B05C3/02

Multi-layered ventilation apparatus and methods of manufacturing thereof
11479973 · 2022-10-25 ·

Disclosed is an apparatus for venting buildings, specifically attic spaces, such vents being predominantly shape-conform to the components from which a wall or a roof is built (typically tiles, in the context of roofs), the vent typically being fabricated from a metallic, plastic, or ceramic core as well as one or more layers from other materials or compounds which modify the overall characteristics of the vent, such as the surface characteristics. Furthermore disclosed are methods of manufacturing such ventilation apparatuses.

ANALYTE SENSOR

Devices and methods are provided for continuous measurement of an analyte concentration. The device can include a sensor having a plurality of sensor elements, each having at least one characteristic that is different from other sensor(s) of the device. In some embodiments, the plurality of sensor elements are each tuned to measure a different range of analyte concentration, thereby providing the device with the capability of achieving a substantially consistent level of measurement accuracy across a physiologically relevant range. In other embodiments, the device includes a plurality of sensor elements each tuned to measure during different time periods after insertion or implantation, thereby providing the sensor with the capability to continuously and accurately measure analyte concentrations across a wide range of time periods. For example, a sensor system 180 is provided having a first working electrode 150 comprising a first sensor element 102 and a second working electrode 160 comprising a second sensor element 104, and a reference electrode 108 for providing a reference value for measuring the working electrode potential of the sensor elements 102, 104.

ANALYTE SENSOR

Devices and methods are provided for continuous measurement of an analyte concentration. The device can include a sensor having a plurality of sensor elements, each having at least one characteristic that is different from other sensor(s) of the device. In some embodiments, the plurality of sensor elements are each tuned to measure a different range of analyte concentration, thereby providing the device with the capability of achieving a substantially consistent level of measurement accuracy across a physiologically relevant range. In other embodiments, the device includes a plurality of sensor elements each tuned to measure during different time periods after insertion or implantation, thereby providing the sensor with the capability to continuously and accurately measure analyte concentrations across a wide range of time periods. For example, a sensor system 180 is provided having a first working electrode 150 comprising a first sensor element 102 and a second working electrode 160 comprising a second sensor element 104, and a reference electrode 108 for providing a reference value for measuring the working electrode potential of the sensor elements 102, 104.

Rubber pellet treatment

Rubber pellets are coated with an anti-tack material. The anti-tack material may be comprised of a metallic stearate, such as magnesium stearate. The coated rubber pellets are loaded on to a rotational conveyance mechanism that rotates at a speed and radial amount to provide an interaction time between the rubber pellets and the anti-tack material. The coated rubber pellets may then be dried in a centrifuge dryer having a plurality of angled fins extending from a rotational shaft.

Rubber pellet treatment

Rubber pellets are coated with an anti-tack material. The anti-tack material may be comprised of a metallic stearate, such as magnesium stearate. The coated rubber pellets are loaded on to a rotational conveyance mechanism that rotates at a speed and radial amount to provide an interaction time between the rubber pellets and the anti-tack material. The coated rubber pellets may then be dried in a centrifuge dryer having a plurality of angled fins extending from a rotational shaft.

APPARATUS AND METHOD FOR MANUFACTURING HIGH-DENSITY IN-LINE CARBON NANOTUBE THIN FILM

The present disclosure discloses a device and a method for preparing a high-density aligned carbon nanotube film. The device includes a container main body, a buffer partition plate and a solvent lead-out part. The buffer partition plate is located at a lower part of the container main body. The solvent lead-out part communicates with an interior of the container main body through a through hole in a side wall of the container main body and extends to an outside of the container main body. The method includes injecting a carbon nanotube solution into a container; immersing a substrate in the carbon nanotube solution; injecting a sealing liquid that is immiscible with the carbon nanotube solution along the substrate or the side wall of the container main body; and leading the solvent out or pulling the substrate such that the liquid surface of the substrate undergoes relative motion.

APPARATUS AND METHOD FOR MANUFACTURING HIGH-DENSITY IN-LINE CARBON NANOTUBE THIN FILM

The present disclosure discloses a device and a method for preparing a high-density aligned carbon nanotube film. The device includes a container main body, a buffer partition plate and a solvent lead-out part. The buffer partition plate is located at a lower part of the container main body. The solvent lead-out part communicates with an interior of the container main body through a through hole in a side wall of the container main body and extends to an outside of the container main body. The method includes injecting a carbon nanotube solution into a container; immersing a substrate in the carbon nanotube solution; injecting a sealing liquid that is immiscible with the carbon nanotube solution along the substrate or the side wall of the container main body; and leading the solvent out or pulling the substrate such that the liquid surface of the substrate undergoes relative motion.

Substrate plating apparatus and substrate plating method
09844794 · 2017-12-19 · ·

A substrate plating apparatus is disclosed. The apparatus includes a substrate holder; a plating bath configured to plate a surface of the substrate in a plating solution; a cleaning bath configured to clean the substrate holder and the substrate with a cleaning liquid; an inner shell disposed in the cleaning bath and configured to house the substrate holder holding the substrate therein; and a cleaning liquid supply conduit configured to supply a cleaning liquid into the inner shell to clean the substrate, together with the substrate holder, with the cleaning liquid. The inner shell has an inner surface having an uneven configuration that follows an uneven exterior configuration of the substrate holder holding the substrate.

Substrate plating apparatus and substrate plating method
09844794 · 2017-12-19 · ·

A substrate plating apparatus is disclosed. The apparatus includes a substrate holder; a plating bath configured to plate a surface of the substrate in a plating solution; a cleaning bath configured to clean the substrate holder and the substrate with a cleaning liquid; an inner shell disposed in the cleaning bath and configured to house the substrate holder holding the substrate therein; and a cleaning liquid supply conduit configured to supply a cleaning liquid into the inner shell to clean the substrate, together with the substrate holder, with the cleaning liquid. The inner shell has an inner surface having an uneven configuration that follows an uneven exterior configuration of the substrate holder holding the substrate.

Apparatus for supplying Zn—Al alloy to molten zinc pot

A method of supplying a Zn—Al alloy to a molten zinc pot which accommodates a molten zinc bath in a hot dip galvanizing line, includes: supplying the Zn—Al alloy from a supply portion provided at a lower portion of an insertion guide having a pipe shape, in which the supply portion is immersed between an inner wall of the molten zinc pot on a downstream side in a travelling direction of a steel sheet and a front support roll installed in the molten zinc bath at a depth within ±400 mm from a lower end of the front support roll, and an inside of the insertion guide is pressurized by inert gas to prevent the molten zinc bath from advancing to the inside of the insertion guide.