An apparatus for gas mixing for a laser and/or air cutting machine. The apparatus includes a housing including a first inlet for nitrogen, a second inlet for oxygen, and an outlet for a gas mixture of the nitrogen and oxygen. A mixing unit including a mixer manifold between and connected to the gas outlet and each of the first and second inlets, the mixer manifold including a plurality of blending valves. A digital controller adjusts the plurality of blending valves, to achieve an oxygen percent in the gas mixture from about 0.5% to about 22%. A first oxygen percent of below 10% is generally useful for a laser cutter, and a second oxygen percent above 20% is generally useful for an air cutter. The gas mixture is provided at a pressure of about 33 to 35 bar, and the apparatus operates without a pressure blending or buffer tank, or further compressor.

A fluid distributor comprises a first conduit extending along a first elongated axis and a second conduit circumscribing the first conduit. A first area comprises a cross-sectional flow area of the first conduit taken perpendicular to the first elongated axis. The first conduit comprises a first plurality of orifices comprising a first combined cross-sectional area. The second conduit comprises a second plurality of orifices comprising a second combined cross-sectional area. A first ratio of the first area to the first combined cross-sectional area can be about 2 or more. A second ratio of the first combined cross-sectional area to the second combined cross-sectional area can be about 2 or more. An angle between a direction of an orifice axis of a first orifice of the first plurality of orifices and a direction of an orifice axis of a first orifice of the second plurality of orifices can be from about 45° to 180°.

A mixer arrangement for an exhaust gas system, having an inlet opening through which an exhaust gas mass flow (A) can be guided, and a mixer for swirling the exhaust gas, which has at least one inflow opening that is fluidically connected to the inlet opening, wherein at least one first portion (A1) of the exhaust gas mass flow (A) can be guided through the mixer via the at least one inflow opening, an injection device by means of which an additive can be injected, and a bypass having at least one throughflow opening which is fluidically connected to the inlet opening and through which a second portion (A2) of the exhaust gas mass flow (A) can be guided past the mixer, there being provided at least one regulating body by means of which a flow cross-section Q in the mixer arrangement can be varied such that a ratio V with (formula I) can be varied.

A mixer arrangement for an exhaust gas system, having an inlet opening through which an exhaust gas mass flow (A) can be guided, and a mixer for swirling the exhaust gas, which has at least one inflow opening that is fluidically connected to the inlet opening, wherein at least one first portion (A1) of the exhaust gas mass flow (A) can be guided through the mixer via the at least one inflow opening, an injection device by means of which an additive can be injected, and a bypass having at least one throughflow opening which is fluidically connected to the inlet opening and through which a second portion (A2) of the exhaust gas mass flow (A) can be guided past the mixer, there being provided at least one regulating body by means of which a flow cross-section Q in the mixer arrangement can be varied such that a ratio V with (formula I) can be varied.

A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.

A hydrogen supply apparatus includes: an air path having an inlet and an outlet; a fan that is disposed in the air path and produces a flow of air from the inlet to the outlet; a first pipe having an end that forms a first supply port through which to supply hydrogen gas to the air path; a flow control device that is attached to the first pipe and adjusts a flow rate of the hydrogen gas; and a hydrogen gas sensor, disposed downstream of the fan or the end in a direction of flow of the air that detects a concentration of the hydrogen gas in the air path, where the end is disposed between the fan and the outlet or between the fan and the inlet in the air path.

The present disclosure generally provides methods of providing at least metastable radical molecular species and/or radical atomic species to a processing volume of a process chamber during an electronic device fabrication process, and apparatus related thereto. In one embodiment, the apparatus is a gas injection assembly disposed between a remote plasma source and a process chamber. The gas injection assembly includes a body, a dielectric liner disposed in the body that defines a gas mixing volume, a first flange to couple the gas injection assembly to a process chamber, and a second flange to couple the gas injection assembly to the remote plasma source. The gas injection assembly further includes one or more gas injection ports formed through the body and the liner.

The present disclosure generally provides methods of providing at least metastable radical molecular species and/or radical atomic species to a processing volume of a process chamber during an electronic device fabrication process, and apparatus related thereto. In one embodiment, the apparatus is a gas injection assembly disposed between a remote plasma source and a process chamber. The gas injection assembly includes a body, a dielectric liner disposed in the body that defines a gas mixing volume, a first flange to couple the gas injection assembly to a process chamber, and a second flange to couple the gas injection assembly to the remote plasma source. The gas injection assembly further includes one or more gas injection ports formed through the body and the liner.

This application relates to an apparatus for reducing fine dust by using lightweight mixed air. The apparatus may include an apparatus main body configured to introduce and mix external air and remove the fine dust through adsorption, a seal type air mixing unit configured to mix the introduced external air and helium gas, an adsorption solution production unit configured to produce an adsorption solution for adsorbing the fine dust. The apparatus may also include an air bubble generation unit configured to generate air bubbles, emitted to outside, by using the adsorption solution, a flow control unit configured to control flow of air, so as to induce air bubble generation in the air bubble generation unit. The apparatus may further include a controller installed in a part of the apparatus main body and configured to control operations of the above units of the apparatus.

A fuel cell system includes a fuel cell stack, a mixed gas supply passage, and an agitation mixer. The fuel cell stack includes a plurality of fuel cells each including a power generation portion. The fuel cells are stacked. The mixed gas supply passage is configured to communicate with the fuel cell stack. The mixed gas supply passage is configured to supply a mixed gas to the fuel cell stack. The mixed gas is a mixture of a fuel gas and a fuel off-gas that has been discharged from the fuel cell stack. The agitation mixer is provided in the mixed gas supply passage. The agitation mixer is configured to apply a swirling force to the mixed gas. The agitation mixer includes a guide rib configured to guide liquid water contained in the mixed gas to a side opposite to the power generation portion-side.