A method of controlling application of at least one material onto a substrate includes configuring a material applicator having an array plate with an applicator array. The applicator array has a plurality of micro-applicators with a first subset of micro-applicators and a second subset of micro-applicators. Each of the plurality of micro-applicators has a plurality of apertures through which fluid is ejected. The first subset of micro-applicators and the second subset of micro-applicators are individually addressable, and a liquid flows through the first subset of micro-applicators and a shaping gas, e.g., air, flows through the second subset of micro-applicators. The flow of shaping gas shapes the flow of the liquid from the first subset of micro-applicators to the substrate.

A system for applying a first coating composition and a second coating composition. The system includes a first high transfer efficiency applicator defining a first nozzle orifice and a second high transfer efficiency applicator defining a second nozzle orifice. The system further includes a substrate defining a target area. The first high transfer efficiency applicator is configured to expel the first coating composition through the first nozzle orifice to the target area of the substrate to form a first coating layer. The second high transfer efficiency applicator is configured to expel the second coating composition through the second nozzle orifice to the first coating layer to form a second coating layer.

A free radical sterilization system having a chamber defining a region, and a generator for generating free radical reach effluent from a free radical electric generator and/or a vaporizer. A closed loop circulating system without a free-radical destroyer is provided for supplying the mixture of free radicals from the electric generator mixed with the hydrogen peroxide solution in the form of the effluent to the chamber. The free-radical sterilization system is used in sterilizing items in the chamber and, with an open-bottomed wound chamber, in treating wounds on a body.

A free radical sterilization system having a chamber defining a region, and a generator for generating free radical reach effluent from a free radical electric generator and/or a vaporizer. A closed loop circulating system without a free-radical destroyer is provided for supplying the mixture of free radicals from the electric generator mixed with the hydrogen peroxide solution in the form of the effluent to the chamber. The free-radical sterilization system is used in sterilizing items in the chamber and, with an open-bottomed wound chamber, in treating wounds on a body.

A system and method for customizing the solution used in the sunless spray tanning process are provided. In at least one form, the solution is volumetrically mixed at the point of use, allowing for greater customization and a more consistent tanning result. Providing improved customization at the point of use is accomplished, in at least one form, by using a two-part tanning solution: one part being a high concentration DHA solution and another part being an activator solution. The two parts are mixed with one another at the point of use based on user preferences at the time of the tanning session to provide a specific final DHA concentration for a customized tanning result.

Various embodiments include a cold gas spraying system for generating an adjustable particle jet. The system may include: a nozzle from which the particle jet emerges; a supply device for supplying a particle stream to the nozzle; and one or more actuators operable to reduce the particle stream and/or the particle jet during operation. At least one of the actuators comprises a valve arranged between the supply device and the nozzle.

Various embodiments include a cold gas spraying system for generating an adjustable particle jet. The system may include: a nozzle from which the particle jet emerges; a supply device for supplying a particle stream to the nozzle; and one or more actuators operable to reduce the particle stream and/or the particle jet during operation. At least one of the actuators comprises a valve arranged between the supply device and the nozzle.

The present invention relates to a perfume dispensing device, the device being electronically controlled and the actuation of perfume spraying being performed via an actuator (12) located on or under a device housing (1). All components of the device are located on or in the housing (1), wherein the housing also accommodates a control circuit (10) for controlling the device, which may optionally include a system (13) for wireless communication with a smart device (14) having a dedicated application uploaded, through which the user sets the desired parameters. The device may include several storage containers (2), which allows the user to select the desired perfume or to personalise the perfume via a dedicated application. The actuator is actuated by pressing or touching the actuator (12) or via an external device.

The present invention relates to a perfume dispensing device, the device being electronically controlled and the actuation of perfume spraying being performed via an actuator (12) located on or under a device housing (1). All components of the device are located on or in the housing (1), wherein the housing also accommodates a control circuit (10) for controlling the device, which may optionally include a system (13) for wireless communication with a smart device (14) having a dedicated application uploaded, through which the user sets the desired parameters. The device may include several storage containers (2), which allows the user to select the desired perfume or to personalise the perfume via a dedicated application. The actuator is actuated by pressing or touching the actuator (12) or via an external device.

A device for metering one or more powder(s) (A, B) to produce a flow (23) of powder(s) and of a carrier gas at a given volume flow rate, comprises: ⋅at least a first source (25) suitable for supplying a first flow (27) comprising a first powder (A) and a first carrier gas (G1) substantially at the given volume flow rate, ⋅a source (33) of a carrier gas suitable for supplying an adjustment carrier gas flow (35) substantially at the given volume flow rate, ⋅an outlet junction (49) for emitting said flow of powder(s) and of carrier gas, ⋅a first proportional valve (59), ⋅an adjustment proportional valve (75), and ⋅a control system (21) suitable for controlling at least the first proportional valve and the adjustment proportional valve so that the flow of powder(s) and of carrier gas has a volume flow rate substantially equal to the given volume flow rate.