A pulsation dampener for a dispensing system comprising a housing, a diaphragm comprising at least one fluoropolymer layer, the diaphragm dividing the housing into a first compartment and a second compartment, an inlet port and an outlet port each in fluid communication with the first compartment thereby providing a flow path for a liquid to enter the first compartment via the first inlet port and exit the first compartment via the outlet port, and at least one gas disposed within the second compartment, the at least one gas having a kinetic diameter of 0.36 nm or greater, wherein the fluoropolymer of the at least one fluoropolymer layer and the at least one gas are selected such that a gas transmittance rate of the at least one gas through the diaphragm is from 0 mbar*L/second to 1*10.sup.5 mbar*L/second.

A pulsation dampener for a dispensing system comprising a housing, a diaphragm comprising at least one fluoropolymer layer, the diaphragm dividing the housing into a first compartment and a second compartment, an inlet port and an outlet port each in fluid communication with the first compartment thereby providing a flow path for a liquid to enter the first compartment via the first inlet port and exit the first compartment via the outlet port, and at least one gas disposed within the second compartment, the at least one gas having a kinetic diameter of 0.36 nm or greater, wherein the fluoropolymer of the at least one fluoropolymer layer and the at least one gas are selected such that a gas transmittance rate of the at least one gas through the diaphragm is from 0 mbar*L/second to 1*10.sup.5 mbar*L/second.

An apparatus for processing a substrate includes a processing vessel disposed in a process chamber and including a processing space in which a substrate is accommodated; a liquid supply line configured to process the substrate by supplying processing liquid to the substrate in the processing space; an exhaust line connected to the processing vessel and configured to exhaust gas in the processing space; a spraying portion disposed on the exhaust line and configured to spray cleaning liquid to remove contaminants accumulated in the exhaust line; and a washing liquid discharge line branched from the exhaust line and including a suction portion therein to suction cleaning liquid waste including contaminants removed from the exhaust line by the cleaning liquid and to discharge the cleaning liquid waste to the outside.

An apparatus for processing a substrate includes a processing vessel disposed in a process chamber and including a processing space in which a substrate is accommodated; a liquid supply line configured to process the substrate by supplying processing liquid to the substrate in the processing space; an exhaust line connected to the processing vessel and configured to exhaust gas in the processing space; a spraying portion disposed on the exhaust line and configured to spray cleaning liquid to remove contaminants accumulated in the exhaust line; and a washing liquid discharge line branched from the exhaust line and including a suction portion therein to suction cleaning liquid waste including contaminants removed from the exhaust line by the cleaning liquid and to discharge the cleaning liquid waste to the outside.

A coating apparatus and method are disclosed for coating tablets with a film, in which the tables transit through a drilled first container where they are coated, then exit the first container and are removed from a rotating element provided on the periphery of a plurality of removal members that are spaced angularly apart from one another, in which each removal member removes a quantity of tablets, raises the removed tables as far as a certain height and then discharges the tablets into a chute that conveys the tablets into a second rotating drilled container, with delicate transfer of the coated tablets from one container to the next.

An applicator head for a vacuum coating system includes a manifold shell having opposing shell plates, each including a conduit attachment coupled to a shell aperture. An applicator manifold is affixed to each shell plate. Each applicator manifold includes two coupled manifold plates, with one including a manifold aperture, and each is affixed to the respective shell plate so that each manifold aperture aligns with the respective shell aperture. An applicator channel is formed between the manifold plates of each applicator manifold, and the applicator channel is fluidically coupled to the manifold aperture of each respective applicator manifold. Each applicator channel forms an applicator port at a leading edge of each respective applicator manifold, and each leading edge is configured to be complementary in shape to an edge of a workpiece to be coated. First and second face plates are disposed over the leading edges of the applicator manifolds.

A coating apparatus is provided. The coating apparatus includes a coater, configured to move and perform coating along a first direction, the coater includes a coating head and a coating head movement mechanism, the coating head movement mechanism is configured to make the coating head move along a plane intersected with the first direction and rotate in the plane intersected with the first direction.

A coating apparatus is provided. The coating apparatus includes a coater, configured to move and perform coating along a first direction, the coater includes a coating head and a coating head movement mechanism, the coating head movement mechanism is configured to make the coating head move along a plane intersected with the first direction and rotate in the plane intersected with the first direction.

There is provided that an imprint apparatus that forms a pattern on a substrate by curing an imprint material in a state in which a mold and the imprint material on the substrate are in contact with each other, the apparatus including a control unit configured to control a movement of a stage configured to hold the substrate and the supplying of a gas by a gas supplying unit, wherein the control unit removes charges from the mold by starting the supplying of the gas by the gas supplying unit before starting to move the stage below a dispenser after the mold and the cured imprint material are separated, and making a peripheral member face the mold via the gas during the movement of the stage.

Provided are apparatus and method of dispensing an adhesive liquid for a dust trap, in which the adhesive liquid is dispensed to a camera module while effectively cleaning the adhesive liquid that may be smeared on a nozzle, thereby enhancing productivity and quality of a process of forming a dust trap.