Patent classifications
B05C5/02
SYSTEM FOR DEPOSITING FOODSTUFF MATERIAL IN THE FLUID STATE ON A FOODSTUFF PRODUCT
A system for depositing foodstuff material in the fluid state on a foodstuff product, the system including: a product conveying line; at least one foodstuff material dispensing unit including includes a plurality of rows of nozzles; and a dispensing control unit, in which the dispensing unit includes a valve device associated to each individual nozzle to control foodstuff material flow through the nozzle, the valve device including: an open/close member, a solenoid; and a magnetic element operatively connected to the open/close member and mobile between a first position in which it closes the respective nozzle, preventing dispensing of the foodstuff material therethrough, and a second position in which a passage is opened through the nozzle for dispensing the foodstuff material.
PROCESS FOR PRODUCING A FOODSTUFF PRODUCT HAVING A DECORATION
A process for producing foodstuff products provided with a respective decoration having a given configuration, the process including the steps of: making a plurality of foodstuff products each having a surface cavity and a profile in plan view that is predetermined to reproduce the given configuration of the respective decoration; advancing the foodstuff products on a conveying line in a direction of advance; via a camera, detecting, for each foodstuff product, the respective cavity; determining one or more data indicating a volume of the cavity of the foodstuff product; providing a fluid foodstuff material dispensing unit, including a plurality of rows of nozzles transverse to the direction of advance; dispensing an amount of fluid foodstuff material in the cavity of each foodstuff product substantially equal to the volume of the cavity.
Support unit, substrate treating apparatus including the same, and substrate treating method using the substrate treating apparatus
An apparatus for treating a substrate includes a housing having a treatment space inside, a gas supply unit that supplies a hydrophobic gas into the treatment space to hydrophobicize the substrate, and a support unit that supports the substrate in the treatment space. The support unit includes a support plate, a heating member that heats the substrate placed on the support plate, and a height adjustment member that changes a position of the substrate between a first position spaced apart upward from an upper surface of the support plate by a first distance and a second position spaced apart upward from the upper surface of the support plate by a second distance, and the second position is a higher position than the first position.
Support unit, substrate treating apparatus including the same, and substrate treating method using the substrate treating apparatus
An apparatus for treating a substrate includes a housing having a treatment space inside, a gas supply unit that supplies a hydrophobic gas into the treatment space to hydrophobicize the substrate, and a support unit that supports the substrate in the treatment space. The support unit includes a support plate, a heating member that heats the substrate placed on the support plate, and a height adjustment member that changes a position of the substrate between a first position spaced apart upward from an upper surface of the support plate by a first distance and a second position spaced apart upward from the upper surface of the support plate by a second distance, and the second position is a higher position than the first position.
SUBSTRATE PROCESSING APPARATUS
A holding mechanism holds a substrate horizontally. A rotation mechanism rotates the holding mechanism holding the substrate. A nozzle supplies a processing liquid to the substrate. A nozzle arm holds the nozzle. An arm actuation mechanism moves the nozzle arm between a processing position overlapping the substrate in plan view and a retracted position displaced from the substrate in plan view. A cup portion is disposed around the holding mechanism, and receives the processing liquid from the substrate. A cup actuation mechanism moves the cup portion up and down between an upper position and a lower position. A first container is fixed to the cup portion to be movable up and down integrally with the cup portion, and can accommodate the nozzle at the retracted position.
SUBSTRATE PROCESSING APPARATUS
A holding mechanism holds a substrate horizontally. A rotation mechanism rotates the holding mechanism holding the substrate. A nozzle supplies a processing liquid to the substrate. A nozzle arm holds the nozzle. An arm actuation mechanism moves the nozzle arm between a processing position overlapping the substrate in plan view and a retracted position displaced from the substrate in plan view. A cup portion is disposed around the holding mechanism, and receives the processing liquid from the substrate. A cup actuation mechanism moves the cup portion up and down between an upper position and a lower position. A first container is fixed to the cup portion to be movable up and down integrally with the cup portion, and can accommodate the nozzle at the retracted position.
METHOD FOR MANUFACTURING A MULTILAYER PVC SEMIFINISHED PRODUCT AND A CORRESPONDING APPARATUS
A method for manufacturing of a multilayer PVC semi-finished product, in particular a multilayer PVC synthetic leather or a multilayer PVC foam sheet, the method comprising the steps of:
a. Coating a coated or uncoated carrier web with a PVC plastisol, whereby a carrier web coated with an ungelled plastisol layer is obtained; thereafter
b. Gelling the ungelled plastisol layer, whereby a carrier web coated with a gelled plastisol layer is obtained; and thereafter
c. Cooling the carrier web coated with the gelled plastisol layer; characterized in that the coating comprises coating the carrier web with at least two PVC plastisols one above the other, simultaneously or in immediate succession. A corresponding apparatus is further described.
Slotted disk fixture
A coating assembly for coating a plurality of substrates. The coating assembly includes a chamber. At least one target is disposed in the chamber and includes a coating material. At least one power supply is connected to the target. At least one support fixture is disposed in the chamber. The at least one support fixture includes a base having a plurality of recesses formed in an upper surface of the base. A first mounting component has a plurality of slots. The first mounting component is positioned on the upper surface of the base wherein at least some of the plurality of recesses are in registry with corresponding ones of the plurality of slots to define a plurality of cavities, each of the plurality of cavities configured to hold at least one of the plurality of substrates to be coated.
COATING DEVICE, COATING FILM, AND COATING METHOD
A coating device coats a coating region of a to-be-coated object having a convex curved surface. A coating device includes a head, an arm, and a controller. The head includes a nozzle surface. The arm holds the head. The controller controls movement of the head via the arm. A controller moves a head in a first direction along an end portion of a coating region in a posture in which a gap between a nozzle surface located on an end portion side of the coating region and a to-be-coated object is smaller than a gap between the nozzle surface located on a center side of the coating region and the to-be-coated object.
COATING DEVICE AND WIPING METHOD
A coating device includes a head, a wiping mechanism, an arm, and a controller. The head includes a nozzle surface for discharging a coating material. The wiping mechanism wipes the nozzle surface. The arm holds the head. The controller controls movement of the head via the arm. The controller relatively moves the head with respect to the wiping mechanism to wipe the nozzle surface.