A household dishwasher includes a receiving compartment for receiving an item to be washed, a pump sump, and a heat pump assembly through which, during operation, a heat transfer medium flows. The heat pump assembly includes a plate condenser configured to enable a transfer of heat from the heat transfer medium to a washing liquor circulating in the household dishwasher. A spray assembly supplies washing liquor to the item to be washed. A first flow path extends from the pump sump to the spray assembly for conducting the washing liquor, and a second flow path extends from the pump sump to the plate condenser. Means are provided to prevent or hinder foreign matter that is swept along with the washing liquor from adhering to a washing-liquor-facing surface of the plate condenser, or to detach foreign matter adhering to the washing-liquor-facing surface from said surface.

A household dishwasher includes a receiving compartment for receiving an item to be washed, a pump sump, and a heat pump assembly through which, during operation, a heat transfer medium flows. The heat pump assembly includes a plate condenser configured to enable a transfer of heat from the heat transfer medium to a washing liquor circulating in the household dishwasher. A spray assembly supplies washing liquor to the item to be washed. A first flow path extends from the pump sump to the spray assembly for conducting the washing liquor, and a second flow path extends from the pump sump to the plate condenser. Means are provided to prevent or hinder foreign matter that is swept along with the washing liquor from adhering to a washing-liquor-facing surface of the plate condenser, or to detach foreign matter adhering to the washing-liquor-facing surface from said surface.

A method and composition for removing contaminant material from industrial equipment are disclosed herein. The method includes providing a solvent composition having methyl soyate, N-methylpyrrolidinone, an additional solvent, and a cationic surfactant. The method also includes contacting the contaminant material with the solvent composition and allowing the solvent composition to react with the contaminant material such that at least a portion of the contaminant material is no longer attached to the industrial equipment.

A substrate processing apparatus includes a rotation driving device configured to rotate a rotary table holding a substrate; a processing liquid nozzle configured to supply a processing liquid onto a top surface of the substrate; an electric heater provided at a top plate and configured to heat the substrate through the top plate; an electronic component configured to perform a power feed to the electric heater and transmission/reception of a control signal for the electric heater; and a periphery cover body connected to a peripheral portion of the top plate to be rotated along with the top plate. An accommodation space in which the electronic component is accommodated is formed under the top plate. The accommodation space is surrounded by a surrounding structure including the top plate and the periphery cover body. A gap between the peripheral portion of the top plate and the periphery cover body is sealed.

A substrate processing apparatus includes a rotation driving device configured to rotate a rotary table holding a substrate; a processing liquid nozzle configured to supply a processing liquid onto a top surface of the substrate; an electric heater provided at a top plate and configured to heat the substrate through the top plate; an electronic component configured to perform a power feed to the electric heater and transmission/reception of a control signal for the electric heater; and a periphery cover body connected to a peripheral portion of the top plate to be rotated along with the top plate. An accommodation space in which the electronic component is accommodated is formed under the top plate. The accommodation space is surrounded by a surrounding structure including the top plate and the periphery cover body. A gap between the peripheral portion of the top plate and the periphery cover body is sealed.

The invention is generally a system for drying, recycling, and washing off residual resin from three-dimensionally (3D) printed objects. Exemplary systems may include a system for washing off residual printing material from a surface of a 3D-printed. In an exemplary embodiment, a chamber is adapted to receive the 3D-printed object and a printing material disruption module is adapted to disrupt a composition of residual printing material on a surface of the 3D-printed object. Additionally, a washing force module may be adapted to apply a washing force field to the 3D-printed object and wash off the residual printing material.

The invention is generally a system for drying, recycling, and washing off residual resin from three-dimensionally (3D) printed objects. Exemplary systems may include a system for washing off residual printing material from a surface of a 3D-printed. In an exemplary embodiment, a chamber is adapted to receive the 3D-printed object and a printing material disruption module is adapted to disrupt a composition of residual printing material on a surface of the 3D-printed object. Additionally, a washing force module may be adapted to apply a washing force field to the 3D-printed object and wash off the residual printing material.

A method for cleaning a breathing apparatus comprising a respiratory mask, by such precleaning activity as: providing the breathing apparatus in an externally contaminated state, providing a holder for the respiratory mask having at least one curved sealing face and stretching the respiratory mask onto the holder such that a sealing lip of the respiratory mask lies on the curved sealing face and closes off an interior of the respiratory mask, and the holder with the respiratory mask may be introduced into a precleaning chamber, exposing an outer side of the respiratory mask in the precleaning chamber to at least one precleaning fluid. And, after the precleaning, the respiratory mask may be released from the holder, introducing the respiratory mask into a primary cleaning chamber and exposing the respiratory mask, including an inner side of the respiratory mask that faces the interior, to a primary cleaning fluid.

Fabric treatment compositions that include certain polymer systems, such as systems that include a first polymer that is a soil release polymer and a second polymer that is a graft copolymer (e.g., a PEG/vinyl acetate polymer), an alkoxylated polyalkyleneimine polymer, or a mixture thereof. Related processes and uses.

A substrate processing apparatus includes a holder configured to hold a substrate; a driving unit configured to rotate the holder; an inner cup body provided in the holder to surround the substrate held by the holder; a mist guard, surrounding the holder and the inner cup body, configured to be moved up and down; a cleaning liquid supply configured to supply a cleaning liquid; and a controller. The controller is configured to perform: supplying a processing liquid to the substrate from a processing liquid supply, in a state that the substrate is held by the holder and the mist guard is raised; and dispersing, after the supplying of the processing liquid, the cleaning liquid supplied from the cleaning liquid supply to an entire inner peripheral surface of the mist guard, in a state that the substrate is carried out from the holder and the mist guard is raised.