The invention is about a stabilized electromagnetic base liquid, as well as its preparation method and its application in the high-salt wastewater treatment. The raw material components of the electromagnetic base fluid include: 20-30 parts of alkali metal hydroxides(e.g., as sodium hydroxide); 20-30 parts of non-alkali metal (e.g., as silicon or phosphorus); 2-6 parts of ammonia; 31-140 parts of water; after treatment with a direct electrical current the parameters of the stabilized electromagnetic base liquid are: pH value: 12 to 14; oxidation reduction potential value: −1.0 to −1.8 v; with no corrosivity, confirming the presence of stabilized hydrated electrons (e.sub.aq−−). With the stabilized electromagnetic base liquid, the storage problem of the electromagnetic base liquid is solved, and the large-scale application in the industrial field can be realized, thereby achieving a large-scale high-salt wastewater treatment process with low cost, high recovery rate.

The invention is about a stabilized electromagnetic base liquid, as well as its preparation method and its application in the high-salt wastewater treatment. The raw material components of the electromagnetic base fluid include: 20-30 parts of alkali metal hydroxides(e.g., as sodium hydroxide); 20-30 parts of non-alkali metal (e.g., as silicon or phosphorus); 2-6 parts of ammonia; 31-140 parts of water; after treatment with a direct electrical current the parameters of the stabilized electromagnetic base liquid are: pH value: 12 to 14; oxidation reduction potential value: −1.0 to −1.8 v; with no corrosivity, confirming the presence of stabilized hydrated electrons (e.sub.aq−−). With the stabilized electromagnetic base liquid, the storage problem of the electromagnetic base liquid is solved, and the large-scale application in the industrial field can be realized, thereby achieving a large-scale high-salt wastewater treatment process with low cost, high recovery rate.

In order to provide a dispersion method and a dispersion apparatus capable of mixing a material to be processed and a dispersion medium having no affinity with each other using a single apparatus without using a dispersant, there are provided a quantitative supply mechanism quantitatively supplying a material to be processed, a suction stirring mechanism primarily including a suction stirring pump in which the material to be processed and a dispersion medium are subjected to negative pressure suction by a negative pressure suction force generated by rotation of a rotating blade and the suctioned material to be processed and the dispersion medium are stirred and mixed by the rotating blade and are allowed to pass through a throttle passage to cause cavitation, and a plasma generating mechanism generating a plasma in bubbles formed due to cavitation in a mixed liquid of the material to be processed and the dispersion medium.

An apparatus that forms liquid silicon includes a. a device by which a gas can be brought to a high-temperature state in which it is at least partially present as plasma, b. a reaction space and a feed conduit for the high-temperature gas opening into the reaction space, c. a nozzle having a nozzle channel that opens directly into the reaction space and through which a gaseous or particulate silicon-containing starting material can be fed into the reaction space, and d. a device adapted to introduce an inert gas into the reaction space such that it protects the exit opening of the nozzle channel against thermal stress resulting from the high-temperature gas.

An apparatus that forms liquid silicon includes a. a device by which a gas can be brought to a high-temperature state in which it is at least partially present as plasma, b. a reaction space and a feed conduit for the high-temperature gas opening into the reaction space, c. a nozzle having a nozzle channel that opens directly into the reaction space and through which a gaseous or particulate silicon-containing starting material can be fed into the reaction space, and d. a device adapted to introduce an inert gas into the reaction space such that it protects the exit opening of the nozzle channel against thermal stress resulting from the high-temperature gas.

The present invention discloses a coal-to-acetylene plasma reactor having coking inhibition and online decoking functions, comprising a vertically arranged cathode rod, an anode and a circulating cooling water jacket arranged outside the anode, the anode includes from top to bottom an anode of the electric arc operation section for cooperating with the cathode rod to generate an electric arc, and an anode of the reaction section located below the electric arc, the anode is grounded, the inner diameter of the anode of the reaction section is 1.2 to 10 times the inner diameter of the anode of the electric arc operation section, and the junction of the anode of the reaction section and the anode of the electric arc operation section is circumferentially provided with a decoking nozzle that can spray a decoking medium toward the anode of the reaction section. The present invention uses the method of changing the inner diameter of the reactor and setting nozzles for diaphragm protection, fundamentally suppressing or even eliminating the coking phenomenon during the operation of the reactor, no need to set the decoking cycle, and realizing the continuous cracking operation of the reactor.

A polymerization reactor for production of a super absorbent polymer according to the present disclosure includes: a composition supply part for supplying a monomer composition solution; a central pipe connected to the composition supply part; a composition distribution part including a water storage tank located at a discharge port of the central pipe; a distribution pipe connected to the water storage tank; and an ultrasonic device installed inside the water storage tank, a conveyor belt located under the composition distribution part and on which the composition solution is dropped, and an energy supply part for supplying polymerization energy to the composition solution on the conveyor belt, wherein the ultrasonic device supplies bubbles to the composition solution flowing into the water storage tank.

An apparatus for generating cold air plasma includes a housing including a plurality of spaced openings; a plurality of needles, each needle being positioned in a respective opening; and a driver circuit that generates an electrical signal that is applied to the needles to generate a pulsed electromagnetic field (PEMF), wherein the electrical signal is alternating at a carrier frequency and is modulated at a pulse frequency to thereby generate cold air plasma. A method for providing therapy to a subject includes generating cold air plasma using an apparatus including: a) a housing including a plurality of spaced openings; b) a plurality of needles, each needle being positioned in a respective opening; and c) a driver circuit that generates an electrical signal that is applied to the needles to generate a pulsed electromagnetic field, wherein the electrical signal is alternating at a carrier frequency and is modulated at a pulse frequency to thereby generate cold air plasma.

The invention relates to a device consisting of a reactor facility for the electrolytic treatment, with relation to flow dynamics, of fluid or gaseous media or mixtures of the two. In the context of this invention, electrolytic treatment with relation to flow dynamics means the combination of the production of at least one rotating fluid eddy and the eversion of the eddy by means of electrolysis taking place in the reactor facility. The guided fluid eddy is efficiently treated, cleaned and disinfected by this combination in the reactor facility according to the invention. The invention further relates to a method for the electrolytic treatment, with relation to flow dynamics, of fluid media in the reactor facility according to the invention.

In the present invention, a high-voltage side electrode component further includes a conductive film disposed on an upper surface of a dielectric electrode independently of a metal electrode. The conductive film is disposed between at least one gas ejection port and the metal electrode in plan view, and the conductive film is set to ground potential.