A system for buoyant particle processing includes: a reaction vessel, a stirring mechanism, a set of one or more pumps, and a filter. The system can additionally or alternatively include a set of pathways and/or any other suitable component(s). A method for buoyant particle processing includes: stirring the contents of a reaction vessel; washing a set of buoyant particles; and filtering the contents of the reaction vessel. Additionally or alternatively, the method can include any or all of: preprocessing the set of buoyant particles; adding a set of inputs to the reaction vessel; washing the set of buoyant particles; repeating one or more; and/or any other suitable process(es).

The disclosure relates to maskless, laser-assisted methods for making a metal surface comprising at least one of hydrophobic and hydrophilic regions; and at least one of micro- and nanostructured regions.

The disclosure relates to maskless, laser-assisted methods for making a metal surface comprising at least one of hydrophobic and hydrophilic regions; and at least one of micro- and nanostructured regions.

An apparatus and methods for using coatings for metal applications are disclosed. According to one embodiment, an article comprises a cured polymeric film having a first reaction product of a cationic photoinitiator and a compound suitable for cationic polymerization. The article has a second reaction product of a free-radical photoinitiator and a compound suitable for free-radical polymerization; The article has a metal substrate, wherein the cured polymeric film coats the metal substrate.

An apparatus and methods for using coatings for metal applications are disclosed. According to one embodiment, an article comprises a cured polymeric film having a first reaction product of a cationic photoinitiator and a compound suitable for cationic polymerization. The article has a second reaction product of a free-radical photoinitiator and a compound suitable for free-radical polymerization; The article has a metal substrate, wherein the cured polymeric film coats the metal substrate.

A method for manufacturing a synthetic non-perforated drainable material is disclosed herein. Generally, the method includes injecting a coating material with air, applying the air-injected coating material to the first side of the material, and curing the air-injected material such that it adheres. Once cured, the material has a highly efficient drainage rate that remains consistent throughout the life of the material.

A method for manufacturing a synthetic non-perforated drainable material is disclosed herein. Generally, the method includes injecting a coating material with air, applying the air-injected coating material to the first side of the material, and curing the air-injected material such that it adheres. Once cured, the material has a highly efficient drainage rate that remains consistent throughout the life of the material.

Disclosed in this specification is a method for coating a substrate to prevent dewetting. A suspension of nanoparticles is deposited onto the substrate to produce a nanoparticle layer. The nanoparticle layer is then coated with a monomer. The monomer polymerizes on the nanoparticle layer to produce a polymeric layer.

A method and alignment system for minimizing errors in the deposition of films of tailored thickness. A first position on a stage is identified for optimal placement of a downward looking microscope (DLM) and an upward looking microscope (ULM) when alignment marks on the DLM and ULM are aligned, where the DLM is attached to a bridge and the ULM is attached to the stage. A second position on the stage is identified when the ULM on the stage is aligned with the alignment marks on a metrology tool. A surface of a chucked substrate affixed to the stage is then measured. A map between a substrate coordinate system and a metrology coordinate system may then be obtained using the measured surface of the chucked substrate with the first and second positions.

A method and alignment system for minimizing errors in the deposition of films of tailored thickness. A first position on a stage is identified for optimal placement of a downward looking microscope (DLM) and an upward looking microscope (ULM) when alignment marks on the DLM and ULM are aligned, where the DLM is attached to a bridge and the ULM is attached to the stage. A second position on the stage is identified when the ULM on the stage is aligned with the alignment marks on a metrology tool. A surface of a chucked substrate affixed to the stage is then measured. A map between a substrate coordinate system and a metrology coordinate system may then be obtained using the measured surface of the chucked substrate with the first and second positions.