Patent classifications
B01F25/20
Gas Saturation of Liquids with Application to Dissolved Gas Flotation and Supplying Dissolved Gases to Downstream Processes and Water Treatment
The description relates to methods and apparatus that enable the efficient introduction of gases like air, oxygen and ozone into aqueous liquids. Gases are introduced into liquids for making that gas chemically or biologically available at a minimum energy expenditure. Impinging jets of liquid are directed into a pressurized saturation vessel having a gas-filled headspace and a saturation zone below the surface of the liquid at a velocity sufficient to create a turbulent impact and plunge zone. The resulting turbulence and mixing of gas and liquid in that zone under pressure, causes the gas to be driven into the liquid in the vessel and breaks up the gas and the liquid into a churning flow and creates a large number of bubbles. The resulting gas-enriched liquid is discharged from the vessel at an outlet to ensure a minimum of bubbles in the gas-enriched liquid.
Fluid dispersing device and heat treatment device
A fluid dispersing device includes a tubular first wall portion with an axis extending in a first direction defined as a central axis, and a second wall portion separated downward from the first wall portion. The second wall portion includes at least one circular member and a disk-like member each having a flat surface for causing a fluid passing through an inner space of the first wall portion to collide therewith. The disk-like member is separated downward from the at least one circular member. The at least one circular member has an outer diameter equal to or smaller than an inner diameter of the first wall portion. The disk-like member has an outer diameter equal to or smaller than an outer diameter of the closest circular member.
Apparatus and method for producing fine air bubble mixed liquid
A fine-bubble mixed liquid producing apparatus 1 includes a reservoir 4 and a bubble feeding means 6 for feeding bubbles to a liquid L stored in the reservoir 4, wherein the bubble feeding means 6 includes a rotary cylinder 20 having an emitting part 22 on the outer circumferential surface, the emitting part 22 for being rotationally driven by a drive means 10, a circulating means 40 for drawing out the liquid L stored in the reservoir 4 and feeding the liquid L from the emitting part 22 to the reservoir 4, and a gas-liquid mixing part 50 for mixing bubbles with the liquid L circulated by the circulating means 40. This apparatus enables a fine-bubble mixed liquid to be efficiently produced.
Continuous Gas Separation System Combining Hydrate-based Process and Reverse Osmosis Process and Disturbance Device
A disturbance device has two jet mixers, which are oppositely disposed in the horizontal direction; a mixing chamber, which is connected between the two jet mixers; and mixing pipes, which are connected below the mixing chamber. The mixing pipes comprise: a central pipe, which is a vertical straight pipe; multiple helical pipes, which are wound in multiple layers and provided outside the central pipe, the diameters of the multiple helical pipes gradually increasing from the inner to outer layers, and multiple flow deflector assemblies being provided at intervals in each helical pipe; and an outer sleeve, which is a straight pipe, the outer sleeve being sleeved outside the outermost helical pipe. A continuous gas separation system combines a hydrate-based process and a reverse osmosis process, using the disturbance device, enables continuous gas separation.
Continuous Gas Separation System Combining Hydrate-based Process and Reverse Osmosis Process and Disturbance Device
A disturbance device has two jet mixers, which are oppositely disposed in the horizontal direction; a mixing chamber, which is connected between the two jet mixers; and mixing pipes, which are connected below the mixing chamber. The mixing pipes comprise: a central pipe, which is a vertical straight pipe; multiple helical pipes, which are wound in multiple layers and provided outside the central pipe, the diameters of the multiple helical pipes gradually increasing from the inner to outer layers, and multiple flow deflector assemblies being provided at intervals in each helical pipe; and an outer sleeve, which is a straight pipe, the outer sleeve being sleeved outside the outermost helical pipe. A continuous gas separation system combines a hydrate-based process and a reverse osmosis process, using the disturbance device, enables continuous gas separation.
Sewage system agitator
A sewage system component spray assembly is attached at a predetermined height above pumps in the interior of the component and has at least one nozzle for spraying liquid downwardly and generally tangential to a center of the sewage system component. Operation of the nozzle causes the liquid to disperse floating material on the sewage surface and creating a rotational flow around the center to direct such material to the pumps.
Method for in situ mixing of liquid compositions with offset liquid influx
Methods for in situ mixing of two or more different liquid compositions in a container by employing one or more liquid influxes that are offset by 1-50 from a longitudinal axis of such container.
Facile Assembly of Soft Nanoarchitectures and Co-Loading of Hydrophilic and Hydrophobic Molecules via Flash Nanoprecipitation
Described herein are flash nanoprecipitation methods capable of encapsulating hydrophobic molecules, hydrophilic molecules, bioactive protein therapeutics, or other target molecules in amphiphilic copolymer nanocarriers.
CLEANING DEVICE USING MICRO/NANO-BUBBLES
Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load.
This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30 C. to 90 C., the mean particle size of the micro/nano-bubbles when measured by an ice embedding method using a cryo-transmission electron microscope being 100 nm or smaller, preferably 30 nm or smaller, and also preferably the density of such bubbles being 10.sup.8 or more bubbles per 1 mL.
SEGMENTED DISTRIBUTION ASSEMBLY FOR DISTRIBUTING FLUID TO AN APPLICATOR NOZZLE
An inner plate assembly for arrangement between top and bottom plates of an applicator for applying fluid-based chemicals to traveling sheets of textile substrates includes a plurality of interlocking plate segments. Each interlocking plate segment includes an outer frame segment and one or more baffle member segments supported by the outer frame segment. Each interlocking plate segment further includes a first interlocking structure disposed at a first end thereof and a second interlocking structure at a second, opposite end thereof to facilitate end-to-end interlocking arrangement of the plurality of interlocking plate segments.