor, and a predetermined conductivity set point.

Methods and systems are provided for a mixer. In one example, a system may include an EGR mixing having a downstream surface with a plurality of venturi tubes extending therefrom.