A coated substrate includes: a substrate and a first layer on at least a portion of the substrate, the first layer including a polymer selected from the group consisting of an acrylic, an epoxy, a polyurethane, a copolymer thereof, and a mixture thereof, and an additive selected from the group consisting of an ultraviolet light (UV) absorber, a UV stabilizer, and a mixture thereof. The coated substrate further includes a second layer on at least a portion of the first layer, and a third layer on at least a portion of the second layer. A method of forming a coated substrate includes: forming a first layer on at least a portion of a substrate; forming a second layer on at least portion of the first layer; and forming a third layer by plasma enhanced chemical vapor deposition on at least a portion of the second layer.

A coated substrate includes: a substrate and a first layer on at least a portion of the substrate, the first layer including a polymer selected from the group consisting of an acrylic, an epoxy, a polyurethane, a copolymer thereof, and a mixture thereof, and an additive selected from the group consisting of an ultraviolet light (UV) absorber, a UV stabilizer, and a mixture thereof. The coated substrate further includes a second layer on at least a portion of the first layer, and a third layer on at least a portion of the second layer. A method of forming a coated substrate includes: forming a first layer on at least a portion of a substrate; forming a second layer on at least portion of the first layer; and forming a third layer by plasma enhanced chemical vapor deposition on at least a portion of the second layer.

An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.

An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.

A method of fabricating a hydrophobic coating on a surface of a solid substrate which includes a layer-integrable material includes the steps of depositing a deformable layer of the layer-integrable material onto the surface of the solid substrate, forcibly embedding a plurality of particles within the deformable layer, and solidifying the deformable layer including the plurality of particles so as to be integral with the surface of the solid substrate. At least a portion of the plurality of particles is embedded at a threshold depth within the deformable layer prior to solidification.

A method of fabricating a hydrophobic coating on a surface of a solid substrate which includes a layer-integrable material includes the steps of depositing a deformable layer of the layer-integrable material onto the surface of the solid substrate, forcibly embedding a plurality of particles within the deformable layer, and solidifying the deformable layer including the plurality of particles so as to be integral with the surface of the solid substrate. At least a portion of the plurality of particles is embedded at a threshold depth within the deformable layer prior to solidification.

A method of applying a circumferential coating material on a circumferential surface of a ceramic honeycomb structure to form a circumferential coat layer. The method includes vertically aligning the longitudinal axis of the ceramic honeycomb structure, rotating the ceramic honeycomb structure around the vertically-aligned longitudinal axis, and applying the circumferential coating material on the circumferential surface of the rotating honeycomb structure at a discharge speed of 50 to 120 mm/s, calculated by
Discharge speed V [mm/s]=Supplied amount q [g/s] of circumferential coating material(Density [g/mm.sup.3] of circumferential coating materialArea S [mm.sup.2] of discharge opening).

Methods for forming a coating can include preparing a nanocomposite film including surface modified silicon dioxide nanoparticles, applying an oxygen plasma treatment to the nanocomposite film to form a treated nanocomposite film, and applying a fluorosilane solution to the treated nanocomposite film to form the coating. A coating can include a nanocomposite film including surface modified silicon dioxide nanoparticles, the nanocomposite film having an oxygen plasma treated surface, and a monolayer of a fluoro alkyl chain.

Methods for forming a coating can include preparing a nanocomposite film including surface modified silicon dioxide nanoparticles, applying an oxygen plasma treatment to the nanocomposite film to form a treated nanocomposite film, and applying a fluorosilane solution to the treated nanocomposite film to form the coating. A coating can include a nanocomposite film including surface modified silicon dioxide nanoparticles, the nanocomposite film having an oxygen plasma treated surface, and a monolayer of a fluoro alkyl chain.

A method of making a buff-coated article includes disposing a tie layer on at least a portion of a major surface of a substrate and buff-coating a powder onto at least a portion of the tie layer. Buff-coated articles are also disclosed.