B05D7/20

DEVICE FOR MODIFYING A LINEAR SUBSTRATE
20220305517 · 2022-09-29 ·

An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.

DEVICE FOR MODIFYING A LINEAR SUBSTRATE
20220305517 · 2022-09-29 ·

An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.

Temperature sensor, sensor element and manufacturing method of temperature sensor
11428584 · 2022-08-30 · ·

A temperature sensor includes a sensor element including a thermosensitive body, a protection tube accommodating the thermosensitive body part of the sensor element, and a filler filling a space between the protection tube and the sensor element inside the protection tube. The sensor element includes a first covering layer made of a first electrical insulator, the first covering layer covering the thermosensitive body, and a second covering layer made of a second electrical insulator, the second covering layer covering the first covering layer. The first covering layer has elastic modulus smaller than elastic modulus of the second covering layer.

Temperature sensor, sensor element and manufacturing method of temperature sensor
11428584 · 2022-08-30 · ·

A temperature sensor includes a sensor element including a thermosensitive body, a protection tube accommodating the thermosensitive body part of the sensor element, and a filler filling a space between the protection tube and the sensor element inside the protection tube. The sensor element includes a first covering layer made of a first electrical insulator, the first covering layer covering the thermosensitive body, and a second covering layer made of a second electrical insulator, the second covering layer covering the first covering layer. The first covering layer has elastic modulus smaller than elastic modulus of the second covering layer.

WIPER SYSTEM
20170274411 · 2017-09-28 ·

A wiper system configured to apply and wipe one or more coatings on a rigid tube includes a tapered wiper tapering between a wider end defining an inlet orifice and a narrower end defining an exit orifice. The narrower end of the tapered wiper includes a series of slits arranged circumferentially around the exit orifice. The slits define a series of resilient tabs configured to deflect radially outward when contacted by one or more formations on an outer surface of the rigid tube and configured to return to a neutral position when the one or more formations have passed through the exit orifice. The wiper system may also include a gimbal supporting the tapered wiper. The gimbal is configured to permit the tapered wiper to rotate about first and second mutually perpendicular axes when the tapered wiper is contacted by a bowed rigid tube.

REFERENCE ELECTRODE IMPLEMENTATION WITH REDUCED MEASUREMENT ARTIFACTS

Artifacts from the presence of a reference electrode in a thin-film cell configuration can be minimized or eliminated by providing the surface of a reference electrode with a specified surface resistivity. Theoretical considerations are set forth that show that for a given wire size, there is a theoretical surface resistance (or resistivity) that negates all artifacts from the presence of the reference wire. The theory and the experimental results hold for a electrochemical cell in a thin-film configuration.

REFERENCE ELECTRODE IMPLEMENTATION WITH REDUCED MEASUREMENT ARTIFACTS

Artifacts from the presence of a reference electrode in a thin-film cell configuration can be minimized or eliminated by providing the surface of a reference electrode with a specified surface resistivity. Theoretical considerations are set forth that show that for a given wire size, there is a theoretical surface resistance (or resistivity) that negates all artifacts from the presence of the reference wire. The theory and the experimental results hold for a electrochemical cell in a thin-film configuration.

Dental Floss Coating Composition

Provided herein is a dental floss coating composition comprising one or more polyethylene glycol polymers and a peroxide source, wherein the melting temperature of the one or more polyethylene glycol polymers, in combination, is from 38 C to 50 C, and wherein the one or more polyethylene glycol polymers are present in the composition in an amount of from 80 weight % to 97 weight % by total weight of the composition. The composition may be used in molten form to coat dental floss whilst maintaining the stability of the peroxide source.

Dental Floss Coating Composition

Provided herein is a dental floss coating composition comprising one or more polyethylene glycol polymers and a peroxide source, wherein the melting temperature of the one or more polyethylene glycol polymers, in combination, is from 38 C to 50 C, and wherein the one or more polyethylene glycol polymers are present in the composition in an amount of from 80 weight % to 97 weight % by total weight of the composition. The composition may be used in molten form to coat dental floss whilst maintaining the stability of the peroxide source.

Device and Method for Producing Enameled Wires
20220165455 · 2022-05-26 ·

A device (1) and a method for producing enameled wires, comprises an application device (3) for applying at least one enamel coating, a furnace (4) for solidifying the enamel coating and an exhaust gas purification device (7) for removing at least nitrogen oxides from an exhaust gas (9) of the furnace (4). The exhaust gas purification device (7) has a unit (13) for the selective catalytic reduction of nitrogen oxides in the exhaust gas (9) of the furnace and a feeding apparatus (11) for feeding a reducing agent, preferably an ammonia-containing compound, in particular a urea solution, into the exhaust gas (9) of the furnace (4). The feeding apparatus (11) has at least one outlet opening, which is designed in such a way that the reducing agent exits from the outlet opening substantially in the flow direction of the exhaust gas (9).