Devices and methods are provided to apply thin layers of antimicrobial coatings onto a wide variety of substrates and articles. The methods can be performed at moderate temperatures and pressures, allowing for the coating of sensitive substrates and articles.

A method of manufacturing a semiconductor includes adjusting a temperature of a substrate having a recess formed therein and accommodated in a container to a temperature within a range of 200 degrees C. or higher and 280 degrees or lower, and laminating a polyurea film in the recess in the substrate by supplying isocyanate gas and amine gas into the container.

The invention provides a solvent-free plasma method for depositing an adherent catechol and/or quinone functionalised layer to an inorganic or organic substrate from a precursor which comprises at least a quinone group; a protected or unprotected catechol group; a molecule substituted by a quinone group and/or a protected or unprotected catechol group; and/or a natural or synthetic derivative of a catechol group and/or a quinone group; wherein the quinone group is a 1,2-benzoquinone group and the catechol group is a 1,2-dihydroxybenzene group.

A component of an internal combustion engine with anti-fouling (e.g., anti-coking) properties, said component comprising a metal surface; a plasma deposition formed layer comprising silicon, oxygen, and hydrogen on at least a portion of said metal surface; and an anti-fouling coating, of an at least partially fluorinated composition comprising at least one silane group, on at least a portion of a surface of said layer.

A surface coating for high-grade white and/or gray goods, i.e. items for domestic, sanitary and/or automotive use, in particular housing elements of corresponding devices and machines, as well as decoration, for example those housing elements which specifically have metallic applications and/or elements is disclosed. The surface coating is applied on a metallic or metalized surface structure and has hydrophobic property and/or oleophobic property. The surface coating is defined by a thickness which is less than a structure depth of the surface structure. The height of the surface roughness of the surface structure can thus extend significantly beyond the thickness of the surface coating, so that the surface structure promotes blurring of undesired residues in a kind of intrinsic capillary/channeling effect. Because of the blurring the contour of a soiling is obscured until finally it becomes wholly indistinguishable.

Provided is a film-forming apparatus capable of cleaning a discharge apparatus under a state in which a film-forming space and a cleaning gas ambience are separated from each other while continuing to form a film on an object to be film-formed having a film-like shape. The film-forming apparatus includes a cleaning chamber configured to be connected to a film-forming space when a shutter is opened, and to be separated from the film-forming space and cause a cleaning gas to be discharged into an internal space when the shutter is closed; means for moving a discharge apparatus between a cleaning position inside the cleaning chamber and a film-forming position closer to a cylindrical member than the cleaning position; and a control apparatus that controls the discharge apparatus to discharge the raw material gas when the discharge apparatus is moved to the film-forming position, and controls the shutter to be closed so as to fill the cleaning chamber with the cleaning gas when the discharge apparatus is moved to the cleaning position.

The invention relates to medical devices and, more in particular, to medical devices suitable for use as stents that contain an antimicrobial coating and, optionally, a drug customized to patients requirements. The invention also relates to methods for obtaining devices having the above features.

The invention relates to a process for preparing a composite layer, by applying an oligomeric organic compound layer on a substrate with a metal or metal oxide layer by vapour deposition, comprising the steps of (a) providing a substrate layer, (b) applying a metal or metal oxide layer under reduced pressure on said substrate, and (c) vapour depositing the oligomeric organic compound on the metal or metal oxide layer while the film remains at reduced pressure, wherein the oligomeric compound is evaporated from an oligomeric or polymeric compound comprising a stabiliser, or wherein the oligomeric compound is amorphous, or has a high solubility in certain solvents.

Machine (1) for the plasma treatment of containers (3), which comprises: a chamber (5) suitable for receiving a container (3) to be treated, a cover (8) defining a nozzle (9) in the extension of the chamber (5); a duct (14) for depressurization the container (3), which duct opens into the nozzle (9) and connects the latter to a vacuum source (15); a first valve (19) having a closed position, in which it closes off the depressurization duct (14), and an open position, in which it brings the nozzle (9) and the vacuum source (15) into communication; a duct (27) for pressurizing the container (3), separate from the depressurization duct (14), this pressurization duct (27) emerging in the nozzle (9) beyond the depressurization duct (14) and connecting the nozzle (9) to a pressure source (28); and a second valve (29) having a closed position, in which it closes off the pressurization duct (27), and an open position, in which it brings the nozzle (9) and the pressure source (28) into communication.

An implantable or insertable medical device can include a silicone substrate and a plasma-enhanced chemical vapor deposition coating on the silicone substrate. The coating may include a silicon-containing compound. A method of forming the coating is also provided.