Provided are a one-pack addition curable silicone composition compatible with both a good long-term storage property at room temperature under conditions whereby air is blocked to a constant level and the advance of an addition curing reaction at room temperature by being applied in a thin film of 1500 μm or less and exposed to air, which could not be obtained by conventional curable heat-dissipating grease, and a method for storing the same, and a method for curing this composition. A one-pack addition curable silicone composition having as essential ingredients: (A) organopolysiloxane having silicon-atom-bonded aliphatic unsaturated hydrocarbon groups and a specific kinematic viscosity; (B) one or more thermally conductive fillers selected from metals, metal oxides, metal hydroxides, metal nitrides, metal carbides, and allotropes of carbon; (C) organohydrogenpolysiloxane; and (D) a platinum group metal complex having an organic phosphorus compound represented by formula (1)

R.sup.1.sub.x—P—(OR.sup.1).sub.3-x   (1)

(R.sup.1 is a monovalent hydrocarbon group, x is 0-3) as a ligand.

A pigment-containing coating formulation combines (i) polymeric wetting and dispersing additives that absorb onto pigment particles to surround pigment particles to prevent or limit sedimentation; (ii) a self-crosslinking acrylic dispersion with low surfactants and long open time, allowing the pigment to lay flat instead of migrating and agglomerating at the surface; and (3) rheology modification facilitating good Newtonian flow behavior and balanced thixotropic thickening of the coating for improved brushability, flow and leveling for improved appearance with keener light reflection and more uniform pearlescent and metallic effect appearance.

The present invention relates to a device, the use thereof and a method for producing highly porous, crystalline surface coatings comprising at least two spraying devices operating in sequential sequence for applying coating agents from the storage vessels (3, 4) to a material arranged on a sample holder (1) and at least one rinsing device (5, 13, 16) for removing unbound molecules from the coated surface.

The present invention relates to a polyimide precursor comprising a repeating unit represented by the following chemical formula (1): ##STR00001##
wherein A is a tetravalent group having at least one aliphatic six membered ring and no aromatic ring in the chemical structure, and B is a divalent group having at least one amide bond and an aromatic ring in the chemical structure; or A is an aliphatic tetravalent group and B is a divalent group having at least one chemical structure represented by the following chemical formula (2) in the chemical structure: ##STR00002##
and X.sub.1 and X.sub.2 are each independently hydrogen, a C.sub.1-6 alkyl group or a C.sub.3-9 alkylsilyl group.

A hydrogel material composition includes: (1) an alginate (or other cross-linking polymer) material; (2) an optional α-hydroxy carboxylate material; and (3) an iron cation material. The hydrogel material composition with or without the α-hydroxy-carboxylate material may be used in a photolithographic imaging application or a photorelease application within the context of a photoirradiation induced reduction/oxidation reaction of an iron (III) cation material to form an iron (II) cation material.

Systems and methods are provided for fabricating pyrite thin films from molecular inks. A process is provided that comprises dissolving simple iron-bearing and sulfur-bearing molecules in an appropriate solvent and then depositing the solution onto an appropriate substrate using one of several methods (roll-to-roll coating, spraying, spin coating, etc.), resulting in a solid film consisting of the molecules. These molecular precursor films are then heated to 200-600° C. in the presence of sulfur-bearing gases (e.g., S.sub.2, H.sub.2S) to convert the molecular films into films of crystalline iron pyrite (FeS.sub.2).

A pattern is formed by coating a resist composition comprising a fluorine-containing polymer, a base resin, an acid generator, and an organic solvent, baking the composition at 50-300° C. in an atmosphere of a solvent having a boiling point of 60-250° C., exposure, and development. In immersion lithography, the resist film is improved in water repellency and water slip, and LWR after pattern formation is reduced. In EB or EUV lithography, outgassing is suppressed and LWR is reduced.

A wet process module, in particular a lacquering module, for the treatment of substrates, in particular wafers, has a process chamber having a process pot for treating the substrate, an air inlet for supplying air into the process chamber, at least one bypass outlet and at least one process pot outlet. The at least one bypass outlet and the at least one process pot outlet are air outlets for discharging air out of the process chamber. Furthermore, the at least one process pot outlet is provided in the process pot and the at least one bypass outlet is provided outside the process pot.

Described herein is a coating system comprising an applicator head that is configured to apply a coating to a surface of a workpiece, a shroud comprising a housing and an internal cavity located inside of the housing, and a humidifying apparatus comprising an output that is fluidly coupled to the shroud, wherein the humidifying apparatus configured to introduce a quantity of humid air to the internal cavity of the shroud.

A extrusion process and apparatus for the deposition of precise, usually small amounts of extrudate (4) for adhesion to a substrate (1) comprising an extruder (2) positioned close to the substrate (1) and a jet of hot gas (6) directed onto the extrudate (1) between the extruder (2) and the substrate (1) in order to retain the adhesive properties between the extrudate (4) and the substrate (1).