An apparatus includes an intake assembly, the intake assembly including a connector, the connector configured for coupling to a pressurized liquid source. The apparatus also includes a chemical storage assembly. The chemical storage assembly is coupled to at least one outlet of the intake assembly. The chemical storage assembly is configured for at least one of (a) storing a chemical or (b) mixing a chemical with a liquid from the pressurized liquid source. The apparatus further includes an outlet assembly. The outlet assembly includes a first outlet configured for expelling pressurized liquid from the pressurized liquid source in a first direction. The outlet assembly also includes a second outlet or a nozzle for expelling the chemical, the chemical mixed with the liquid, a chemical agent, or a foam mixture in a second direction.

Methods and systems for coating metal substrates are provided. The methods and systems include sequential application of low flow and high flow powder coatings followed by a single heating step to provide a cured coating. The methods and systems include a marker that allows coating uniformity to be monitored and assessed during application. The described methods provide coatings with optimal surface smoothness and edge coverage.

A method for depositing a coating on a substrate is disclosed. A first precursor comprising fluoro-acrylate monomers, fluoro-alkyl acrylate monomers, fluoro-methacrylate monomers, fluoro-alkyl methacrylate monomers, fluoro-silane monomers, or a combination or derivates thereof is provided. A second precursor comprising linear siloxanes, silane monomers, cyclosiloxanes, cyclosilane monomers, or a combination or derivates thereof is provided. The first and second precursors are co-injected in a treatment region. An atmospheric or reduced pressure plasma discharge is created in said treatment region. The substrate coating comprises alternated multi-stacked nanostructures and is formed by copolymerization of the first and second precursors.

A method for depositing a coating on a substrate is disclosed. A first precursor comprising fluoro-acrylate monomers, fluoro-alkyl acrylate monomers, fluoro-methacrylate monomers, fluoro-alkyl methacrylate monomers, fluoro-silane monomers, or a combination or derivates thereof is provided. A second precursor comprising linear siloxanes, silane monomers, cyclosiloxanes, cyclosilane monomers, or a combination or derivates thereof is provided. The first and second precursors are co-injected in a treatment region. An atmospheric or reduced pressure plasma discharge is created in said treatment region. The substrate coating comprises alternated multi-stacked nanostructures and is formed by copolymerization of the first and second precursors.

A method of manufacturing self-healing polymer capable of controlling physical properties is provided. The method includes forming the self-healing polymer by adjusting a copolymer composition using monomers of glycidyl methacrylate (GMA) and 2-hydroxyethyl acrylate (HEA) and an initiator of tert-butyl peroxide (TBPO) based on an initiated chemical vapor deposition method (iCVD).

Provided is a coating die enabling coating of two layers of coating films stably. The coating die includes: a first block including a first manifold to receive a first coating liquid; a second block including a second manifold to receive a second coating liquid; and a shim sandwiched between the first block and the second block.

Provided is a coating die enabling coating of two layers of coating films stably. The coating die includes: a first block including a first manifold to receive a first coating liquid; a second block including a second manifold to receive a second coating liquid; and a shim sandwiched between the first block and the second block.

Methods of curtain coating substrates are disclosed. In some embodiments, the methods include applying two or more liquid layers simultaneously to a substrate, wherein the multiple layers include a bottom liquid layer comprising a shear thinning liquid, and another liquid layer comprising a viscoelastic liquid. In some embodiments, the disclosed methods include formulating a bottom layer liquid comprising a shear thinning liquid, formulating another layer liquid comprising a viscoelastic liquid, pumping the bottom layer liquid and the other layer liquid through coating dies simultaneously and onto a moving substrate such that the bottom layer liquid impinges on the substrate thereby forming a bottom layer, and the other layer liquid forms another liquid layer above the bottom liquid layer. The inclusion of a bottom liquid layer comprising a shear thinning liquid and other layer comprising a viscoelastic liquid provides for enlargement of the curtain coating window.

Methods of curtain coating substrates are disclosed. In some embodiments, the methods include applying two or more liquid layers simultaneously to a substrate, wherein the multiple layers include a bottom liquid layer comprising a shear thinning liquid, and another liquid layer comprising a viscoelastic liquid. In some embodiments, the disclosed methods include formulating a bottom layer liquid comprising a shear thinning liquid, formulating another layer liquid comprising a viscoelastic liquid, pumping the bottom layer liquid and the other layer liquid through coating dies simultaneously and onto a moving substrate such that the bottom layer liquid impinges on the substrate thereby forming a bottom layer, and the other layer liquid forms another liquid layer above the bottom liquid layer. The inclusion of a bottom liquid layer comprising a shear thinning liquid and other layer comprising a viscoelastic liquid provides for enlargement of the curtain coating window.

A step of constantly supplying first and second carrier gases into a processing container having a substrate therein through first and second carrier gas flow paths, respectively, and supplying a source gas into the processing container through a source gas flow path, a step of purging the source gas by supplying a purge gas into the processing container through a purge gas flow path provided separately from the carrier gas, a step of supplying a reactant gas into the processing container through a reactant gas flow path, and a step of purging the reactant gas by supplying a purge gas into the processing container through the purge gas flow path are performed in a predetermined cycle. An additive gas having a predetermined function is supplied as at least a part of the purge gas in at least one of the purging steps.