A monitoring apparatus for a substrate processing apparatus includes: an imaging unit that captures an image of a nozzle of the substrate processing apparatus and a surface of a substrate held by a substrate holder of the substrate processing apparatus; a monitoring data generation unit that generates monitoring video data based on imaging video data captured by the imaging unit during an execution of a substrate process performed by the substrate processing apparatus including a first process and a second process; and a monitoring condition changing unit that changes a generation condition of the monitoring video data during the execution of the substrate process so that at least a resolution or a number of frames of the monitoring video data during an execution of the second process is different from the monitoring video data during an execution of the first process.

A fluid supply apparatus includes a container supply holder configured to supply a container to a cap separator using a loading box, the container including a detachable nozzle cap, and configured to store a process fluid, a cap separator configured to receive the container from the loading box and separate the nozzle cap from a container body of the container using a cap clamper and a rotation actuator, the cap clamper configured to clamp and hold the nozzle cap, and the rotation actuator configured to rotate the container body, a fluid supplier configured to supply the process fluid contained in the container body through a fluid supply line, and a controller configured to control the container supply holder, the cap separator, and the fluid supplier.

A method of processing a plurality of substrates includes immersing the plurality of substrates into a bath solution contained in a bath chamber; generating gas bubbles in the bath solution; projecting light from a light source toward the bath chamber; generating light sensor data by capturing light emanating off the bath chamber after interacting with the gas bubbles with a light sensor; and converting the light sensor data into a metric for the bath solution.

Inspection devices and methods for inspecting an adhesive pattern on a substrate are disclosed. The inspection device includes at least one sensor having a heat sensor head for detecting a pattern of the adhesive bead, and a controller. Reference data representing a desired adhesive pattern is initially provided to a controller. A predetermined tolerance range for the desired adhesive pattern is also provided to the controller. An adhesive bead is discharged onto a substrate from a nozzle. A pattern of the discharged adhesive bead is then detected by the sensor when the substrate moves. Signals representing the detected pattern are received from the sensor at the controller. Finally, the signals representing the detected adhesive pattern are compared to the tolerance range of the desired adhesive pattern.

An application mechanism according to one embodiment of the present invention serves as an application mechanism that applies an application material onto a substrate using an application needle. The application mechanism according to one embodiment of the present invention includes: a holder base; a slide mechanism attached to an inside of the holder base; an application needle fixing member, to which the application needle is attached, the application needle fixing member being supported by the slide mechanism so as to be slidable in an extending direction of the application needle; and a position holding mechanism that holds a relative position of the application needle fixing member with respect to the slide mechanism.

A method of coating threads using a printhead having rows of nozzles extending along a length of the printhead. The method includes the steps of: feeding the thread along a length of the printhead; and ejecting ink from the rows of nozzles towards the thread. Thread-coating modules and thread-coating systems make use of the method described.

The present invention relates to a double slit coating die, and an electrode active material coating apparatus comprising same, the double slit coating die comprising first to fourth blocks which are positioned sequentially adjacent to each other, and having a structure in which the positions of the first and second blocks can move in a direction tilted at an angle θ with respect to the interface between the second and third blocks. The present invention has the effects of preventing slip surfaces between blocks constituting the die from spreading apart, and reducing offset in a coating process.

Systems and methods for direct heater diagnostics for a hot melt liquid dispensing system are disclosed. At least one of a current measurement or a voltage measurement is received from a respective current and/or voltage sensor positioned at an electrical circuit that supplies electric power to a heater associated with the dispensing system. The heater can be for an applicator or heated hose attached to the dispensing system, a melter of the dispensing system, or a pump of the dispensing system. A state of the electrical circuit is determined based on the at least one of the current or voltage measurement.

A dosage device for extruding a bicomponent or a monocomponent sealant, particularly for an automatic machine for sealing a perimetric edge of an insulating glazing unit constituted by at least two glass sheets and by at least one spacer frame, having a finite width, is arranged proximate to the perimeter at a finite distance from the margin of the glass sheets, includes a first dosage assembly and a separate second dosage assembly for the dosage and feeding of the sealant, which can be activated alternately, in a first feeding step and in a third feeding step, so that one of them provides flow continuity to an extrusion nozzle while the other one is in the reloading step. The first and second dosage assemblies are activatable, in a second swapping step that is intermediate with respect to the first and third feeding steps, simultaneously and jointly, one of them having a flow-rate ramp that passes from the steady-state value to zero and the other one complementarily having a flow-rate ramp that passes from zero to the steady-state value.

Systems and methods for closed loop fluid velocity control for jetting are disclosed. A method includes dispensing a first volume of viscous fluid from a nozzle of a dispensing device according to a first value of an operating parameter that affects the exit velocity of the first volume. A characteristic of the first volume is measured using a sensor. The characteristic of the first volume is then compared to a range of values to determine whether the characteristic of the first volume is outside of the range. The value of the operating parameter is adjusted to a second value in response to determining that the characteristic of the first volume is outside the range. A second volume of viscous fluid is dispensed according to the second value of the operating parameter. The exit velocity of the second volume is different than the first volume.