A substrate processing system for treating a substrate includes a manifold and a plurality of injector assemblies located in a processing chamber. Each of the plurality of injector assemblies is in fluid communication with the manifold and includes a valve including an inlet and an outlet. A dose controller is configured to communicate with the valve in each of the plurality of injector assemblies and adjust a pulse width supplied to the valve in each of the plurality of injector assemblies based on at least one of manufacturing differences between the valves in each of the plurality of injector assemblies and non-uniformities of the valves in each of the plurality of injector assemblies to cause a desired dose to be supplied from the valve in each of the plurality of injector assemblies.

Various implementations include a sweeping jet device with multidirectional output. The device includes an interaction chamber defined by a chamber wall. The chamber wall defines first and second inlet ports and first and second outlet ports. First and second fluid supply inlets are configured to introduce first and second inlet fluid streams through the first and second inlet ports, respectively, and into the interaction chamber. First and second outlet nozzles are configured to discharge first and second outlet fluid streams from the interaction chamber through the first and second outlet ports and the first and second outlet nozzles, respectively. The first and second inlet fluid streams collide within the interaction chamber causing the first and second outlet fluid streams to sweep as the first and second outlet fluid streams are discharged from the first and second outlet nozzles, respectively.

Method for producing a spray wall drilled with a network of holes for the pressurised fluid substance to pass through so as to be sprayed in fine droplets. The method includes the steps of (a) moulding a nozzle having a front wall integrally formed with an assembly wall, the assembly wall surrounding the front wall, the front wall having a curved initial configuration upon removal from the mould; (b) drilling the curved front wall with a network of holes having a defined initial orientation; and (c) deforming the drilled curved front wall into a final spray configuration defining a spray wall, the defined initial orientation of the holes being subsequently modified.

The present disclosure relates to a spray apparatus for improving the performance of a rectangular-shaped scrubber which may efficiently remove harmful substances in a gas by mounting an injector for spraying a liquid in a rectangular pyramid shape on a scrubber having a rectangular shape. The spray apparatus includes: a scrubber having a rectangular shape; and an injector mounted on the scrubber and including a spray nozzle configured to spray a liquid in a rectangular pyramid shape.

A microfluidic device has a chamber; a fluidic access channel in fluidic connection with the chamber; a plurality of nozzle apertures in fluidic connection with the chamber; and an actuator, operatively coupled to the fluid containment chamber and configured to cause ejection of drops of fluid through the nozzle apertures in an operating condition of the microfluidic device. The chamber has an elongated shape, with a length and a maximum width, wherein an aspect ratio between the length and the maximum width of the chamber is at least 3:1. The nozzle apertures are configured to generate, in use, a plurality of drops having a total drop volume, wherein a ratio total drop volume to a chamber volume is at least 15%.

A microfluidic device has a chamber; a fluidic access channel in fluidic connection with the chamber; a plurality of nozzle apertures in fluidic connection with the chamber; and an actuator, operatively coupled to the fluid containment chamber and configured to cause ejection of drops of fluid through the nozzle apertures in an operating condition of the microfluidic device. The chamber has an elongated shape, with a length and a maximum width, wherein an aspect ratio between the length and the maximum width of the chamber is at least 3:1. The nozzle apertures are configured to generate, in use, a plurality of drops having a total drop volume, wherein a ratio total drop volume to a chamber volume is at least 15%.

Provided is a projection screen. The projection screen includes a first transparent cover plate, a transparent touch panel, and a first nanoparticle layer, wherein the first nanoparticle layer and the first transparent cover plate are sequentially laminated on one side of the transparent touch panel, and the first nanoparticle layer comprises a plurality of dispersed nanoparticles of different particle sizes. A method for manufacturing a projection screen, a projection display system, and a projection display method are also provided.

Provided is a projection screen. The projection screen includes a first transparent cover plate, a transparent touch panel, and a first nanoparticle layer, wherein the first nanoparticle layer and the first transparent cover plate are sequentially laminated on one side of the transparent touch panel, and the first nanoparticle layer comprises a plurality of dispersed nanoparticles of different particle sizes. A method for manufacturing a projection screen, a projection display system, and a projection display method are also provided.

An applicator head for a vacuum coating system includes a manifold shell having opposing shell plates, each including a conduit attachment coupled to a shell aperture. An applicator manifold is affixed to each shell plate. Each applicator manifold includes two coupled manifold plates, with one including a manifold aperture, and each is affixed to the respective shell plate so that each manifold aperture aligns with the respective shell aperture. An applicator channel is formed between the manifold plates of each applicator manifold, and the applicator channel is fluidically coupled to the manifold aperture of each respective applicator manifold. Each applicator channel forms an applicator port at a leading edge of each respective applicator manifold, and each leading edge is configured to be complementary in shape to an edge of a workpiece to be coated. First and second face plates are disposed over the leading edges of the applicator manifolds.

An applicator head for a vacuum coating system includes a manifold shell having opposing shell plates, each including a conduit attachment coupled to a shell aperture. An applicator manifold is affixed to each shell plate. Each applicator manifold includes two coupled manifold plates, with one including a manifold aperture, and each is affixed to the respective shell plate so that each manifold aperture aligns with the respective shell aperture. An applicator channel is formed between the manifold plates of each applicator manifold, and the applicator channel is fluidically coupled to the manifold aperture of each respective applicator manifold. Each applicator channel forms an applicator port at a leading edge of each respective applicator manifold, and each leading edge is configured to be complementary in shape to an edge of a workpiece to be coated. First and second face plates are disposed over the leading edges of the applicator manifolds.