Exemplary semiconductor processing systems may include a processing chamber, and may include a remote plasma unit coupled with the processing chamber. Exemplary systems may also include a mixing manifold coupled between the remote plasma unit and the processing chamber. The mixing manifold may be characterized by a first end and a second end opposite the first end, and may be coupled with the processing chamber at the second end. The mixing manifold may define a central channel through the mixing manifold, and may define a port along an exterior of the mixing manifold. The port may be fluidly coupled with a first trench defined within the first end of the mixing manifold. The first trench may be characterized by an inner radius at a first inner sidewall and an outer radius, and the first trench may provide fluid access to the central channel through the first inner sidewall.

A system and a method for generating a liquid mixture are provided. The system may comprise: a plurality of reservoirs, wherein the reservoirs are configured to hold a plurality of viscous liquids; at least one mixing device, wherein the mixing device is configured to mix at least two liquids from the plurality of reservoirs, and wherein the mixing device includes a static mixer; a plurality of peristaltic pumps configured to deliver the liquids from the reservoirs to the mixing device; at least one electronic system, wherein the electronic system is configured to receive at least one user-specific information regarding a mixing ratio of the at least two liquids from a computer app on at least one mobile device, and wherein the system is configured to mix the at least two liquids according to the predefined mixing ratio by employing the plurality of peristaltic pumps and the static mixer.

An interchangeable mixing element for a static mixer includes a mount portion arranged for fixation to an exterior of a manifold body and an insert portion extending from the mount portion. The mount portion is arranged for support within a mixing element seat of the manifold body by the mount portion. The insert portion defines a mixing chamber having an inlet, an outlet opposite the inlet, and a tortuous path fluidly coupling the outlet to the inlet to intermix a first fluid flow and a second fluid received at the inlet of the mixing element into an intermixed fluid flow issued from the outlet of the mixing element. Static mixers and methods of making static mixers are also described.

Exemplary semiconductor processing systems may include a processing chamber, and may include a remote plasma unit coupled with the processing chamber. Exemplary systems may also include a mixing manifold coupled between the remote plasma unit and the processing chamber. The mixing manifold may be characterized by a first end and a second end opposite the first end, and may be coupled with the processing chamber at the second end. The mixing manifold may define a central channel through the mixing manifold, and may define a port along an exterior of the mixing manifold. The port may be fluidly coupled with a first trench defined within the first end of the mixing manifold. The first trench may be characterized by an inner radius at a first inner sidewall and an outer radius, and the first trench may provide fluid access to the central channel through the first inner sidewall.

Exemplary semiconductor processing systems may include a processing chamber, and may include a remote plasma unit coupled with the processing chamber. Exemplary systems may also include a mixing manifold coupled between the remote plasma unit and the processing chamber. The mixing manifold may be characterized by a first end and a second end opposite the first end, and may be coupled with the processing chamber at the second end. The mixing manifold may define a central channel through the mixing manifold, and may define a port along an exterior of the mixing manifold. The port may be fluidly coupled with a first trench defined within the first end of the mixing manifold. The first trench may be characterized by an inner radius at a first inner sidewall and an outer radius, and the first trench may provide fluid access to the central channel through the first inner sidewall.

A mixing device includes a conveying part, a discharging pipe and a detecting part. The conveying part is internally provided with a plurality of conveying channels, and the plurality of conveying channels are used for correspondingly conveying various materials. The discharging pipe is internally provided with a mixing channel and connected to the conveying part, and each of the conveying channels communicates with the mixing channel. The detecting part is used for detecting a color of the mixed material obtained after the various materials are mixed in the mixing channel.

The present invention relates to a spacer for high pressure mixing head comprising a control cylinder flange, a head body flange, and a plurality of uprights adapted to interconnect the control cylinder flange and the head body flange. At least one of the plurality of uprights comprises at least one deformation detection sensor applied at at least one available deformation surface thereof and adapted to detect longitudinal deformations and/or transversal deformations of the at least one of the plurality of uprights. The present invention also relates to a related mixing and dosing head and to a related apparatus.

Exemplary semiconductor processing systems may include a processing chamber, and may include a remote plasma unit coupled with the processing chamber. Exemplary systems may also include a mixing manifold coupled between the remote plasma unit and the processing chamber. The mixing manifold may be characterized by a first end and a second end opposite the first end, and may be coupled with the processing chamber at the second end. The mixing manifold may define a central channel through the mixing manifold, and may define a port along an exterior of the mixing manifold. The port may be fluidly coupled with a first trench defined within the first end of the mixing manifold. The first trench may be characterized by an inner radius at a first inner sidewall and an outer radius, and the first trench may provide fluid access to the central channel through the first inner sidewall.

Exemplary semiconductor processing systems may include a processing chamber, and may include a remote plasma unit coupled with the processing chamber. Exemplary systems may also include a mixing manifold coupled between the remote plasma unit and the processing chamber. The mixing manifold may be characterized by a first end and a second end opposite the first end, and may be coupled with the processing chamber at the second end. The mixing manifold may define a central channel through the mixing manifold, and may define a port along an exterior of the mixing manifold. The port may be fluidly coupled with a first trench defined within the first end of the mixing manifold. The first trench may be characterized by an inner radius at a first inner sidewall and an outer radius, and the first trench may provide fluid access to the central channel through the first inner sidewall.

A syringe for multi-component materials includes a mixer housing, a mixing element, a multi-component cartridge and a mixing head, the mixing head being arranged at least partly within the mixer housing and adjacent to the multi-component cartridge. The mixing head is arranged moveable in an axial direction of the syringe between at least two positions, the at least two positions including a sealed position and a dispensing position. The axial movement of the mixing head is brought about by rotation of at least a part of the mixer housing relative to the multi-component cartridge. The mixing head is axially displaced in a direction opposite to a dispensing direction on a displacement of the mixing head from the sealed position into the dispensing position.