A reactor for coating a device is provided. The reactor comprises a hollow body and a port. The hollow body is for supporting the device. The port is in fluid communication with the hollow body for exchanging a coating fluid. In use, the device is moveable within the hollow body from a stacked orientation to an unstacked orientation. Processes for coating devices and systems thereof are also provided.

A device, method, and system for creating a design on a design surface are provided. The device includes a first compartment that includes a receiving and positioning component and a channel configured to receive and position a wax stick at the receiving and positioning component. The device includes a second compartment having a melting component that includes a heating element, a temperature measurement element, and a nozzle. The nozzle includes a nozzle opening configured to receive the wax stick, the nozzle directly aligned with the channel of the receiving and positioning component. The nozzle also includes a nozzle tip configured to transfer melted portions of the wax stick from the nozzle to a design surface on a spinning component in a third compartment of the device.

A retainer is rotationally driven about a axis of a ball bearing, and convex areas having pockets provided therein along a ball pitch circle of the retainer and concave areas between adjacent pockets is detected by a sensor. Grease is discharged according to phases of the convex areas and concave areas in the rotationally driven retainer from a dispenser having grease discharge ports arranged to face an annular space.

A method is provided for forming an impermeable barrier layer on an inner tire surface of a tire. An assembly is also provided along with a kit for forming an impermeable barrier layer on an inner tire surface of a tire accordingly.

A coating film forming method includes holding a substrate by a substrate holder; forming an air flow on a front surface of the substrate; supplying a coating liquid configured to form a coating film on the front surface; forming, after moving a covering member from a first position to a second position relatively to the substrate, the air flow in a gap formed by the covering member placed at the second position and the front surface of the substrate being rotated at a first rotation number such that a flow velocity of the air flow becomes larger than that of the air flow obtained when the covering member is placed at the first position; and rotating the substrate at a second rotation number higher than the first rotation number to adjust a film thickness distribution of the coating film by scattering the coating liquid from a peripheral portion thereof.

A method for coating a part that has an asymmetrical edge by attaching the part to a part holder, placing a film between the part and a mandrel, rolling the part over the mandrel such that the asymmetrical edge of the part contact the film, and, moving one or both of the mandrel and the part holder in an angular relationship to one another as the angle of the part's asymmetrical edge changes. A film dispenser and a film retriever are provided and preferably they move cooperatively in at least two dimensions with respect to the part holder. The film has a first edge and a second edge, and the film can be a decorative coating, a protective coating or combinations of these. The film dispenser holds the first edge of the film, the film is positioned between the mandrel and the part holder and the film retriever holds the film second edge.

A method for coating at least one portion of the inner surface of a container with a curable liquid material, a device for implementing said method; and a container obtained by said method. The container is positioned on a holder and secured thereto; a tool for applying the coating is inserted into the container and the coating liquid is applied using the tool on the inner surface of the container. The container is tilted at a first angle determined in relation to the vertical and rotated relative to the tool at a first predetermined speed V, while heating said container to a predetermined temperature. The liquid coating material is uniformly applied to the inner surface of the container to obtain a uniform, substantially identical thickness.

Methods and systems for deposition of blended polymer films are disclosed. According to an aspect a method of producing a film on a substrate includes combining a guest material, a host matrix, and a solvent having one or more hydroxyl (O—H) bonds to form a target emulsion. The method also includes exposing the target emulsion to an infrared source that is tuned to an absorption peak in the host matrix that is reduced in or absent from the guest material thereby desorbing the host matrix from the target emulsion and lifting the guest material from the surface of the target emulsion. The target emulsion and the substrate are oriented with respect to each other such that the lifted guest material is deposited as a film upon the substrate.

A processing liquid is supplied to an upper surface of a horizontally-held substrate to form a liquid film of the processing liquid that covers an entirety of the substrate upper surface. The substrate is heated to evaporate the processing liquid in contact with the upper surface of the substrate to form a gas phase layer between the upper surface of the substrate and the liquid film of the processing liquid. After the gas phase layer has been formed, a gas is blown onto the liquid film above the substrate to open a hole in the liquid film. The gas is blown onto a region inside the hole in the liquid film to move the liquid film on the gas phase layer. A direction of a gas stream at a substrate outer peripheral portion is changed to remove the liquid film at the substrate outer peripheral portion.

A development method includes: a development step of supplying a developing solution to a surface of a substrate for manufacturing a semiconductor device after undergoing formation of a resist film and exposure, to perform development; a first rotation step of, after the development step, increasing revolution speed of the substrate to rotate the substrate in a first rotational direction around a central axis so as to spin off and remove part of the developing solution from the substrate; and a second rotation step of, after the first rotation step, rotating the substrate in a second rotational direction reverse to the first rotational direction so as to spin off and remove the developing solution remaining on the substrate from the substrate.