The present invention relates to a an aqueous composition for removing soils from a surface to be cleaned, formed from water, a detergent mixture and a rinse aid, wherein the detergent mixture comprises a peroxidation catalyst and wherein the rinse aid comprises an oxygen source. Such a composition may provide a more effective cleaning behaviour. The present invention further relates to a method for removing soil from a surface to be cleaned comprising applying to the surface to be cleaned a composition according to the invention.

Aggregate washing systems are described including mechanisms for slurrying, washing and/or dewatering aggregate material.

According to the present invention, there is provided a cleaning system for biomass material handling systems and methods for such system. The cleaning system for a biomass material treatment stage in a continuous process system includes a hydrolysis or pre-hydrolysis reactor, a feeding arrangement is arranged to continuously feed biomass material to an inlet of the reactor, wherein reactor includes a reactor screw for moving the biomass material through the reactor and a discharge pipe including a discharge screw for continuously discharging treated biomass material. At least one high-pressure cleaning nozzle is arranged inside a housing of said reactor, wherein the at least one high-pressure cleaning nozzle is arranged to eject cleaning agent at predetermined intervals during operation of the reactor.

A self-cleaning automatically-stored electrical mop includes a mop rod assembly, a mop head assembly, and a cleaning base assembly used for storing and cleaning the mop head assembly. The mop head assembly is arranged at the lower end of the mop rod assembly and includes a mop head shell which is provided with a rotatable cleaning roller and a motor used for driving the cleaning roller. The cleaning base assembly includes a shell part. A cleaning groove used for cleaning the cleaning roller is formed in the shell part, and a cleaning assembly used for scrubbing the cleaning roller is arranged in the cleaning groove. The shell part is provided with a sewage discharge system used for discharging sewage.

A substrate processing apparatus includes a substrate processing part that supplies a processing liquid from a processing liquid supply part to a mounted substrate to execute liquid processing, a liquid drainage part that has a recovery channel connected to a storage part that stores the processing liquid and drains the processing liquid used for the liquid processing, and a control unit executes a processing recipe for the liquid processing and a cleaning recipe for cleaning the substrate processing part and the liquid drainage part. The control unit executes a cleaning operation for supplying a cleaning liquid from a cleaning liquid supply part to clean the substrate processing part and the liquid drainage part and subsequently executes a return operation for supplying the processing liquid from the processing liquid supply part to replace the cleaning liquid attached to the substrate processing part and the liquid drainage part with the processing liquid.

A substrate processing apparatus includes a substrate processing part that supplies a processing liquid from a processing liquid supply part to a mounted substrate to execute liquid processing, a liquid drainage part that has a recovery channel connected to a storage part that stores the processing liquid and drains the processing liquid used for the liquid processing, and a control unit executes a processing recipe for the liquid processing and a cleaning recipe for cleaning the substrate processing part and the liquid drainage part. The control unit executes a cleaning operation for supplying a cleaning liquid from a cleaning liquid supply part to clean the substrate processing part and the liquid drainage part and subsequently executes a return operation for supplying the processing liquid from the processing liquid supply part to replace the cleaning liquid attached to the substrate processing part and the liquid drainage part with the processing liquid.

A system which can be manually/automatically activated to ensure instant cleaning of decontamination liquid and gas placed into cylindrical pressure tubes against CBRN threats, wherein the system includes: a decontamination liquid/gas used for cleaning chemical, biologic, radiological and nuclear threats and minimizing effects thereof, a decontamination tube used for discharging decontamination liquid/gas placed therein, a decontamination pyrotechnic igniter-based on pyrotechnic used for ignition of the decontamination tube, a control unit providing manual or automatic operation of the system, and at the same time communication thereof with the hardware units in the system, and a control card located on the control unit, having printed circuit boards with embedded software developed for enabling the control.

A cleaning machine and a cleaning method for a photomask pellicle are provided. The cleaning machine at least includes: an air knife and a cleaning device. The air knife is configured to blow away contamination particles on the surface of the photomask pellicle. The cleaning device is configured to spray cleaning liquid to the surface of the photomask pellicle, to weather the contamination particles failed to be blown away by the air knife through the volatilization of the cleaning liquid. The air knife is also configured to blow away the weathered contamination particles.

Exemplary integrated cluster tools may include a factory interface including a first transfer robot. The tools may include a wet clean system coupled with the factory interface at a first side of the wet clean system. The tools may include a load lock chamber coupled with the wet clean system at a second side of the wet clean system opposite the first side of the wet clean system. The tools may include a first transfer chamber coupled with the load lock chamber. The first transfer chamber may include a second transfer robot. The tools may include a second transfer chamber coupled with the first transfer chamber. The second transfer chamber may include a third transfer robot. The tools may include a metal deposition chamber coupled with the transfer chamber.

Exemplary integrated cluster tools may include a factory interface including a first transfer robot. The tools may include a wet clean system coupled with the factory interface at a first side of the wet clean system. The tools may include a load lock chamber coupled with the wet clean system at a second side of the wet clean system opposite the first side of the wet clean system. The tools may include a first transfer chamber coupled with the load lock chamber. The first transfer chamber may include a second transfer robot. The tools may include a second transfer chamber coupled with the first transfer chamber. The second transfer chamber may include a third transfer robot. The tools may include a metal deposition chamber coupled with the transfer chamber.