Patent classifications
B05D1/62
Medicament dispenser device
According to the invention there is disclosed a dispenser device for dispensing a medicament, the device comprising at least one component having a coating that comes into contact with the medicament during storage or use of the device on at least one surface thereof, the coating comprising a cross-linked non-diamond like carbon layer comprising 50 At % hydrogen or less and having an interface with the underlying surface of the component.
Antireflective member and method of manufacture therefor
Provided is an antireflective member that has a water- and oil-repellent layer on a multi-layered antireflective layer and is capable of exhibiting excellent surface lubricity, water- and oil-repellent properties, and durability. The surface of the multi-layered antireflective layer on a base material has a root-mean-square surface roughness of 0.8 nm to 2.0 nm. The water- and oil-repellent layer has a thickness of 1 to 30 nm and is a cured product of water- and oil-repellents having as principal components a fluorooxyalkylene group-containing polymer modified organosilicon compound with the numerical average molecular weight of 4,500 to 10,000 of a fluoropolymer part and/or partial hydrolysis condensate thereof.
Syringe with PECVD lubrication
A syringe or other vessel having a substrate surface coated by PECVD is provided. The PECVD coating is made by generating plasma from a gaseous reactant comprising an organosilicon precursor and optionally O.sub.2. The lubricity, hydrophobicity and/or barrier properties of the coating are set by setting the ratio of the O.sub.2 to the organosilicon precursor in the gaseous reactant, and/or by setting the electric power used for generating the plasma. In particular, a lubricity coating made by said method is provided. Vessels coated by said method and the use of such vessels protecting a compound or composition contained or received in said coated vessel against mechanical and/or chemical effects of the surface of the uncoated vessel material are also provided.
ANTIMICROBIAL AND/OR ANTIVIRAL POLYMER SURFACES
A polymer substrate having deposited on its surface a reaction product of a precursor material obtained or obtainable by a method for preparation of polymer, and to the use of the polymer having improved antibacterial properties and/or antiviral properties or of the polymer having improved antibacterial properties and/or antiviral properties obtained or obtainable by the method for medical applications, antibiofouling applications, hygiene applications, food industry applications, industrial or computer related applications, consumer goods applications and appliances, public and public transport applications, underwater, water sanitation or seawater applications.
Low Dielectric Constant Film and Preparation Method Thereof
Provided is a low dielectric constant film and a preparation method thereof, where epoxy alkanes, organosilicon compounds and fluorine-containing siloxane compounds are used as raw materials of the low dielectric constant film, and the low dielectric constant film is formed on a substrate surface by a plasma-enhanced chemical deposition method. Accordingly, a nanofilm with a low dielectric constant and excellent hydrophobicity is formed on the substrate surface.
NEW PRECURSORS FOR DEPOSITING FILMS WITH ELASTIC MODULUS
A method for making a dense organosilicon film with improved mechanical properties, the method comprising the steps of: providing a substrate within a reaction chamber; introducing into the reaction chamber a gaseous composition comprising hydrido-dimethyl-alkoxysilane; and applying energy to the gaseous composition comprising hydrido-dimethyl-alkoxysilane in the reaction chamber to induce reaction of the gaseous composition comprising hydrido-dimethyl-alkoxysilane to deposit an organosilicon film on the substrate, wherein the organosilicon film has a dielectric constant from ˜2.70 to ˜3.50, an elastic modulus of from ˜6 to ˜36 GPa, and an at. % carbon from ˜10 to ˜36 as measured by XPS.
Passive electrical component with coating to improve the loading capacity
The invention relates to a passive electrical component, especially a coil, having an interlayer, wherein the interlayer has a lower coefficient of thermal expansion than the surface of the passive electrical component covered with the interlayer, and disposed atop that a plasma-polymeric carbon-containing coating having a carbon content measured at a depth of 80 nm away from the side of the plasma-polymeric coating remote from the interlayer, wherein the plasma-polymeric coating comprises a carbon content of 50 to 100 atom %, preferably 50 to 90 atom %, or is configured as an organometallic coating a carbon content of 2 to 50 atom %, in each case measured by means of XPS.
POLYMERIC FABRIC
The invention relates to a polymeric fabric comprising an outer functional layer having hydrophobic and oleophobic characteristics made of a first compound, and a second functional layer having hydrophobic characteristics made of a second compound, wherein the first and the second compound differ from each other. Further the outer functional layer at least partly coats the second layer. Additionally, the invention relates to a method of producing a polymeric fabric and an apparatus for producing a polymeric fabric.
METHOD FOR ACTIVATING AN EXPOSED LAYER
A method for activating an exposed layer of a structure including a provision of a structure including an exposed layer, and before or after the provision of the structure, a deposition in the reaction chamber of a layer based on a material of chemical formula C.sub.xH.sub.yF.sub.z, at least x and z being non-zero. The method further includes a treatment, in the presence of the structure, of the layer based on a material of chemical formula C.sub.xH.sub.yF.sub.z by an activation plasma based on at least one from among oxygen and nitrogen. The treatment by the activation plasma is configured to consume at least partially the layer based on the material of chemical formula C.sub.xH.sub.yF.sub.z so as to activate the exposed layer of the structure.
Apparatus and method for manufacturing thin film encapsulation
An apparatus and method for manufacturing a thin film encapsulation includes: a first cluster configured to form a first inorganic layer on a display substrate using a sputtering process; a second cluster configured to form a first organic layer on the first inorganic layer on the display substrate using a monomer deposition process; and a third cluster configured to form a second inorganic layer on the first organic layer on the display substrate using a chemical vapor deposition (CVD) process or a plasma enhanced chemical vapor deposition (PECVD) process.